Patents by Inventor Hideo Hoshino

Hideo Hoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8093571
    Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
    Type: Grant
    Filed: September 25, 2009
    Date of Patent: January 10, 2012
    Assignee: Gigaphoton Inc.
    Inventors: Akira Endo, Krzysztof Nowak, Hideo Hoshino, Tatsuya Ariga, Masato Moriya, Osamu Wakabayashi
  • Publication number: 20110284774
    Abstract: A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.
    Type: Application
    Filed: July 28, 2011
    Publication date: November 24, 2011
    Applicant: GIGAPHOTON INC.
    Inventors: Takanobu ISHIHARA, Youichi Sasaki, Kouji Kakizaki, Masahiro Inoue, Takayuki Yabu, Hideo Hoshino
  • Publication number: 20110261844
    Abstract: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
    Type: Application
    Filed: July 5, 2011
    Publication date: October 27, 2011
    Applicants: Gigaphoton Inc., Komatsu Ltd.
    Inventors: Tamotsu ABE, Hideo Hoshino, Akira Endo, Osamu Wakabayashi, Kouji Kakizaki
  • Publication number: 20110211601
    Abstract: A driver laser for an extreme ultra violet light source device capable of suppressing self-oscillation light, amplifying a laser beam efficiently, and reducing a device size. The driver laser has an oscillator for generating a laser beam to output the generated laser beam, and at least one amplifier for amplifying the laser beam output from the oscillator to output the amplified laser beam. The amplifier includes a discharge unit which amplifies the laser beam by using energy of a laser medium excited by discharge, a feedback mirror which leads the laser beam output from the discharge unit to the discharge unit, a polarizer which leads the laser beam output from the oscillator into the discharge unit and also reflects the laser beam output from the discharge unit to a predetermined direction, and a self-oscillation light filter which attenuates self-oscillation light output from the discharge unit.
    Type: Application
    Filed: March 16, 2011
    Publication date: September 1, 2011
    Inventors: Tatsuya ARIGA, Hideo HOSHINO, Taisuke MIURA, Akira ENDO
  • Patent number: 8003962
    Abstract: A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    Type: Grant
    Filed: April 24, 2009
    Date of Patent: August 23, 2011
    Assignee: Gigaphoton Inc.
    Inventors: Hiroshi Someya, Tamotsu Abe, Hideo Hoshino
  • Patent number: 8000361
    Abstract: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: August 16, 2011
    Assignees: Komatsu Ltd., Gigaphoton Inc.
    Inventors: Tamotsu Abe, Hideo Hoshino, Akira Endo, Osamu Wakabayashi, Kouji Kakizaki
  • Publication number: 20110174996
    Abstract: A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    Type: Application
    Filed: April 6, 2011
    Publication date: July 21, 2011
    Applicant: GIGAPHOTON, INC.
    Inventors: Hiroshi SOMEYA, Tamotsu ABE, Hideo HOSHINO
  • Publication number: 20110057126
    Abstract: An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
    Type: Application
    Filed: November 10, 2010
    Publication date: March 10, 2011
    Inventors: HIDEO HOSHINO, Tamotsu Abe, Akira Endo
  • Patent number: 7842937
    Abstract: An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.
    Type: Grant
    Filed: February 20, 2008
    Date of Patent: November 30, 2010
    Assignees: Komatsu Ltd., Gigaphoton
    Inventors: Hideo Hoshino, Tamotsu Abe, Akira Endo
  • Publication number: 20100217444
    Abstract: A temperature controller for a gas laser which controls temperatures of a plurality of temperature-controlled apparatuses including a first temperature-controlled portion requiring a high-precision temperature-control and a second temperature-controlled portion requiring a low-precision temperature-control as compared with the first temperature-controlled portion and allowing a temperature-control with a low or high temperature as compared with the first temperature-controlled portion, comprises a first temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each first temperature-controlled portion, a second temperature control portion generating a cooling agent or a heating agent for adjusting a temperature of each second temperature-controlled portion, a first piping system connecting the first temperature control portion and each first temperature-controlled portion in parallel, and a second piping system connecting the second temperature control portion an
    Type: Application
    Filed: February 23, 2010
    Publication date: August 26, 2010
    Inventors: Yukio Watanabe, Hideyuki Hayashi, Kouji Kakizaki, Michio Shinozaki, Hideo Hoshino
  • Publication number: 20100193711
    Abstract: An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.
    Type: Application
    Filed: January 12, 2010
    Publication date: August 5, 2010
    Inventors: Yukio WATANABE, Osamu Wakabayashi, Junichi Fujimoto, Toshihiro Nishisaka, Hiroshi Someya, Hideo Hoshino
  • Publication number: 20100181503
    Abstract: In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.
    Type: Application
    Filed: December 15, 2009
    Publication date: July 22, 2010
    Inventors: Tatsuya Yanagida, Akira Endo, Hiroshi Komori, Shinji Nagai, Kouji Kakizaki, Tamotsu Abe, Hideo Hoshino
  • Publication number: 20100090132
    Abstract: An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.
    Type: Application
    Filed: September 15, 2009
    Publication date: April 15, 2010
    Inventors: Akira ENDO, Hideo Hoshino, Kouji Kakizaki, Tamotsu Abe, Akira Sumitani, Takanobu Ishihara, Shinji Nagai, Osamu Wakabayashi, Hakaru Mizoguchi
  • Publication number: 20100078577
    Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.
    Type: Application
    Filed: September 16, 2009
    Publication date: April 1, 2010
    Applicant: Gigaphoton Inc.
    Inventors: Masato Moriya, Hideo Hoshino, Osamu Wakabayashi, Hakaru Mizoguchi
  • Publication number: 20100078580
    Abstract: An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
    Type: Application
    Filed: September 25, 2009
    Publication date: April 1, 2010
    Applicant: Gigaphoton Inc.
    Inventors: Akira Endo, Krzysztof Nowak, Hideo Hoshino, Tatsuya Ariga, Masato Moriya, Osamu Wakabayashi
  • Publication number: 20100019173
    Abstract: A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
    Type: Application
    Filed: April 24, 2009
    Publication date: January 28, 2010
    Inventors: Hiroshi Someya, Tamotsu Abe, Hideo Hoshino
  • Publication number: 20090301517
    Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.
    Type: Application
    Filed: June 4, 2009
    Publication date: December 10, 2009
    Applicant: KOMATSU LTD.
    Inventors: Takeshi Asayama, Hiroshi Someya, Masato Moriya, Hideo Hoshino, Tamotsu Abe
  • Publication number: 20090261242
    Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
    Type: Application
    Filed: March 18, 2009
    Publication date: October 22, 2009
    Applicants: GIGAPHOTON INC., KOMATSU LTD.
    Inventors: Yoshifumi UENO, Osamu WAKABAYASHI, Tamotsu ABE, Akira SUMITANI, Hideo HOSHINO, Akira ENDO, Georg SOUMAGNE
  • Publication number: 20090232171
    Abstract: The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.
    Type: Application
    Filed: March 9, 2009
    Publication date: September 17, 2009
    Inventors: Tamotsu Abe, Hideo Hoshino, Akira Endo, Osamu Wakabayashi, Kouji Kakizaki
  • Publication number: 20090224181
    Abstract: An extreme ultra violet light source apparatus in which debris staying and accumulating within a chamber can be prevented from contaminating the chamber and deteriorating the performance of important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.
    Type: Application
    Filed: March 9, 2009
    Publication date: September 10, 2009
    Inventors: Tamotsu Abe, Toshihiro Nishisaka, Hiroshi Someya, Masato Moriya, Takeshi Asayama, Hideo Hoshino, Hakaru Mizoguchi