Patents by Inventor Hidetaka Fujimatsu

Hidetaka Fujimatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Volume phase hologram recording material and optical information recording medium using the same
    Patent number: 8399156
    Abstract: Disclosed are a volume phase hologram recording material having high sensitivity, high contrast, and excellent multiple recording and record holding properties and a volume phase hologram recording medium using the same. The volume phase hologram recording material comprises mainly a polymer matrix (a), a radically photopolymerizable compound (b), and a radical photopolymerization initiator (c) and the polymer matrix is a three-dimensionally crosslinked or linear polymer matrix formed from a polymer matrix-forming material containing 0.5-50 wt % of an episulfide compound (f), an epoxy compound (g), and a curing agent (h).
    Type: Grant
    Filed: July 22, 2008
    Date of Patent: March 19, 2013
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Kohei Tomari, Hidetaka Fujimatsu, Kazuyoshi Masaki, Takehiro Shimizu, Yasuji Shichijo
  • Volume phase hologram recording material and optical information recording medium
    Patent number: 8298726
    Abstract: Disclosed is a volume phase hologram recording material of high sensitivity, high contrast, and excellent record retention properties and also disclosed is a volume phase hologram recording medium using the said material. The volume phase hologram recording material mainly contains a three-dimensional crosslinked polymer matrix, a radically polymerizable monomer, and a photoradical polymerization initiator. The three-dimensional crosslinked polymer matrix is formed from a matrix-forming compound having two photoradically polymerizable unsaturated groups and two non-photoradically polymerizable hydroxyl groups represented by the following general formula (1) and another matrix-forming compound having no photoradically polymerizable group.
    Type: Grant
    Filed: February 4, 2008
    Date of Patent: October 30, 2012
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Takehiro Shimizu, Kazuyoshi Masaki, Hidetaka Fujimatsu
  • VOLUME PHASE HOLOGRAM RECORDING MATERIAL AND OPTICAL INFORMATION RECORDING MEDIUM USING THE SAME
    Publication number: 20100203429
    Abstract: Disclosed are a volume phase hologram recording material having high sensitivity, high contrast, and excellent multiple recording and record holding properties and a volume phase hologram recording medium using the same. The volume phase hologram recording material comprises mainly a polymer matrix (a), a radically photopolymerizable compound (b), and a radical photopolymerization initiator (c) and the polymer matrix is a three-dimensionally crosslinked or linear polymer matrix formed from a polymer matrix-forming material containing 0.5-50 wt % of an episulfide compound (f), an epoxy compound (g), and a curing agent (h).
    Type: Application
    Filed: July 22, 2008
    Publication date: August 12, 2010
    Applicant: NIPPON STEEL CHEMICAL CO., LTD.
    Inventors: Kohei Tomari, Hidetaka Fujimatsu, Kazuyoshi Masaki, Takehiro Shimizu, Yasuji Shichijo
  • VOLUME PHASE HOLOGRAM RECORDING MATERIAL AND OPTICAL INFORMATION RECORDING MEDIUM
    Publication number: 20090310196
    Abstract: Disclosed is a volume phase hologram recording material of high sensitivity, high contrast, and excellent record retention properties and also disclosed is a volume phase hologram recording medium using the said material. The volume phase hologram recording material mainly contains a three-dimensional crosslinked polymer matrix, a radically polymerizable monomer, and a photoradical polymerization initiator. The three-dimensional crosslinked polymer matrix is formed from a matrix-forming compound having two photoradically polymerizable unsaturated groups and two non-photoradically polymerizable hydroxyl groups represented by the following general formula (1) and another matrix-forming compound having no photoradically polymerizable group.
    Type: Application
    Filed: February 4, 2008
    Publication date: December 17, 2009
    Inventors: Takehiro Shimizu, Kazuyoshi Masaki, Hidetaka Fujimatsu