Patents by Inventor Hideo Miyata
Hideo Miyata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110098411Abstract: An object of the present invention is to provide a curable composition which has excellent handling properties and which is able to form a cured product excellent in transparency, heat resistance, environment resistance and molding processability. The curable composition of the present invention comprises (a) silica fine particles, (b) a (meth)acrylate having at least two ethylenic unsaturated groups and no ring structure, (c) a (meth)acrylate having an ethylenic unsaturated group and an alicyclic structure, and (d) a polymerization initiator, said silica fine particles (a) are surface-treated with a silane compound (e) represented by the following general formula (1) and a silane compound (f) represented by the following general formula (2).Type: ApplicationFiled: June 30, 2009Publication date: April 28, 2011Applicant: SHOWA DENKO K.K.Inventors: Shigeru Yamaki, Hideo Miyata, Nobuyuki Mitarai, Nobuaki Ishii, katsumi Kurofushi
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Patent number: 7888399Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.Type: GrantFiled: January 25, 2007Date of Patent: February 15, 2011Assignee: Showa Denko K.K.Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori
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Publication number: 20100273940Abstract: It is an object of the present invention to provide an epoxy resin curing agent which has a favorable pot life and good storage stability as a curing agent for epoxy resins and from which an epoxy resin cured product having good water resistance and hardness is obtained through curing. The present invention is an epoxy resin curing agent containing a secondary or tertiary branched thiol compound having a substituent on a carbon atom at the ?-position to a thiol group, and is also an epoxy resin composition comprising a polyvalent epoxy compound and the epoxy resin curing agent.Type: ApplicationFiled: December 8, 2008Publication date: October 28, 2010Applicant: SHOWA DENKO K.K.Inventors: Yoshifumi Urakawa, Hideo Miyata, Isao Yamagami, Katsumi Murofushi
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Publication number: 20100233596Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).Type: ApplicationFiled: August 14, 2007Publication date: September 16, 2010Applicant: SHOWA DENKO K.K.Inventors: Haruhiko Ikeda, Hideo Miyata, Yotaro Hattori, Katsumi Murofushi
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Patent number: 7790931Abstract: A process for preparing tetrafluorobenzene carbaldehyde alkyl acetal represented by the following formula (II), comprising reducing tetrafluorocyanobenzene represented by the following formula (I) with a metal catalyst containing a platinum group metal in the presence of an alkyl alcohol represented by R—OH (R is an alkyl group of 1 to 4 carbon atoms) and an acid; (I) wherein m is 1 or 2, n is 0 or 1, and m+n is 2, (II) wherein m and n are the same as those in the formula (I), and R is an alkyl group of 1 to 4 carbon atoms.Type: GrantFiled: June 12, 2006Date of Patent: September 7, 2010Assignee: Showa Denko K.K.Inventors: Haruhiko Ikeda, Hideo Miyata, Katsutoshi Ohno, Katsuro Urakawa
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Publication number: 20100145106Abstract: The present invention provides an industrially advantageous process for preparing nuclear halogenated methylbenzyl alcohol which is a useful substance as a raw material, an intermediate for manufacturing medicines, agricultural chemicals, etc. The process of the present invention for preparing nucleus-halogenated methylbenzyl alcohol represented by the following formula (II) comprises hydrogenating nucleus-halogenated benzene carbaldehyde represented by the following formula (I); wherein m is an integer of 0 to 3, and n is an integer of 1 to 4, with the proviso that m+n is an integer of 1 to 4, wherein m and n are the same as those in the formula (I).Type: ApplicationFiled: June 12, 2006Publication date: June 10, 2010Applicant: SHOWA DENKO K.K.Inventors: Haruhiko Ikeda, Hideo Miyata
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Publication number: 20100105954Abstract: A process for preparing tetrafluorobenzene carbaldehyde alkyl acetal represented by the following formula (II), comprising reducing tetrafluorocyanobenzene represented by the following formula (I) with a metal catalyst containing a platinum group metal in the presence of an alkyl alcohol represented by R—OH (R is an alkyl group of 1 to 4 carbon atoms) and an acid; (I) wherein m is 1 or 2, n is 0 or 1, and m+n is 2, (II) wherein m and n are the same as those in the formula (I), and R is an alkyl group of 1 to 4 carbon atoms.Type: ApplicationFiled: June 12, 2006Publication date: April 29, 2010Applicant: SHOWA DENKO K.K.Inventors: Haruhiko Ikeda, Hideo Miyata, Katsutoshi Ohno, Katsuro Urakawa
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Publication number: 20100029876Abstract: A polymerization accelerator includes a specific thiol compound. A curable composition of excellent thermal stability contains the polymerization accelerator. A cured product is obtained from the curable composition. The polymerization accelerator includes a thiol compound having two or more groups represented by Formula (1) below: wherein R1 is a hydrogen atom or a C1-10 alkyl group, and m is an integer of 0, 1 or 2.Type: ApplicationFiled: June 13, 2007Publication date: February 4, 2010Inventors: Hideo Miyata, Haruhiko Ikeda, Katsumi Murofushi, Yotaro Hattori, Katsuro Urakawa
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Patent number: 7504518Abstract: Disclosed is a process for producing a blocked isocyanate compound represented by general formula (III): wherein R1, R2, Q1, and Q2 are as defined in the specification, characterized by comprising reacting a pyrazole compound (I) with an ethylenically unsaturated group-containing isocyanate compound (II) at a temperature in the range of 0° C. to 90° C. The production process can efficiently produce a high-purity blocked isocyanate compound without substantially producing by-products. In the production process, unlike the prior art technique, since there is no need to use any inert solvent such as toluene or xylene, safety to the human body and environment is excellent and the production processes and equipment can be simplified. The blocked isocyanate compound produced by the production process contains no residual inert solvent and is suitable for use in extensive fields such as various coating agents, adhesives, and molding materials.Type: GrantFiled: October 27, 2005Date of Patent: March 17, 2009Assignee: Showa Denko K.K.Inventors: Hideo Miyata, Masatoshi Murakami, Katsutoshi Ohno
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Publication number: 20090023831Abstract: The present invention relates to a curable composition having high adhesiveness and transparency, comprising a thiol compound containing two or more groups represented by formula (1): wherein the symbols in the formula have the meanings as described in the specification; and an urethane compound containing an ethylenically unsaturated double bond represented by formula (2): wherein the symbols in the formula have the meanings as described in the specification.Type: ApplicationFiled: January 25, 2007Publication date: January 22, 2009Inventors: Hideo Miyata, Katsuro Urakawa, Haruhiko Ikeda, Yotaro Hattori
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Publication number: 20070265454Abstract: Disclosed is a process for producing a blocked isocyanate compound represented by general formula (III): wherein R1, R2, Q1, and Q2 are as defined in the specification, characterized by comprising reacting a pyrazole compound (I) with an ethylenically unsaturated group-containing isocyanate compound (II) at a temperature in the range of 0° C. to 90° C. The production process can efficiently produce a high-purity blocked isocyanate compound without substantially producing by-products. In the production process, unlike the prior art technique, since there is no need to use any inert solvent such as toluene or xylene, safety to the human body and environment is excellent and the production processes and equipment can be simplified. The blocked isocyanate compound produced by the production process contains no residual inert solvent and is suitable for use in extensive fields such as various coating agents, adhesives, and molding materials.Type: ApplicationFiled: October 27, 2005Publication date: November 15, 2007Applicant: SHOWA DENKO K.K.Inventors: Hideo Miyata, Masatoshi Murakami, Katsutoshi Ohno
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Patent number: 7227036Abstract: There is provided a process for producing an aminomethyl group-containing benzamide compound represented by the general formula (II): wherein —CONH2 and —X represent a substituent on the benzene ring and —CONH2 exists at the meta- or para-position of —CH2NH2, and X and n are as defined below, which comprises hydrating an aminomethyl group-containing benzonitrile compound represented by the general formula (I): wherein —CN and —X represent a substituent on the benzene ring and —CN exists at the meta- or para-position of —CH2NH2, X represents a chlorine atom or a fluorine atom, and n represents an integer of 0 to 4, provided that, when n is 2 or more, X may be the same or differentType: GrantFiled: May 2, 2003Date of Patent: June 5, 2007Assignee: Showa Denko K.K.Inventors: Yutaka Ohnishi, Hideo Miyata, Kimitaka Ohshiro
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Patent number: 7112647Abstract: An object of the present invention is to provide a fluorinated polymer of adequate molecular weight with excellent transparency in a wavelength range from visible to near infrared, and to also provide a method of producing such a polymer. The present invention provides a fluorinated polymer comprising a structure represented by a formula (1) as a structural unit, as well as a method of producing this polymer using a corresponding tetrafluoroxylylenediamine or a tetrafluoroxylylene glycol as a raw material.Type: GrantFiled: December 25, 2002Date of Patent: September 26, 2006Assignee: Showa Denko K.K.Inventors: Isamu Taguchi, Ryuji Monden, Nobutoshi Sasaki, Hideo Miyata, Kohei Morikawa
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Publication number: 20050203313Abstract: There is provided a process for producing an aminomethyl group-containing benzamide compound represented by the general formula (II): wherein —CONH2 and —X represent a substituent on the benzene ring and —CONH2 exists at the meta- or para-position of —CH2NH2, and X and n are as defined below, which comprises hydrating an aminomethyl group-containing benzonitrile compound represented by the general formula (I): wherein —CN and —X represent a substituent on the benzene ring and —CN exists at the meta- or para-position of —CH2NH2, X represents a chlorine atom or a fluorine atom, and n represents an integer of 0 to 4, provided that, when n is 2 or more, X may be the same or different.Type: ApplicationFiled: May 2, 2003Publication date: September 15, 2005Inventors: Yutaka Ohnishi, Hideo Miyata, Kimitaka Ohshiro
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Publication number: 20050080230Abstract: An object of the present invention is to provide a fluorinated polymer of adequate molecular weight with excellent transparency in a wavelength range from visible to near infrared, and to also provide a method of producing such a polymer. The present invention provides a fluorinated polymer comprising a structure represented by a formula (1) as a structural unit, as well as a method of producing this polymer using a corresponding tetrafluoroxylylenediamine or a tetrafluoroxylylene glycol as a raw material.Type: ApplicationFiled: December 25, 2002Publication date: April 14, 2005Inventors: Isamu Taguchi, Ryuji Monden, Nobutoshi Sasaki, Hideo Miyata, Kohei Morikawa
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Patent number: 6624336Abstract: The present invention relates to a process by a series of reactions using tetrafluorocyanobenzens as material for producing tetrafluorobenzenemethanols, tetrafluorobenzenecarbaldehyde dialkylacetals and tetrafluorobenzenecarbaldehydes in a high purity and a high yield which are useful as intermediates in the production of cyclopropanecarboxylic acid esters having insecticidal action, and also relates to a novel tetrafluorobenzenecarbaldehyde dimethylacetal.Type: GrantFiled: November 5, 2001Date of Patent: September 23, 2003Assignee: Showa Denko K.K.Inventors: Toru Sasaki, Tetsuhiro Furukawa, Toru Yoshida, Yutaka Ohnishi, Hiroyuki Monzen, Hideo Miyata, Kohei Morikawa
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Patent number: 6180801Abstract: The present invention intends to provide a method for producing 3-isochromanones represented by formula (II) useful as a synthetic starting material of medicals or agricultural chemicals and the cyano compound represented by formula (I) by an industrially advantageous method in a high yield. Disclosed herein is a method for manufacturing a 3-isochromanone represented by the following formula (II): (wherein R2, R3, R4 and R5 each independently represents a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group), said method is characterized by comprising the steps of: hydrolyzing a cyano compound represented by formula (I): (wherein R1 represents a hydrogen atom, an alkyl group or an aryl group, and R2, R3, R4 and R5 have the same meanings as defined above) and subjecting the hydrolyzate to intra-molecular cyclization.Type: GrantFiled: March 29, 1999Date of Patent: January 30, 2001Assignee: Showa Denko Kabushiki KaishaInventors: Hiroyuki Monzen, Hideo Miyata, Kimitaka Ooshiro, Kohei Morikawa
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Patent number: 6020517Abstract: A process for producing a fluorinated benzonitrile comprising hydrogenolyzing a fluorinated dicyanobenzene substituted with 1 to 4 fluorine atoms and having the remainder which may be substituted with a chlorine atom in the presence of a catalyst to cause hydrodecyanation of only the cyano group of one side and a process for producing a fluorinated benzyl alcohol comprising reducing the fluorinated benzonitrile and hydrolyzing the fluorinated benzonitrile and reducing the resultant corresponding fluorinated benzoic acid to convert the cyano group to a hydroxymethyl group.Type: GrantFiled: April 27, 1998Date of Patent: February 1, 2000Assignee: Showa Denko K.K.Inventors: Hiroyuki Monzen, Katsutoshi Morinaka, Hideo Miyata, Tsutomu Nozawa, Haruaki Ito, Kohei Morikawa
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Patent number: 5859289Abstract: The present invention provides a method for isolating N-phosphonomethylglycine which comprises adding an acid to precipitate salts from an aqueous solution of an alkali metal salt and/or an alkaline earth metal salt of N-phosphonomethylglycine solution to neutralize and adjust the same to a pH of 2.5 or higher, removing the precipitated salts, and adjusting the pH to 2.5 or lower to crystallize N-phosphonomethylglycine. N-phosphonomethylglycine is thus isolated and purified in high purity and good yield.Type: GrantFiled: March 11, 1997Date of Patent: January 12, 1999Assignee: Showa Denko K.K.Inventors: Hideo Miyata, Toru Sasaki, Kohei Morikawa
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Patent number: 5777158Abstract: The novel non-hygroscopic crystals of p-aminomethylbenzoic acid can be obtained by heating hygroscopic crystals of p-aminomethylbenzoic acid with keeping the hygroscopic crystals in contact with moisture to transit the hygroscopic crystals to non-hygroscopic crystals.The non-hygroscopic crystals of p-aminomethylbenzoic acid can be particularly advantageously handled in the atmosphere as compared with the conventional hygroscopic crystals. Especially when the p-aminomethylbenzoic acid is used for the non-aqueous reaction, the crystals of the invention are exceptionally advantageous from the viewpoints of removal of moisture and humidity control.Type: GrantFiled: August 26, 1997Date of Patent: July 7, 1998Assignee: Showa Denko K.K.Inventors: Motoo Miura, Hideo Miyata, Kohei Morikawa