Patents by Inventor Hideo Toraya
Hideo Toraya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11852597Abstract: A measured pattern acquisition unit acquires a measured X-ray scattering pattern of a sample containing a target substance and another known mixed substance. A known pattern acquisition unit acquires a known X-ray scattering pattern of the other known mixed substance. A crystalline pattern acquisition unit at least partially acquires an X-ray diffraction pattern of a crystalline portion included in the target substance. A crystalline integrated intensity calculation unit calculates an integrated intensity for the acquired X-ray diffraction pattern of the crystalline portion. A target substance integrated intensity calculation unit calculates an integrated intensity for an X-ray scattering pattern of the target substance. A degree-of-crystallinity calculation unit calculates a degree of crystallinity of the target substance based on the integrated intensity for the X-ray diffraction pattern of the crystalline portion and the integrated intensity for the X-ray scattering pattern of the target substance.Type: GrantFiled: June 6, 2022Date of Patent: December 26, 2023Assignee: RIGAKU CORPORATIONInventor: Hideo Toraya
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Patent number: 11841334Abstract: A quantitative phase analysis device includes: a unit for acquiring a powder diffraction pattern of the sample; a unit for acquiring information on a plurality of crystalline phases; a unit for acquiring a fitting function for each of the plurality of crystalline phases; a unit for executing whole-powder pattern fitting for the powder diffraction pattern by using the acquired fitting functions, to thereby acquire a fitting result; and a unit for calculating a weight ratio of the plurality of crystalline phases based on the fitting result. Each fitting function is selected from the group consisting of a first fitting function using an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function using an integrated intensity obtained by observation or calculation, and a third fitting function using a profile intensity obtained by observation or calculation.Type: GrantFiled: February 10, 2020Date of Patent: December 12, 2023Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Norihiro Muroyama
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Publication number: 20230280290Abstract: A device for analyzing a diffraction pattern of a mixture uses a fitting pattern including a term related to a known target pattern, which indicates a target component and which is changeable in shape with use of a shape parameter, and a term related to an unknown pattern, which indicates a residual group. The fitting pattern is fitted to an observed pattern with a given value assigned to the shape parameter and with the unknown pattern set to an initial pattern. The unknown pattern is then changed, to thereby fit the fitting pattern to the observed pattern. The fitting described above is executed with use of a plurality of shape parameters each of which is the shape parameter, and a calculation result related to one of the plurality of shape parameters is selected.Type: ApplicationFiled: February 27, 2023Publication date: September 7, 2023Applicant: Rigaku CorporationInventor: Hideo TORAYA
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Publication number: 20220390392Abstract: A measured pattern acquisition unit acquires a measured X-ray scattering pattern of a sample containing a target substance and another known mixed substance. A known pattern acquisition unit acquires a known X-ray scattering pattern of the other known mixed substance. A crystalline pattern acquisition unit at least partially acquires an X-ray diffraction pattern of a crystalline portion included in the target substance. A crystalline integrated intensity calculation unit calculates an integrated intensity for the acquired X-ray diffraction pattern of the crystalline portion. A target substance integrated intensity calculation unit calculates an integrated intensity for an X-ray scattering pattern of the target substance. A degree-of-crystallinity calculation unit calculates a degree of crystallinity of the target substance based on the integrated intensity for the X-ray diffraction pattern of the crystalline portion and the integrated intensity for the X-ray scattering pattern of the target substance.Type: ApplicationFiled: June 6, 2022Publication date: December 8, 2022Inventor: Hideo TORAYA
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Patent number: 11402341Abstract: A quantitative phase analysis device for analyzing non-crystalline phases comprising at least one microprocessor configured to: acquire the powder diffraction pattern of the sample; acquire information on one non-crystalline phase and one or more crystalline phases contained in the sample; acquire a fitting function; execute whole-powder pattern fitting, acquire a fitting result; and calculate a weight ratio of the one non-crystalline phase and the one or more crystalline phases. The fitting function for each of the one or more crystalline phases is one fitting function selected from the group consisting of a first fitting function that uses an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function that uses an integrated intensity obtained by observation or calculation, and a third fitting function that uses a profile intensity obtained by observation or calculation. The fitting function for the one non-crystalline phase is the third fitting function.Type: GrantFiled: October 2, 2020Date of Patent: August 2, 2022Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Norihiro Muroyama
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Publication number: 20220187225Abstract: Provided is a method of analyzing a diffraction pattern of a mixture, the method including: a first step of fitting, through use of a fitting pattern including a term obtained by multiplying a known target pattern indicating a target component by a first intensity ratio, and a term obtained by multiplying an unknown pattern indicating a residual group consisting of one or more residual components by a second intensity ratio, and having the first intensity ratio, the second intensity ratio, and the unknown pattern as fitting parameters, the fitting pattern to the observed pattern by changing the first and the second intensity ratio in a state where the unknown pattern is set to an initial pattern; and a second step of fitting the fitting pattern to the observed pattern by changing the unknown pattern while restricting the changes of the first and the second intensity ratio.Type: ApplicationFiled: December 9, 2021Publication date: June 16, 2022Inventor: Hideo TORAYA
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Patent number: 10962489Abstract: Provided are an operation guide system, an operation guide method, and an operation guide program, which are capable of allowing a user to easily understand measurement of an X-ray optical system to be selected. A quantitative phase analysis device includes qualitative phase analysis result acquisition means for acquiring information on a plurality of crystalline phases contained in a sample, and weight ratio calculation means for calculating a weight ratio of the plurality of crystalline phases based on a sum of diffracted intensities corrected with respect to a Lorentz-polarization factor, a chemical formula weight, and a sum of squares of numbers of electrons belonging to each of atoms contained in a chemical formula unit, in the plurality of crystalline phases.Type: GrantFiled: August 24, 2018Date of Patent: March 30, 2021Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Akihiro Himeda
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Publication number: 20210018452Abstract: A quantitative phase analysis device for analyzing non-crystalline phases comprising at least one microprocessor configured to: acquire the powder diffraction pattern of the sample; acquire information on one non-crystalline phase and one or more crystalline phases contained in the sample; acquire a fitting function; execute whole-powder pattern fitting, acquire a fitting result; and calculate a weight ratio of the one non-crystalline phase and the one or more crystalline phases. The fitting function for each of the one or more crystalline phases is one fitting function selected from the group consisting of a first fitting function that uses an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function that uses an integrated intensity obtained by observation or calculation, and a third fitting function that uses a profile intensity obtained by observation or calculation. The fitting function for the one non-crystalline phase is the third fitting function.Type: ApplicationFiled: October 2, 2020Publication date: January 21, 2021Inventors: Hideo Toraya, Norihiro Muroyama
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Publication number: 20200173938Abstract: A quantitative phase analysis device includes: a unit for acquiring a powder diffraction pattern of the sample; a unit for acquiring information on a plurality of crystalline phases; a unit for acquiring a fitting function for each of the plurality of crystalline phases; a unit for executing whole-powder pattern fitting for the powder diffraction pattern by using the acquired fitting functions, to thereby acquire a fitting result; and a unit for calculating a weight ratio of the plurality of crystalline phases based on the fitting result. Each fitting function is selected from the group consisting of a first fitting function using an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function using an integrated intensity obtained by observation or calculation, and a third fitting function using a profile intensity obtained by observation or calculation.Type: ApplicationFiled: February 10, 2020Publication date: June 4, 2020Inventors: Hideo TORAYA, Norihiro MUROYAMA
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Publication number: 20180364183Abstract: Provided are an operation guide system, an operation guide method, and an operation guide program, which are capable of allowing a user to easily understand measurement of an X-ray optical system to be selected. A crystalline quantitative phase analysis device includes qualitative phase analysis result acquisition means for acquiring information on a plurality of crystalline phases contained in a sample, and weight ratio calculation means for calculating a weight ratio of the plurality of crystalline phases based on a sum of diffracted intensities corrected with respect to a Lorentz-polarization factor, a chemical formula weight, and a sum of squares of numbers of electrons belonging to each of atoms contained in a chemical formula unit, in the plurality of crystalline phases.Type: ApplicationFiled: August 24, 2018Publication date: December 20, 2018Inventors: Hideo Toraya, Akihiro Himeda
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Patent number: 9417195Abstract: In order to realize a compact and lightweight X-ray diffraction apparatus not requiring a goniometer, an apparatus for X-ray diffraction includes a first X-ray irradiating unit and a second X-ray irradiating unit that irradiate shaped X-rays on a same region of the surface of the sample from respective directions; an X-ray detecting unit that detects a first diffracted X-ray emanated from the region of the sample where the X-ray is irradiated by the first X-ray irradiating unit and a second diffracted X-ray emanated from the region of the sample where the X-ray is irradiated from the second X-ray irradiating unit; and an X-ray diffraction signal processing unit that processes a signal acquired by detecting the first diffracted X-ray and the second diffracted X-ray emanated from the same region of the sample with the X-ray detecting unit.Type: GrantFiled: July 29, 2011Date of Patent: August 16, 2016Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Shigeru Munekawa
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Patent number: 9146203Abstract: An X-ray stress measuring apparatus, for measuring stress on a sample, comprises: a pair of X-ray generating means (10, 11, 10?, 11?) for irradiating X-ray beams, determining an angle defined between the X-ray beams, mutually, at an arbitrary fixed angle, on a plane inclining by an angle desired with respect to a surface of the sample to be measured stress thereon; an X-ray sensor portion (29) for detecting plural numbers of Debye rings (C, C?), which are generated by incident X-ray beams from said pair of X-ray generating means; and a battery (410) for supplying necessary electricity to each of parts of the apparatus, wherein said X-ray sensor portion is made up with only one (1) piece of a 2-dimensional X-ray detector (20) or a 1-dimensional X-ray detector (20?), and is disposed in a position where the plural numbers of Debye rings generated by the incident X-ray beams from the at least one pair of X-ray generating means are adjacent to each other, or intersect with each other, thereby detecting the pluralType: GrantFiled: July 29, 2011Date of Patent: September 29, 2015Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Shigeru Munekawa
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Publication number: 20130129052Abstract: In order to realize a compact and lightweight X-ray diffraction apparatus not requiring a goniometer, an apparatus for X-ray diffraction includes a first X-ray irradiating unit and a second X-ray irradiating unit that irradiate shaped X-rays on a same region of the surface of the sample from respective directions; an X-ray detecting unit that detects a first diffracted X-ray emanated from the region of the sample where the X-ray is irradiated by the first X-ray irradiating unit and a second diffracted X-ray emanated from the region of the sample where the X-ray is irradiated from the second X-ray irradiating unit; and an X-ray diffraction signal processing unit that processes a signal acquired by detecting the first diffracted X-ray and the second diffracted X-ray emanated from the same region of the sample with the X-ray detecting unit.Type: ApplicationFiled: July 29, 2011Publication date: May 23, 2013Inventors: Hideo Toraya, Shigeru Munekawa
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Publication number: 20130121470Abstract: An X-ray stress measuring apparatus, for measuring stress on a sample, comprises: a pair of X-ray generating means (10, 11, 10?, 11?) for irradiating X-ray beams, determining an angle defined between the X-ray beams, mutually, at an arbitrary fixed angle, on a plane inclining by an angle desired with respect to a surface of the sample to be measured stress thereon; an X-ray sensor portion (29) for detecting plural numbers of Debye rings (C, C?), which are generated by incident X-ray beams from said pair of X-ray generating means; and a battery (410) for supplying necessary electricity to each of parts of the apparatus, wherein said X-ray sensor portion is made up with only one (1) piece of a 2-dimensional X-ray detector (20) or a 1-dimensional X-ray detector (20?), and is disposed in a position where the plural numbers of Debye rings generated by the incident X-ray beams from the at least one pair of X-ray generating means are adjacent to each other, or intersect with each other, thereby detecting the pluralType: ApplicationFiled: July 29, 2011Publication date: May 16, 2013Inventors: Hideo Toraya, Shigeru Munekawa
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Patent number: 8340248Abstract: In an X-ray diffraction method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror is a combination of plural flat reflective surfaces, the respective centers of which are located on an equiangular spiral having a center that is located on a surface of the sample. The X-ray detector is one-dimensional position-sensitive in a plane parallel to the diffraction plane. X-rays that have been reflected at different flat reflective surfaces reach different points on the X-ray detector respectively. A correction is performed for separately recognizing different reflected X-rays that may have been reflected at the different flat reflective surfaces, and might be mixed with each other on the same detecting region of the X-ray detector.Type: GrantFiled: March 23, 2010Date of Patent: December 25, 2012Assignee: Rigaku CorporationInventors: Hideo Toraya, Hisashi Konaka
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Publication number: 20100246768Abstract: In an X-ray diffraction method using the parallel beam method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror consists of a combination of plural flat reflective surfaces. The respective centers of the flat reflective surfaces are located on an equiangular spiral having a center that is located on a surface of the sample. The X-ray detector is one-dimensional position-sensitive in a plane parallel to the diffraction plane. X-rays that have been reflected at different flat reflective surfaces reach different points on the X-ray detector respectively. A corrective operation is performed for separately recognizing the different reflected X-rays on the assumption that the different reflected X-rays that have been reflected at the different flat reflective surfaces might be unfortunately mixed each other on the same detecting region of the X-ray detector.Type: ApplicationFiled: March 23, 2010Publication date: September 30, 2010Applicant: Rigaku CorporationInventors: Hideo TORAYA, Hisashi Konaka
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Patent number: 7801272Abstract: In an X-ray diffraction method using the parallel beam method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror has a shape of an equiangular spiral that has a center located on the surface of the sample. A crystal lattice plane that causes reflection is parallel to the reflective surface at any point on the reflective surface. The X-ray detector is one-dimensional position sensitive in a plane parallel to the diffraction plane. A relative positional relationship between the mirror and the X-ray detector is determined so that reflected X-rays from different points on the reflective surface of the mirror reach different points on the X-ray detector respectively. This X-ray diffraction method is superior in angular resolution, and is small in X-ray intensity reduction, and is simple in structure.Type: GrantFiled: August 13, 2008Date of Patent: September 21, 2010Assignee: Rigaku CorporationInventor: Hideo Toraya
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Publication number: 20090086921Abstract: In an X-ray diffraction method using the parallel beam method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror has a shape of an equiangular spiral that has a center located on the surface of the sample. A crystal lattice plane that causes reflection is parallel to the reflective surface at any point on the reflective surface. The X-ray detector is one-dimensional position sensitive in a plane parallel to the diffraction plane. A relative positional relationship between the mirror and the X-ray detector is determined so that reflected X-rays from different points on the reflective surface of the mirror reach different points on the X-ray detector respectively. This X-ray diffraction method is superior in angular resolution, and is small in X-ray intensity reduction, and is simple in structure.Type: ApplicationFiled: August 13, 2008Publication date: April 2, 2009Applicant: Rigaku CorporationInventor: Hideo TORAYA
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Patent number: 6873681Abstract: The preferred orientation of a polycrystalline material is estimated using one diffraction peak. An orientation density distribution function ? is assumed to be axisymmetric around a normal direction of the surface of a sample made of a polycrystalline material. The function ? may be a Gaussian function or a March-Dollase function. An X-ray is incident upon the surface of the sample at an incident angle ? and the intensity of a diffraction X-ray is measured. The change of intensity of the diffraction X-ray is measured with the incident angle ? being changed to attain a measurement rocking curve. A theoretical diffraction X-ray intensity is calculated based on the orientation density distribution function ?. The characteristic parameter of the function ? is determined so that the theoretical rocking curve approaches the measurement rocking curve as closely as possible, whereby the orientation density distribution function ? can be determined.Type: GrantFiled: May 20, 2003Date of Patent: March 29, 2005Assignee: Rigaku CorporationInventors: Hideo Toraya, Kazuhiko Omote
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Publication number: 20030235270Abstract: The method estimates quantitatively the preferred orientation of a polycrystalline material using one diffraction peak. An orientation density distribution function &rgr; is assumed to be axisymmetric around on the normal direction of the surface of a sample made of a polycrystalline material. The function &rgr; may be a Gaussian function or a March-Dollase function. An X-ray is incident upon the surface of the sample at an incident angle &agr; and the intensity of a diffraction X-ray is measured. The change of the intensity of the diffraction X-ray is measured with the incident angle &agr; being changed to attain a measurement rocking curve. On the other hand, a theoretical diffraction X-ray intensity is calculated based on the orientation density distribution function &rgr;.Type: ApplicationFiled: May 20, 2003Publication date: December 25, 2003Applicant: Rigaku CorporationInventors: Hideo Toraya, Kazuhiko Omote