Patents by Inventor Hideo Shiozawa

Hideo Shiozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8946750
    Abstract: A semiconductor light emitting device includes a light emitting unit, a first and second conductive pillar, a sealing unit, a translucent layer, and a wavelength conversion layer. The light emitting unit includes a first and second semiconductor layer and a light emitting layer. The first semiconductor layer has a first and second major surface. The first major surface has a first and second portion. The second major surface is opposed the first major surface and has a third and fourth portion. The light emitting layer is provided on the first portion. The second semiconductor layer is provided on the light emitting layer. The first conductive pillar is provided on the second portion. The second conductive pillar is provided on the second semiconductor layer. The translucent layer is provided on the fourth portion. The wavelength conversion layer is provided on the third portion and on the translucent layer.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 3, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kazuhito Higuchi, Hideo Shiozawa, Takayoshi Fujii, Akihiro Kojima, Susumu Obata, Toshiyuki Terada
  • Publication number: 20130256727
    Abstract: A semiconductor light emitting device includes a light emitting unit, a first and second conductive pillar, a sealing unit, a translucent layer, and a wavelength conversion layer. The light emitting unit includes a first and second semiconductor layer and a light emitting layer. The first semiconductor layer has a first and second major surface. The first major surface has a first and second portion. The second major surface is opposed the first major surface and has a third and fourth portion. The light emitting layer is provided on the first portion. The second semiconductor layer is provided on the light emitting layer. The first conductive pillar is provided on the second portion. The second conductive pillar is provided on the second semiconductor layer. The translucent layer is provided on the fourth portion. The wavelength conversion layer is provided on the third portion and on the translucent layer.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 3, 2013
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kazuhito HIGUCHI, Hideo SHIOZAWA, Takayoshi FUJII, Akihiro KOJIMA, Susumu OBATA, Toshiyuki TERADA
  • Patent number: 7295588
    Abstract: The present invention provides a semiconductor laser element, a method of fabrication thereof, and a multi-wavelength monolithic semiconductor laser device that achieve self-sustained pulsation up to a high output level and achieve self-sustained pulsation over a wide output range.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: November 13, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akira Tanaka, Hideo Shiozawa, Minoru Watanabe, Koichi Gen-Ei, Hirokazu Tanaka
  • Patent number: 7221692
    Abstract: A semiconductor laser device comprises: a cladding layer of a first conductivity type; an active layer provided on the cladding layer; and a cladding layer of a second conductivity type provided on the active layer. At least a part of the cladding layer of the second conductivity type has a ridge stripe. The ridge stripe includes: an upper part having substantially vertical sidewalls; and a lower portion having sidewalls inclined so that the stripe becomes wider toward the active layer.
    Type: Grant
    Filed: May 13, 2004
    Date of Patent: May 22, 2007
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akira Tanaka, Yoshiyuki Itoh, Osamu Horiuchi, Akio Makuta, Koichi Gen-Ei, Hideo Shiozawa
  • Publication number: 20050030997
    Abstract: A semiconductor laser device comprises: a cladding layer of a first conductivity type; an active layer provided on the cladding layer; and a cladding layer of a second conductivity type provided on the active layer. At least a part of the cladding layer of the second conductivity type has a ridge stripe. The ridge stripe includes: an upper part having substantially vertical sidewalls; and a lower portion having sidewalls inclined so that the stripe becomes wider toward the active layer.
    Type: Application
    Filed: May 13, 2004
    Publication date: February 10, 2005
    Inventors: Akira Tanaka, Yoshiyuki Itoh, Osamu Horiuchi, Akio Makuta, Koichi Gen-Ei, Hideo Shiozawa
  • Publication number: 20040156408
    Abstract: The present invention provides a semiconductor laser element, a method of fabrication thereof, and a multi-wavelength monolithic semiconductor laser device that achieve self-sustained pulsation up to a high output level and achieve self-sustained pulsation over a wide output range.
    Type: Application
    Filed: November 26, 2003
    Publication date: August 12, 2004
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Akira Tanaka, Hideo Shiozawa, Minoru Watanabe, Koichi Gen-Ei, Hirokazu Tanaka
  • Publication number: 20040062285
    Abstract: A semiconductor laser array including a plurality of index-guided semiconductor lasers different in oscillation wavelength is made by collectively controlling their double transverse modes and collectively processing them to form their current-blocking structures and buried layers. Thus, a semiconductor laser having a flat element surface and excellent in heat radiation can be made in a reduced number of manufacturing steps. When the laser array of this multi-wavelength type and a detector PD are mounted with a predetermined positional relationship, return light from an optical disk can be converted into a single point to enable detection thereof at PD on one chip. Therefore, an optical disk driving apparatus remarkably reduced in size and weight and having a high reliability can be realized.
    Type: Application
    Filed: September 16, 2003
    Publication date: April 1, 2004
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Ichiro Uchizaki, Kazushige Mori, Hideo Shiozawa
  • Patent number: 6646975
    Abstract: A semiconductor laser array including a plurality of index-guided semiconductor lasers different in oscillation wavelength is made by collectively controlling their double transverse modes and collectively processing them to form their current-blocking structures and buried layers. Thus, a semiconductor laser having a flat element surface and excellent in heat radiation can be made in a reduced number of manufacturing steps. When the laser array of this multi-wavelength type and a detector PD are mounted with a predetermined positional relationship, return light from an optical disk can be converted into a single point to enable detection thereof at PD on one chip. Therefore, an optical disk driving apparatus remarkably reduced in size and weight and having a high reliability can be realized.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: November 11, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ichiro Uchizaki, Kazushige Mori, Hideo Shiozawa
  • Patent number: 6618420
    Abstract: This is a double wavelength semiconductor laser unit having a first laser emitting a light of a first wavelength and a second laser emitting a light of a second wavelength different from the first wavelength. The first and second lasers are merged on a substrate. The first laser has a bulk active layer whose film thickness is 0.01 &mgr;m or more and 0.1 &mgr;m or less. And the second laser has an MQW active layer constituted by stacked structure composed of a quantum well layer and a barrier layer. By employing the bulk active layer for the first laser, it is possible to reduce the band gap discontinuity induced at a boundary between a cladding layer and the bulk active layer, and then decreases an operational voltage, and further improve the reliability of the first laser.
    Type: Grant
    Filed: August 15, 2000
    Date of Patent: September 9, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koichi Gen-Ei, Hideo Shiozawa, Akira Tanaka
  • Publication number: 20020064196
    Abstract: Inhibiting an reflective coating of a semiconductor laser from peeling. In addition to a p-InGaAlP ridge-stripe optical waveguide layer 6, a p-InGaAlP ridge-stripe 6a is formed on a p-InGaP etching stopper layer 5. Thereby, non-optical-waveguide swellings 13a are formed on both sides of an optical waveguide swelling 13.
    Type: Application
    Filed: November 15, 2001
    Publication date: May 30, 2002
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Hideo Shiozawa, Yoshio Yamamoto, Toshiyuki Nonomura, Kazuo Fukuoka
  • Patent number: 6165243
    Abstract: The present invention provides an air filter that is excellent in anti-molding and anti-bacterial functions. The anti-mold and anti-bacteria air filter is formed from fabric knitted and woven with a warp and/or a weft made of filiform thermoplastic resin including the organic anti-molding agent and filiform thermoplastic resin including the inorganic anti-bacterial agent. It is also possible to form multi-woven fabric knitted and woven with a warp made of filiform thermoplastic resin including the organic anti-molding agent and the filiform thermoplastic resin including the inorganic anti-bacterial agent.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: December 26, 2000
    Assignee: Hagihara Industries Inc.
    Inventors: Ei Kawaguchi, Hideo Shiozawa
  • Patent number: 5181218
    Abstract: An InGaAlP NAM structure laser is formed with a double-heterostructure section disposed on an n-type GaAs substrate. The double-heterostructure section includes a first cladding layer of n-type InGaAlP, a non-doped InGaP active layer, and a second cladding layer of p-type InGaAlP. An n-type GaAs current-blocking layer having a stripe opening and a p-type GaAs contact layer are sequentially formed on the second cladding layer by MOCVD crystal growth. A low-energy band gap region is defined in a central region of the active layer located immediately below the stripe opening. A high-energy band gap region is defined in a peripheral region of the active layer corresponding to a light output end portion of the laser and located immediately below the current-blocking layer. Therefore, self absorption of an oscillated laser beam at the output end portion can be reduced or prevented.
    Type: Grant
    Filed: November 29, 1990
    Date of Patent: January 19, 1993
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Ishikawa, Hajime Okuda, Hideo Shiozawa, Kazuhiko Itaya, Yukio Watanabe, Mariko Suzuki, Genichi Hatakoshi
  • Patent number: 5086511
    Abstract: A mobile receiver of the present invention which comprises memory means for storing therein receive frequency data and broadcasting station name data associated therewith with respect to respecitve areas, receivable/non-receivable decision means for determining broadcasting frequencies receivable at the current position, and means for comparing ones of the receive frequency data corresponding to one of the areas designated at operating means or ones of the receive frequency data corresponding to an automatically determined area with the receive frequency data stored in the memory means and for presenting one of the broadcasting station name data of the receive frequency at which the receiver is now receiving, whereby the user of the mobile receiver can advantageously know easily the name of one of broadcasting stations of the same broadcasting frequency located in different areas, to which the user is listening.
    Type: Grant
    Filed: March 8, 1990
    Date of Patent: February 4, 1992
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Akikazu Kobayashi, Hideo Shiozawa
  • Patent number: 5036521
    Abstract: In a semiconductor laser device, for emitting a laser beam having a wavelength .lambda., an n-type In.sub.0.5 (Ga.sub.1-x Al.sub.x)P first cladding layer is formed on an n-type GaAs substrate. An undoped InGaP active layer is formed on the first cladding layer and a p-type In.sub.0.5 (Ga.sub.1-x Al.sub.x).sub.0.5 P cladding layer is formed on the active layer. A p-type InGaP cap layer is formed on the second cladding layer and an n-type GaAs current restricting layer is formed on the second cladding layer. The aluminum composition ratio x of the cladding layer is 0.7. The active layer has a thickness of 0.06 .mu.m and the cladding layers have the same thickness H of 0.85 .mu.m. The active layer and the cladding layers have refractive indices n.sub.a and n.sub.c which satisfies the following inequalities:0.015.DELTA..sup.1/2 <d/.lambda.<0.028.DELTA..sup.-1/2and.DELTA.=(n.sub.a.sup.2 -n.sub.c.sup.2)/2n.sub.a.sup.2.
    Type: Grant
    Filed: November 21, 1989
    Date of Patent: July 30, 1991
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Genichi Hatakoshi, Kazuhiko Itaya, Shigeya Naritsuka, Masayuki Ishikawa, Hajime Okuda, Hideo Shiozawa, Yukio Watanabe, Yasuo Ohba, Yoshihiro Kokubun, Yutaka Uematsu
  • Patent number: 5034957
    Abstract: A semiconductor laser device using double heterostructure comprised of In.sub.x Ga.sub.y Al.sub.1-x-y P (0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1), capable of preventing the leakage of the carriers and thereby reducing the threshold current, being operative with small threshold current density and at high temperature, and having a long lifetime. The device may include a double heterostructure formed on the GaAs substrate, comprised of In.sub.x Ga.sub.y Al.sub.1-x-y P (0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1) including an active layer, the active layer having an impurity concentration not greater than 5.times.10.sup.16 cm.sup.-3. The device may include a double heterostructure formed on the GaAs substrate, comprised of InGaP active layer and p-type In.sub.q (Ga.sub.1-z Al.sub.z).sub.q P (0.ltoreq.q.ltoreq.1, 0.ltoreq.z.ltoreq.1) cladding layer with a value of z between 0.65 and 0.75. The device may include a double heterostructure formed on the GaAs substrate, comprised of In.sub.x Ga.sub.y Al.sub.1-x-y P (0.
    Type: Grant
    Filed: February 7, 1989
    Date of Patent: July 23, 1991
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuo Ohba, Yukie Nishikawa, Hajime Okuda, Masayuki Ishikawa, Hideto Sugawara, Hideo Shiozawa, Yoshihiro Kokubun
  • Patent number: 4987096
    Abstract: An InGaAlP NAM structure laser is formed with a double-heterostructure section disposed on an n-type GaAs substrate. The double-heterostructure section includes a first cladding layer of n-type InGaAlP, a non-doped InGaP active layer, and a second cladding layer of p-type InGaAlP. An n-type GaAs current-blocking layer having a stripe opening and a p-type GaAs contact layer are sequentially formed on the second cladding layer by MOCVD crystal growth. A low-energy band gap region is defined in a central region of the active layer located immediately below the stripe opening. A high-energy band gap region is defined in a peripheral region of the active layer corresponding to a light output end portion of the laser and located immediately below the current-blocking layer. Therefore, self absorption of an oscillated laser beam at the output end portion can be reduced or prevented.
    Type: Grant
    Filed: December 13, 1989
    Date of Patent: January 22, 1991
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Ishikawa, Hajime Okuda, Hideo Shiozawa, Kazuhiko Itaya, Yukio Watanabe, Mariko Suzuki, Genichi Hatakoshi
  • Patent number: 4893313
    Abstract: In a semiconductor laser device, for emitting a laser beam having a wavelength .lambda., an n-type In.sub.0.5 (Ga.sub.1-x Al.sub.x)P first cladding layer is formed on an n-type GaAs substrate. An undoped InGaP active layer is formed on the first cladding layer and a p-type In.sub.0.5 (Ga.sub.1-x Al.sub.x).sub.0.5 P cladding layer is formed on the active layer. A p-type InGaP cap layer is formed on the second cladding layer and an n-type GaAs current restricting layer is formed on the second cladding layer. The aluminum composition ratio x of the cladding layer is 0.7. The active layer has a thickness of 0.06 .mu.m and the cladding layers have the same thickness H of 0.85 .mu.m. The active layer and the cladding layers have refractive indices n.sub.a and n.sub.c which satisfies the following inequalities:0.015.DELTA..sup.1/2 <d/.lambda.<0.028.DELTA..sup.-1/2and.DELTA.=(n.sub.a.sup.2 -n.sub.c.sup.2)/2n.sub.a.sup.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: January 9, 1990
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Genichi Hatakoshi, Kazuhiko Itaya, Shigeya Naritsuka, Masayuki Ishikawa, Hajime Okuda, Hideo Shiozawa, Yukio Watanabe, Yasuo Ohba, Yoshihiro Kokubun, Yutaka Uematsu