Patents by Inventor Hideo Komatsu
Hideo Komatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7914708Abstract: The present invention is to provide a conductive masterbatch using a polyamide resin, the conductive masterbatch that has an excellent kneadability/manufacturability and formability and an excellent dispersibility of conductive fillers such as a carbon black, and shows stable conductivity even when a large amount of such conductive fillers are contained therein, and a resin composition containing the conductive masterbatch. That is, the present invention is to provide the conductive masterbatch, which includes at least a conductive filler selected from carbon blacks and carbon nanotubes, a polyamide resin, and a copolymer which contains at least a vinyl monomer having a functional group reactive with the polyamide resin and a styrene as monomer units, and in which the content of the conductive filler is in the range of 10% by mass to 40% by mass, and the resin composition containing the conductive masterbatch.Type: GrantFiled: October 31, 2005Date of Patent: March 29, 2011Assignee: Lion CorporationInventors: Norio Tobori, Hideo Komatsu, Kotaro Tanaka, Kazuaki Uchiyama
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Publication number: 20080191176Abstract: The present invention is to provide a conductive masterbatch using a polyamide resin, the conductive masterbatch that has an excellent kneadability/manufacturability and formability and an excellent dispersibility of conductive fillers such as a carbon black, and shows stable conductivity even when a large amount of such conductive fillers are contained therein, and a resin composition containing the conductive masterbatch. That is, the present invention is to provide the conductive masterbatch, which includes at least a conductive filler selected from carbon blacks and carbon nanotubes, a polyamide resin, and a copolymer which contains at least a vinyl monomer having a functional group reactive with the polyamide resin and a styrene as monomer units, and in which the content of the conductive filler is in the range of 10% by mass to 40% by mass, and the resin composition containing the conductive masterbatch.Type: ApplicationFiled: October 31, 2005Publication date: August 14, 2008Inventors: Norio Tobori, Hideo Komatsu, Kotaro Tanaka, Kazuaki Uchiyama
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Patent number: 6149848Abstract: A method for preparing a conductive thermoplastic resin composition or an electric conductor includes the step of kneading (a) conductive resin master batch pellets of conductive carbon black and a thermoplastic resin in which the conductive carbon black accounts for 5 to 50% by weight relative to the total amount 100 parts by weight of the conductive carbon black and the thermoplastic resin, (b) a thermoplastic resin in a weight ratio: (a+b)/(a) ranging from 1.01 to 1.5. This method permits the production of a conductive carbon black-containing conductive resin composition and an electric conductor which show stable conductivity even within a high resistance region (having a surface resistivity ranging from 10.sup.6 to 10.sup.16 .OMEGA.), wherein the control of the conductivity is difficult.Type: GrantFiled: June 10, 1998Date of Patent: November 21, 2000Assignee: Lion CorporationInventors: Masayuki Makise, Michio Narita, Seiji Maeno, Hideo Komatsu
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Patent number: 5876647Abstract: A method for preparing a conductive thermoplastic resin composition or an electric conductor includes the step of kneading (a) conductive resin master batch pellets of conductive carbon black and a thermoplastic resin in which the conductive carbon black accounts for 5 to 50% by weight relative to the total amount 100 parts by weight of the conductive carbon black and the thermoplastic resin, (b) a thermoplastic resin in a weight ratio: (a+b)/(a) ranging from 1.01 to 1.5. This method permits the production of a conductive carbon black-containing conductive resin composition and an electric conductor which show stable conductivity even within a high resistance region (having a surface resistivity ranging from 10.sup.6 to 10.sup.16 .OMEGA.), wherein the control of the conductivity is difficult.Type: GrantFiled: October 19, 1996Date of Patent: March 2, 1999Assignee: Lion CorporationInventors: Masayuki Makise, Michio Narita, Seiji Maeno, Hideo Komatsu
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Patent number: 5127987Abstract: A plurality of resist membranes are formed on a membrane of goods to be etched. The top resist is patterned by light beam, laser beam, X-rays, or electron beams. The wafer is transferred to a first unit into which discharging gas is introduced and plasma is generated in order to dry-etch the multilayer resists. The multilayer is transferred to a second unit in vacuum environment. In the second unit, the membrane of the wafer is dry-etched in a predetermined depth. The wafer then is transferred to a third unit in vacuum atmosphere so as to remove part of the resist depending a mask pattern and treat the resist by plasma.Type: GrantFiled: October 31, 1990Date of Patent: July 7, 1992Assignee: Kokusai Electric Co., Ltd.Inventors: Sadayuki Okudaira, Hideo Komatsu, Osamu Matsumoto, Motoichi Kanazawa
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Patent number: 4581101Abstract: A dry-etching process comprising dry-etching treatment of semiconductor material by action of a gas and, if necessary, cleaning treatment, characterized in that at least one of the dry-etching and cleaning treatments is conducted under action of a gas composed essentially of a fluorinated ether.Type: GrantFiled: October 4, 1984Date of Patent: April 8, 1986Assignees: Asahi Glass Company Ltd., Kokusai Electric Co., Ltd.Inventors: Makoto Senoue, Kunihiko Terase, Shinya Iida, Hideo Komatsu
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Patent number: 4555542Abstract: A polyester-polyether copolymer composition which comprises a polyester-polyether copolymer composed mainly of an aromatic dicarboxylic acid, 1,4-butanediol, and a polyalkylene glycol of average molecular weight from about 400 to 6,000, an effective amount of organotin compound, and an amide-containing phenolic antioxidant having the following general moiety: ##STR1## (where R is a secondary or tertiary alkyl group, R' is a hydrogen atom or a secondary or tertiary alkyl group, and n is from 0 to 6).Type: GrantFiled: December 21, 1983Date of Patent: November 26, 1985Assignee: Toray Industries, Inc.Inventors: Hideo Komatsu, Hiroyuki Harada, Tomiji Matsuki
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Patent number: 4531009Abstract: A process for producing an .alpha.,.omega.-bis(2-chlorophenoxy)alkane-4,4'-dicarboxylic acid or its ester, that has a high Young's modulus and that is useful as a material for polyesters capable to form self-extinguishing fibers and films. Thus .alpha.,.omega.-bis(2-chlorophenoxy)alkane-4,4'-dicarboxylic acid or its ester is obtained by reacting .alpha.,.omega.-bis(phenoxy)alkane-4,4'-dicarboxylic acid or its ester with chlorine in the presence of a solvent selected from the group consisting of lower fatty acid having 2 to 6 carbon atoms, hydrocarbon chloride having 1 to 8 carbon atoms, and carbon chloride having 1 to 2 carbon atoms, in high yield.Type: GrantFiled: September 12, 1983Date of Patent: July 23, 1985Assignee: Toray Industries, Inc.Inventors: Toshihide Inoue, Hideo Komatsu
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Patent number: 4511429Abstract: This invention relates to a fine processing of aluminum and aluminum alloy layers, and to a method for dry etching by a plasma in a gas containing hydrogen and/or a gaseous hydrogen compound and further containing a gaseous chloride. The fine processing without suffering from the side-etching is feasible even in case using an inorganic material as a mask.Type: GrantFiled: December 15, 1982Date of Patent: April 16, 1985Assignee: Hitachi, Ltd.Inventors: Tatsumi Mizutani, Toshihide Ohgata, Hideo Komatsu
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Patent number: 4454038Abstract: An improvement in an apparatus for continuous biological treatment of waste water including a reactor having a feeding pipe and a distribution pipe at the top thereof for introducing waste water into the reactor, and a withdrawing pipe at the bottom thereof for removing treated water, and a particulate carrier having microbes attached thereto disposed within the reactor. The carrier is a particulate material having an apparent specific gravity smaller than the specific gravity of water, making it possible for the particulate material to float on water. A substantially fluidized bed of the carrier is formed by the buoyancy of the particulate material in the downflowing waste water to be treated.Type: GrantFiled: October 31, 1980Date of Patent: June 12, 1984Assignee: Chiyoda Chemical Engineering and Construction Co., Ltd.Inventors: Chiaki Shimodaira, Yoshinori Yushina, Hiroshi Kamata, Hideo Komatsu, Akinori Kurima, Osamu Mabu, Yoshiharu Tanaka
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Patent number: 4412119Abstract: A dry-etching method for working SiO.sub.2, phospho-silicate glass, Si, Mo, W, Cr, TiW, Si.sub.3 N.sub.4 or the like by the use of a glow discharge plasma involves the steps of introducing He, Ar, N.sub.2, O.sub.2 or a mixed gas thereof into a reaction chamber from the outside; and effecting the plasma discharge in the reaction chamber so that a reactive gas is liberated from a high molecular resin material arranged in the reaction chamber and containing fluorine atoms. The dry-etching method requires and uses no expensive gas containing a fluorocarbon, but has sufficient etching rate and selectivity.Type: GrantFiled: May 5, 1981Date of Patent: October 25, 1983Assignee: Hitachi, Ltd.Inventors: Hideo Komatsu, Shinya Iida, Tatsumi Mizutani, Kazuyoshi Ueki
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Patent number: 4352974Abstract: A plasma etcher wherein the provision of a gas outlet directly in an etching chamber is avoided and wherein a subchamber having a sufficient capacity is connected to the etching chamber through a joint part, the gas outlet being provided in this subchamber. With the apparatus, the distribution of etching rates in plasma etching becomes uniform.Type: GrantFiled: July 29, 1980Date of Patent: October 5, 1982Assignee: Hitachi, Ltd.Inventors: Tatsumi Mizutani, Norio Kanai, Kunio Harada, Hideo Komatsu, Shinya Iida
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Patent number: 4308089Abstract: Disclosed is a method for preventing corrosion of Al and Al alloys processed by the dry-etching method, which comprises (i) the step of sputtering Al or Al alloy in an ammonia-containing atmosphere and (ii) the step of washing the sputtered Al or Al alloy with an alkaline aqueous solution and then with water after termination of the step (i).According to this method, corrosion of Al or Al alloy by halogen element-containing substances stuck to Al or Al alloy during the dry-etching treatment can be effectively prevented.Type: GrantFiled: May 9, 1980Date of Patent: December 29, 1981Assignee: Hitachi, Ltd.Inventors: Shinya Iida, Kazuyoshi Ueki, Tatsumi Mizutani, Hideo Komatsu, Kado Hirobe
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Patent number: 4289188Abstract: Method and apparatus for monitoring a dry etching process using gas plasma, wherein a ratio of a spectrum intensity which varies depending on the process of the etching process to a spectrum intensity which is independent of the process of the etching process is determined and a resulting signal intensity is monitored. The completion of the etching process can be exactly determined irrespective of variation of the etching conditions.Type: GrantFiled: May 19, 1980Date of Patent: September 15, 1981Assignee: Hitachi, Ltd.Inventors: Tatsumi Mizutani, Kazuyoshi Ueki, Shinya Iida, Hideo Komatsu
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Patent number: 4267013Abstract: A method for dry-etching Al and Al alloys is disclosed, which comprises producing plasma discharges with a mixed gas comprising boron trichloride and freon and/or oxygen incorporated therein and patterning Al or an Al alloy by the produced discharges. In this dry etching method, the etch rate of Al or an Al alloy can be remarkably improved over the etch rate attainable according to the conventional techniques, and the difference of the etch rate between Al or an Al alloy and other material can be remarkably increased.Type: GrantFiled: June 5, 1979Date of Patent: May 12, 1981Assignee: Hitachi, Ltd.Inventors: Shinya Iida, Kazuyoshi Ueki, Hideo Komatsu, Tatsumi Mitzutani
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Patent number: 4256573Abstract: This invention relates to biological treatment of waste water using a carrier floatable on water, and more particularly to a novel process for treatment of waste water utilizing a fluidized bed which is formed by supplying waste water in a downflow operation. The process for treatment of waste water of this invention is applicable to both anaerobic and aerobic biological treatment. A good example of the former anaerobic biological treatment to which this invention is applicable is the process wherein the nitrate or nitrite nitrogen which is one of the nitrogen compounds that are at present believed to be one cause of the eutrophication in rivers, lakes, seas, etc. is treated with denitrifying bacteria in an anaerobic condition to be released in the form of nitrogen gas, and the typical of the latter aerobic treatment is the practice in the utilization of the action of the aerobic bacteria which can oxidize organic substances in sewage, industrial waste waters, etc.Type: GrantFiled: February 14, 1979Date of Patent: March 17, 1981Assignee: Chiyoda Chemical Engineering and Construction Co., Ltd.Inventors: Chiaki Shimodaira, Yoshinori Yushina, Hiroshi Kamata, Hideo Komatsu, Akinori Kurima, Osamu Mabu, Yoshiharu Tanaka
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Patent number: 4035441Abstract: A polyester filament in which a polyether-polyester block copolymer is dispersed as fine striae along the filament axis, at least one of which is substantially endless. Process for preparing the same includes a melt spinning apparatus with static mixing elements interposed between separate molten polymer feed passageways and spinneret holes.Type: GrantFiled: June 24, 1974Date of Patent: July 12, 1977Assignee: Toray Industries, Inc.Inventors: Tadakazu Endo, Masanori Takeuchi, Tuneo Hanada, Kiyoshi Nakagawa, Hideo Komatsu, Itaru Nakamura