Patents by Inventor Hideo Miyazaki

Hideo Miyazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6881892
    Abstract: A method is provided for designing an acoustic correction filter applicable to a stringed instrument, which is composed of a string member operable to undergo a vibration, a support member for supporting the string member, a body member responsive to the vibration transmitted through the support member for generating a natural sound and a mute attachment for muting the natural sound. The acoustic correction filter is operable when the natural sound is muted by the mute attachment for filtering a signal derived from the vibration so as to create an artificial sound instead of the muted natural sound.
    Type: Grant
    Filed: February 18, 2003
    Date of Patent: April 19, 2005
    Assignee: Yamaha Corporation
    Inventors: Hideo Miyazaki, Shinji Kishinaga, Youjiro Takabayashi
  • Publication number: 20040226881
    Abstract: A photographic waste liquid treatment method comprises an electrolytic oxidation treatment for photographic waste liquid.
    Type: Application
    Filed: May 14, 2004
    Publication date: November 18, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Hideo Miyazaki, Kazuhiko Matsumoto
  • Publication number: 20040025675
    Abstract: A method is provided for designing an acoustic correction filter applicable to a stringed instrument, which is composed of a string member operable to undergo a vibration, a support member for supporting the string member, a body member responsive to the vibration transmitted through the support member for generating a natural sound and a mute attachment for muting the natural sound. The acoustic correction filter is operable when the natural sound is muted by the mute attachment for filtering a signal derived from the vibration so as to create an artificial sound instead of the muted natural sound.
    Type: Application
    Filed: February 18, 2003
    Publication date: February 12, 2004
    Applicant: Yamaha Corporation
    Inventors: Hideo Miyazaki, Shinji Kishinaga, Youjiro Takabayashi
  • Publication number: 20040011736
    Abstract: A wastewater treatment control system for controlling a wastewater treatment of using a microorganism that can degrade a specific compound, comprises measuring a specific value corresponding to a concentration of the specific compound in wastewater, and controlling the wastewater treatment on the basis of the specific value.
    Type: Application
    Filed: March 6, 2003
    Publication date: January 22, 2004
    Inventors: Takatoshi Ishikawa, Noboru Sasaki, Hideo Miyazaki
  • Patent number: 6608903
    Abstract: A space surrounding a sound source (S) which is set in a sound field (10) to be reproduced is divided into sound source element regions (S1 to Sn), and a space surrounding a sound receiving point (R) is divided into sound receiving element regions (R1 to Rm). An impulse response when a sound radiated from the sound source (S) is emitted from one of the sound source element regions (S1 to Sn), passes through the sound field (10), enters one of the sound receiving element regions (R1 to Rm), and then reaches the sound receiving point (R) is obtained for each of combinations of the sound source element regions (S1 to Sn) and the sound receiving element regions (R1 to Rm). A sound emitted from a real sound source (Sr) in an arbitrary real space (26) is picked up by microphones (MC1 to MCn) placed correspondingly with the sound source element regions (S1 to Sn).
    Type: Grant
    Filed: August 16, 2000
    Date of Patent: August 19, 2003
    Assignee: Yamaha Corporation
    Inventors: Hideo Miyazaki, Yasushi Shimizu
  • Publication number: 20030113903
    Abstract: The present invention is a method of remedying contaminated soil comprises: providing microorganisms capable of degrading soil contaminants to contaminated soil, in which the microorganisms is supported on a carrier; and providing nutrients for the microorganisms to the contaminated soil on the condition that the nutrients can be gradually released, and a microorganism preparation for remedying soil.
    Type: Application
    Filed: September 10, 2002
    Publication date: June 19, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Hideo Miyazaki
  • Patent number: 5575915
    Abstract: A method of removing silver from a solution containing silver halide and silver ion is described, which comprises a step of adding an a sulfur atom-containing hydrophilic polymer chelating agent to the solution.
    Type: Grant
    Filed: June 2, 1995
    Date of Patent: November 19, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Takashi Nakamura, Yasuhiro Nakayama, Haruhiko Iwano, Hideo Miyazaki
  • Patent number: 4857987
    Abstract: Herein disclosed is a semiconductor device including a plurality of IIL elements which are electrically connected by a plurality of first wirings arranged generally parallel with one another and a plurality of second wirings arranged generally parallel with one another and extended in different direction to the first wirings.
    Type: Grant
    Filed: September 19, 1988
    Date of Patent: August 15, 1989
    Assignees: Hitachi, Ltd., Hitachi Microcomputer Engineering Ltd.
    Inventors: Setsuo Ogura, Kazuyuki Kamegaki, Kouichi Yamazaki, Hideo Miyazaki, Yukinori Kitamura, Shirou Mayuzumi
  • Patent number: 4788132
    Abstract: A silver halide color reversal photographic material is disclosed which comprises a support and at least one blue-sensitive silver halide emulsion layer, at least one green-sensitive silver halide emulsion layer and at least one red-sensitive silver halide emulsion layer on the support, which material is characterized in that at least one light-sensitive silver halide emulsion layer or at least one layer adjacent thereto contains at least one of the compounds represented by the following general formulae (I), (II), (III) and (IV): ##STR1## All the symbols used are as defined in the Specification.
    Type: Grant
    Filed: July 10, 1986
    Date of Patent: November 29, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoyasu Deguchi, Tetsuro Kojima, Hideo Miyazaki, Shigeru Ohno, Koki Nakamura
  • Patent number: 4772546
    Abstract: A silver halide photographic material is described, having at least one light-sensitive silver halide emulsion layer containing an iodine-containing silver halide on a support and having one or more auxiliary layers on the outermost surface of a light-sensitive silver halide emulsion layer positioned farthest from the support, wherein at least one of the auxiliary layers contains a substantially non-light-sensitive silver halide emulsion or a silver halide emulsion containing grains whose inner part or surface part is fogged, and the material contains at least one compound represented by formula (I) ##STR1## wherein R, X, Y, Z, and n are described in the specification.
    Type: Grant
    Filed: October 10, 1986
    Date of Patent: September 20, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoyasu Deguchi, Tetsuro Kojima, Hideo Miyazaki, Shigeru Ohno, Koki Nakamura
  • Patent number: 4770948
    Abstract: There is provided a high-purity molybdenum target or high-purity molybdenum silicide target for LSI electrodes which comprises a high-purity metallic molybdenum having an alkali metal content of not more than 100 ppb and a radioactive element content of not more than 10 ppb. Further, a process is provided for producing such target comprising a wet purification processing followed by a series of dry processings.
    Type: Grant
    Filed: June 23, 1986
    Date of Patent: September 13, 1988
    Assignees: Nihon Kogyo Kabushiki Kaisha, Nippon Telegraph and Telephone Corporation
    Inventors: Hideo Oikawa, Takao Amazawa, Nakahachiro Honna, Hideo Miyazaki, Iwao Kyono, Nobuyuki Mori, Yoshiharu Katoh, Masami Kuroki
  • Patent number: 4740454
    Abstract: A silver halide photographic material comprising a support having thereon at least one light-sensitive silver halide emulsion layer containing tabular silver halide grains which have a diameter not less than 5 times the thickness thereof and account for at least 50% of the total projected area of the silver halide grains present in the silver halide emulsion layer and the silver halide photographic material also contains at least one compound represented by following general formulae (I), (II), (III) and (IV): ##STR1## wherein R represents a straight chain, branched chain or cyclic alkylene group, a straight chain or branched chain alkenylene group, a straight chain or branched chain aralkylene group or an arylene group; R.sub.
    Type: Grant
    Filed: July 17, 1986
    Date of Patent: April 26, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoyasu Deguchi, Tetsuro Kojima, Hideo Miyazaki, Shigeru Ohno, Koki Nakamura
  • Patent number: 4696894
    Abstract: A silver halide photographic material exhibiting improved interimage effects and having improved sharpness and graininess is disclosed. The material contains at least one compound represented by formula (I) or formula (II): ##STR1## wherein R.sup.1 represents a straight or branched chain alkylene, alkenylene or aralkylene group, or an arylene group; R.sup.2 represents a hydrogen atom, or a substituted or unsubstituted alkyl, aryl, alkenyl or aralkyl group; X represents a hydrogen atom, an alkali metal atom, an ammonium group or a precursor capable of providing a hydrogen atom or an alkali metal atom under an alkaline condition; Z.sup.1 and Z.sup.2 each represents a polar group; and n represents 0 or 1.
    Type: Grant
    Filed: December 24, 1985
    Date of Patent: September 29, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoyasu Deguchi, Tetsuro Kojima, Shigeru Ohno, Koki Nakamura, Hideo Miyazaki
  • Patent number: 4619695
    Abstract: A high-purity high-melting metal target or high-purity high-melting metal silicide target for LSI electrodes having an alkali metal content of not more than 100 ppb and a radioactive element content of not more than 10 ppb is provided by a wet purification process followed by a series of dry processings. Preferably the high-melting metal is molybdenum, tungsten, titanium, niobium or tantalum. More preferably, the high-melting metal is molybdenum.
    Type: Grant
    Filed: July 26, 1984
    Date of Patent: October 28, 1986
    Assignees: Nihon Kogyo Kabushiki Kaisha, Nippon Telegraph & Telephone Public Corporation
    Inventors: Hideo Oikawa, Takao Amazawa, Nakahachiro Honma, Hideo Miyazaki, Iwao Kyono, Nobuyuki Mori, Yoshiharu Katoh, Masami Kuroki