Abstract: A terminal device executes a biometric authentication process. The terminal device includes: a memory; and a processor coupled to the memory and configured to: activate the biometric authentication process when the terminal device is detected to approach a predetermined entering/leaving management device; and output authentication information readable by the predetermined entering/leaving management device when the biometric authentication process is determined to be successful.

Abstract: The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.

Abstract: The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter-electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.

Abstract: The interior of a vacuum chamber is maintained at a specified pressure by introducing a specified gas into the vacuum chamber having a plasma trap provided therein. Simultaneously, therewith, evacuation of the chamber is performed by a pump as an evacuating device, and a high-frequency power of 100 MHz is supplied to a counter electrode by counter electrode use high-frequency power supply. Thus, uniform plasma is generated within the vacuum chamber, where plasma processing such as etching, deposition, and surface reforming can be carried out uniformly with a substrate placed on a substrate electrode.

Abstract: Provided is a plasma processing apparatus, which is loaded with a substrate to be processed on the voltage-applied electrode side and is able to achieve a uniform plasma processing characteristic on a substrate surface by correcting the distortion of an electric field in the edge portion and the distortion of plasma. There is provided a plasma processing apparatus, which introduces a processing gas into a processing chamber and excites a plasma in the processing chamber to carry out plasma processing on a substrate to be processed placed on a cathode electrode inside the processing chamber, the apparatus being provided with a ring that encompasses the outer peripheral edge portion of the substrate and has a clearance between its encompassing surface and the upper surface and the outer peripheral edge of the substrate.

Abstract: A plasma processing apparatus includes a vacuum chamber for evacuating gas therefrom, for introducing reaction gas therein, and for generating plasma therein through high frequency power application. A substrate hold stage is set in the vacuum chamber, with the substrate hold stage including a set face having a recessed part, wherein a rear face of a substrate to be subjected to plasma processing is held on the set face.

Abstract: A substrate detection sensor is operatively connected to a door moving mechanism for opening/closing a front door with respect to a sealed container accommodating therein a plurality of substrates. The substrate detection sensor enters the sealed container and detects the substrates successively as it is lowered integrally with the front door, and retracts from the sealed container when all of the substrates have been detected.

Abstract: It is the object of the invention to provide a substrate dechucking device and a substrate dechucking method for safely dechucking from a substrate holder a substrate which is being held in the substrate holder.

Abstract: Objects of the present invention are to prolong the life of a sealing portion by using bellows and to prevent the generation of dust and the effect thereof. A support member for positioning is extended to the outside through an opening of a vacuum vessel and bellows connected to the circumference of the opening with a play such that positioning movement can be performed without being in contact with the opening and the bellows, and the support member is received by roller bearings in a bulkhead portion connected to a free end of the bellows and closing the bellows of a bearing support. Necessary rotation is given to the support member from outside via inside and outside magnetic couplings facing each other on the inside and outside of the bulkhead portion, and movement in the X direction perpendicular to the axis is given to the support member from outside by moving the bearing support in the direction perpendicular to the axis with respect to the vacuum vessel.

Abstract: An upper arm 4 and a lower arm 6 of a parallel link system that perform extension and retraction action in the same direction without mutual interference are arranged within a vacuum enclosure 1. Three magnetic couplings are arranged coaxially at three levels, through which extension/retraction action and swivel action of upper and lower arms are effected. Using a cam box having three output shafts driven by a single input shaft to which an arm drive motor is connected, extension/retraction drive and Z axis drive of upper and lower arms are performed, while swiveling action of upper and lower arms is driven by a swivel motor.

Abstract: A substrate detection sensor is operatively connected to a door moving mechanism for opening/closing a front door with respect to a sealed container accommodating therein a plurality of substrates. The substrate detection sensor enters the sealed container and detects the substrates successively as it is lowered integrally with the front door, and retracts from the sealed container when all of the substrates have been detected.

Abstract: In processing the surface of a substrate 2 that is held with its under-surface in contact with a substrate holder 3 in a vacuum chamber 1, the temperature of substrate 2 is controlled by supplying a heat-conductive gas between the substrate 2 and substrate holder 3. Supply and evacuation of the heat-conductive gas are effected rapidly at high flow rate from both supply line 18 and evacuation line 19 using bypass lines 17a, 17b, while pressure regulation is effected with a low flow rate.

Abstract: Data related to an attractive force between a substrate holder 3 and a substrate 2 is detected when pushing up and releasing the substrate 2 from the substrate holder 3, and when the attractive force is detected to be greater than a predetermined value, the push-up operation is regulated by a controller 18.

Abstract: Plasma is generated in a vacuum chamber (1) by supplying high frequency power to a spiral antenna (5) from an antenna-use high frequency power source (4) and by supplying high frequency power to an electrode (6) by an electrode-use high frequency power source (8) in a state where evacuating a vacuum chamber (1) while introducing a specified gas into the vacuum chamber, thereby controlling the vacuum chamber at a predetermined pressure. Plasma processing such as etching is performed on a substrate (7) located on the electrode (6), the interior of the vacuum chamber is heated to 80° C. or higher, wherein a resistance-heating heater (11) constituted of a heating element shielded from electromagnetic waves by a conductive sheath and a pressure-weld type thermocouple (10) provided on a dielectric body (9) are connected to a temperature adjuster (12). A insulating material (13) is arranged between the heater (11) and the antenna (5), and an inner chamber (16) including a belt heater (22) is also arranged.

Abstract: A VOD delivery system for delivering program data such as of movies or the like on a real-time basis which are requested by subscribers from time to time, in response to the requests from the subscribers has a reduced number of magnetooptical disks and a reduced number of identical programs available. The VOD delivery system has a library including an automatic cassette changer, a plurality of magnetooptical disk drives each having a plurality of playback heads, a distributor/exchanger circuit for delivering reproduced information from the magnetooptical disk drives to subscriber's residences which have requested a source or sources, and a control computer for controlling the magnetooptical disk drives to output reproduced information from the playback heads depending on access timing from the subscriber's residences.

Abstract: A plasma processing method and apparatus, wherein evaluation is effected while a suitable gas is introduced into a vacuum vessel, and then a high frequency voltage is applied by a high frequency discharge coil power source to a spiral discharge coil while the interior of the vacuum vessel is kept under adequate pressure, whereby a high frequency magnetic field is generated within the vacuum vessel through a dielectric plate so that electrons are accelerated by an induction field due to the high frequency magnetic field to generate plasma within the vacuum vessel for processing a substrate, characterized in that the dielectric plate is heated by a planar heater to 80.degree. C. or more, whereby the thickness of a thin film to be deposited on the dielectric plate is substantially reduced thereby to inhibit dust generation and thus substantially reduce the frequency of maintenance required for the dielectric plate.

Abstract: A vacuum processing apparatus includes a reaction chamber, a non-reaction chamber which is a load-lock chamber or a double load-lock chamber. A double arm is accommodated in the non-reaction chamber, and includes a first arm and a second arm for taking out a processed wafer from the reaction chamber and supplying an unprocessed wafer to the reaction chamber. Wafer elevating mechanisms are provided in the reaction chamber and the non-reaction chamber. The double arm and the wafer elevating mechanisms are driven by a single drive source. Also, a selective engagement mechanism is provided at the reaction chamber and at the non-reaction chamber for selectively engaging the driving source with any one of the wafer elevating mechanisms at the reaction chamber and the non-reaction chamber to drive the double arm and the wafer elevating mechanism at the selected chamber.

Abstract: A VOD delivery system for delivering program data such as of movies or the like on a real-time basis which are requested by subscribers from time to time, in response to the requests from the subscribers has a reduced number of magnetooptical disks and a reduced number of identical programs available. The VOD delivery system has a library including an automatic cassette changer, a plurality of magnetooptical disk drives each having a plurality of playback heads, a distributor/exchanger circuit for delivering reproduced information from the magnetooptical disk drives to subscriber's residences which have requested a source or sources, and a control computer for controlling the magnetooptical disk drives to output reproduced information from the playback heads depending on access timing from the subscriber's residences.

Abstract: A vacuum processing apparatus includes a reaction chamber, a non-reaction chamber which is a load-lock chamber or a double load-lock chamber. A double arm is accommodated in the non-reaction chamber, and includes a first arm and a second arm for taking out a processed wafer from the reaction chamber and supplying an unprocessed wafer to the reaction chamber. Wafer elevating mechanisms are provided in the reaction chamber and the non-reaction chamber. The double arm and the wafer elevating mechanisms are driven by a single drive source. Also, a selective engagement mechanism is provided at the reaction chamber and at the non-reaction chamber for selectively engaging the driving source with any one of the wafer elevating mechanisms at the reaction chamber and the non-reaction chamber to drive the double arm and the wafer elevating mechanism at the selected chamber.

Abstract: Apparatus for transmitting video signals includes a primary storage device having a plurality of storage units for storing and reading video signals selectively supplied thereto by a coupling circuit. An alternate storage device functions as a backup and receives and stores all of the video signals that are supplied to the primary storage device; and reads out therefrom the video signals which are in the process of being read from the primary storage device in the event a failure is detected in the primary storage device.