Patents by Inventor Hideo Nishino

Hideo Nishino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110003955
    Abstract: To provide an imide oligomer, excellent in thermal moldability, having excellent heat resistance as a thermally-cured polyimide resin, and that is obtainable easily and inexpensively. An imide oligomer including a nonaxisymmetric site derived from one nonaxisymmetric aromatic diamine molecule represented by below formula (1), only at a central portion of the oligomer chain, in the formula (1), W is a direct bond, —O—, —CH2—, —C2H4—, —C(CH3)2—, —CF2—, —C2F4—, —C(CF3)2—, —C(?O)—, —NH—, —NH—C(?O)—, —S—, —S(?O)—, or —S(?O)2—.
    Type: Application
    Filed: July 28, 2008
    Publication date: January 6, 2011
    Applicant: DAIWA CAN COMPANY
    Inventors: Hideo Nishino, Yasuyo Watanabe, Yoichiro Inoue
  • Patent number: 6808603
    Abstract: The present invention provides a novel method for absolute asymmetric synthesis by irradiation with circularly polarized light, which comprises providing a photochemically reversible reaction system in which the starting material is a mixture of enantiomers or diastereomers not photochemically or thermally converted into each other; and irradiating the reaction system with right- or left-circularly polarized light to excite the starting material alone or both of the starting material and the product, thereby concentrating one of the enantiomers or diastereomers in the starting material and one of the enantiomers or diastereomers in the product that corresponds to the enantiomer or diastereomer not concentrated in the starting material.
    Type: Grant
    Filed: February 22, 2002
    Date of Patent: October 26, 2004
    Assignee: Japan Science and Technology Corporation
    Inventors: Hideo Nishino, Asao Nakamura, Yoshihisa Inoue
  • Patent number: 5041506
    Abstract: A method for the production of a molecular composite of an aromatic polymer and matrix polymer suitable for use as structural materials for aircraft, automobiles and spacecraft using a solution of low corrosiveness, thereby resulting in a polymer alloy with excellent structural properties wherein physical degradation of the alloy is reduced and the corrosive effect of the alloy on metals in contact with the alloy is also reduced.
    Type: Grant
    Filed: July 8, 1988
    Date of Patent: August 20, 1991
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Masataka Kumata, Hideo Nishino, Atsuko Takada
  • Patent number: 4948867
    Abstract: A method of producing a prepolymer of aromatic polythiazole from an aromatic diaminodithiol compound or a salt thereof and a dicarboxylic acid derivative, the prepolymer having a repeating unit represented by the following general formula: ##STR1## wherein R.sub.1 is an aromatic group having at least one benzene nucleus, and R.sub.2 is a residual group of the dicarboxylic acid derivative, comprising the step of polymerizing the aromatic diaminodithiol compound or a salt thereof and the dicarboxylic acid derivative by an interfacial polymerization method.
    Type: Grant
    Filed: June 2, 1989
    Date of Patent: August 14, 1990
    Assignee: Honda Giken Koygo Kabushiki Kaisha
    Inventors: Hideo Nishino, Tatsuya Hattori, Tsuneharu Kushida, Masataka Kumata
  • Patent number: 4945153
    Abstract: A method of producing a prepolymer of aromatic polythiazole from an aromatic diaminodithiol compound salt and a dicarboxylic acid derivative, comprising the step of polymerizing the aromatic diaminodithiol compound salt and the dicarboxylic acid derivative in the presence of a phosphoric acid compound at a temperature of 70.degree.-140.degree. C.
    Type: Grant
    Filed: June 7, 1989
    Date of Patent: July 31, 1990
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Hideo Nishino, Tatsuya Hattori, Tsuneharu Kushida, Masataka Kumata