Patents by Inventor Hideo Takakura

Hideo Takakura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230218761
    Abstract: A method for decomposing a compound represented by Formula (1) includes irradiating the compound with X-rays in a presence of an electron donor: wherein R111, R121, R131, and R141 each independently represent a monovalent organic group; p, q, r, and s each independently represent an integer of 0 or 1 to 4; in the case where two or more R111, R121, R131, and R141 are present, they may be identical to or different from one another or may be bonded to one another to form a ring; A101 represents a monovalent organic group; and A102 represents a hydrogen atom or a monovalent organic group). In the method, a photosensitive dye can be decomposed using an energy beam which can penetrate deeper into a living body than near-infrared light and activate the photosensitive dye.
    Type: Application
    Filed: December 6, 2021
    Publication date: July 13, 2023
    Inventors: Mikako OGAWA, Hideo TAKAKURA, Shino MATSUHIRO, Osamu INANAMI
  • Publication number: 20230114083
    Abstract: An ICG fluorescence image measured with an excitation light of 740 nm and a fluorescence of 845 nm is shown in FIG. 10, and an ICG fluorescence image measured with an excitation light of 780 nm and a fluorescence of 845 nm is shown in FIG. 11, respectively. As a result, it was observed that the ICG derivative RGD2-PPA-Cy accumulated in the tumor tissue 30 minutes after tail vein administration, regardless of whether the wavelength of the excitation light was 740 nm or 780 nm.
    Type: Application
    Filed: October 27, 2022
    Publication date: April 13, 2023
    Inventors: Mikako OGAWA, Hideo Takakura, Koki Tsuchiya, Tetsuya Taketsugu, Masato Kobayashi
  • Patent number: 7524876
    Abstract: A compound represented by the following general formula (I) or a salt thereof: [wherein R1 and R2 represent hydrogen atom, a C1-6 alkyl group, or a group represented by the following formula (A): [wherein X1 and X2 represent hydrogen atom, or a group represented as —N(R3)(R4) (R3 and R4 represent hydrogen atom, a C1-6 alkyl group, a C1-6 alkylcarbonyl group, or a C1-6 alkyloxycarbonyl group); and n represents an integer of 1 to 6 ], provided that R1 and R2 do not simultaneously represent hydrogen atom), which is a novel luciferin derivative that serves as a luciferase substrate.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: April 28, 2009
    Assignee: The University of Tokyo
    Inventors: Hideo Takakura, Yasuteru Urano, Tetsuo Nagano
  • Publication number: 20070155806
    Abstract: A compound represented by the following general formula (I) or a salt thereof: [wherein R1 and R2 represent hydrogen atom, a C1-6 alkyl group, or a group represented by the following formula (A): [wherein X1 and X2 represent hydrogen atom, or a group represented as —N(R3)(R4) (R3 and R4 represent hydrogen atom, a C1-6 alkyl group, a C1-6 alkylcarbonyl group, or a C1-6 alkyloxycarbonyl group); and n represents an integer of 1 to 6], provided that R1 and R2 do not simultaneously represent hydrogen atom), which is a novel luciferin derivative that serves as a luciferase substrate.
    Type: Application
    Filed: July 27, 2006
    Publication date: July 5, 2007
    Applicant: The University of Tokyo
    Inventors: Hideo Takakura, Yasuteru Urano, Tetsuo Nagano
  • Patent number: 5441615
    Abstract: The sputtering apparatus includes: at least one film-forming vacuum chamber in which a plurality of sputtering targets and a like plurality of box-shaped deposition-shield members are disposed, each deposition-shield surrounding the corresponding target in such a manner that each of the targets faces a corresponding substrate, each deposition-shield member having an opening which enables sputtered particles to travel from the target to the corresponding substrate.The arrangement of the sputtering apparatus may be such that the substrate is supported by a holder and the substrate holder is placed facing the opening provided in a wall of the deposition-shield member, wherein the area of the substrate holder is larger than that of the opening of the deposition-shield member, and a part of the area of the substrate holder which faces the wall of the deposition-shield member overlaps a closed portion of the deposition-shield member when viewed in plan.
    Type: Grant
    Filed: December 6, 1994
    Date of Patent: August 15, 1995
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasuo Mukai, Hideo Takakura