Patents by Inventor Hidetaka Nakagawara

Hidetaka Nakagawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive resin composition, photosensitive dry film, pattern formation method, printed circuit board, and method for producing same
    Patent number: 9625812
    Abstract: The photosensitive resin composition of the present invention contains a vinyl-based (co)polymer (I) obtained by polymerizing a monomer mixture (?) containing a vinyl-based monomer (a) having a phenolic hydroxyl group, a vinyl-based copolymer (II) having a weight-average molecular weight of 15,000 to 120,000, obtained by polymerizing a monomer mixture (?) containing a vinyl-based monomer (b) represented by CH2?CR1COO(R2O)kR3 (wherein R1=a hydrogen atom or a methyl group, R2=a hydrocarbon group having a carbon number of 1 to 4, R3=a hydrogen atom or a methyl group, and k=1 to 90) and a carboxyl group-containing vinyl-based monomer (c), a photosensitive substance (III), and a compound (IV) which is a specific aromatic polyhydroxy compound.
    Type: Grant
    Filed: July 2, 2013
    Date of Patent: April 18, 2017
    Assignee: MICRO PROCESS INC.
    Inventors: Akifumi Ueda, Hidetaka Nakagawara, Shintaro Okada, Saki Fujita, Kazuo Watanabe, Shigeki Watanabe
  • PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, PATTERN FORMATION METHOD, PRINTED CIRCUIT BOARD, AND METHOD FOR PRODUCING SAME
    Publication number: 20150168832
    Abstract: The photosensitive resin composition of the present invention contains a vinyl-based (co)polymer (I) obtained by polymerizing a monomer mixture (?) containing a vinyl-based monomer (a) having a phenolic hydroxyl group, a vinyl-based copolymer (II) having a weight-average molecular weight of 15,000 to 120,000, obtained by polymerizing a monomer mixture (?) containing a vinyl-based monomer (b) represented by CH2?CR1COO(R2O)kR3 (wherein R1=a hydrogen atom or a methyl group, R2=a hydrocarbon group having a carbon number of 1 to 4, R3=a hydrogen atom or a methyl group, and k=1 to 90) and a carboxyl group-containing vinyl-based monomer (c), a photosensitive substance (III), and a compound (IV) which is a specific aromatic polyhydroxy compound.
    Type: Application
    Filed: July 2, 2013
    Publication date: June 18, 2015
    Applicant: MICRO PROCESS INC.
    Inventors: Akifumi Ueda, Hidetaka Nakagawara, Shintaro Okada, Saki Fujita, Kazuo Watanabe, Shigeki Watanabe
  • Photosensitive resin composition, photosensitive dry film and method for forming pattern
    Patent number: 8647807
    Abstract: A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5). [In the formula, Y is a hydrocarbon group of 1 to 6 carbon atoms; l and m are each independently an integer of 1 to 3; n is 1 or 2; p and q are each independently 0 or 1.].
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: February 11, 2014
    Assignees: Micro Process Inc., Everlight Chemical Industrial Corporation, Mitsubishi Rayon Co., Ltd.
    Inventors: Akifumi Ueda, Hidetaka Nakagawara, Kazuo Watanabe, Shigeki Watanabe, Wei Jen Lan, Chao Wen Lin
  • Photosensitive resin composition, photosensitive dry film and method for forming pattern
    Patent number: 8647806
    Abstract: The present invention is related to a photosensitive resin composition containing: a vinyl-based copolymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group and a carboxyl group-containing vinyl monomer (b); a quinonediazide compound (II) and a compound (III) represented by the following formula (5), and to a photosensitive dry film and a method for forming a patter by using the photosensitive resin composition.
    Type: Grant
    Filed: December 27, 2010
    Date of Patent: February 11, 2014
    Assignees: Micro Process Inc, Everlight Chemical Industrial Corporation, Mitsubishi Rayon Co., Ltd.
    Inventors: Akifumi Ueda, Hidetaka Nakagawara, Kazuo Watanabe, Shigeki Watanabe, Wei Jen Lan, Chao Wen Lin
  • PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHOD FOR FORMING PATTERN
    Publication number: 20130004895
    Abstract: A photosensitive resin composition comprising: a vinyl-based polymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group; a vinyl-based polymer (II) obtained by polymerizing a monomer mixture containing a carboxyl group-containing vinyl monomer (b), and having a weight average molecular weight of 20,000 to 100,000, provided that the vinyl-based polymer (I) is excluded; a quinonediazide compound (III); and a compound (IV) represented by following formula (5). [In the formula, Y is a hydrocarbon group of 1 to 6 carbon atoms; 1 and m are each independently an integer of 1 to 3; n is 1 or 2; p and q are each independently 0 or 1.
    Type: Application
    Filed: December 27, 2010
    Publication date: January 3, 2013
    Applicants: MICRO PROCESS INC., Mitsubishi Rayon Co., Ltd., EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION
    Inventors: Akifumi Ueda, Hidetaka Nakagawara, Kazuo Watanabe, Shigeki Watanabe, Weiren Lan, Zhaowen Lin
  • PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM AND METHOD FOR FORMING PATTERN
    Publication number: 20120301830
    Abstract: The present invention is related to a photosensitive resin composition containing: a vinyl-based copolymer (I) obtained by polymerizing a monomer mixture containing a monomer (a) having a phenolic hydroxyl group and a carboxyl group-containing vinyl monomer (b); a quinonediazide compound (II) and a compound (III) represented by the following formula (5), and to a photosensitive dry film and a method for forming a patter by using the photosensitive resin composition.
    Type: Application
    Filed: December 27, 2010
    Publication date: November 29, 2012
    Applicants: MICRO PROCESS INC., Mitsubishi Rayon Co., Ltd., EVERLIGHT CHEMICAL INDUSTRIAL CORPORATION
    Inventors: Akifumi Ueda, Hidetaka Nakagawara, Kazuo Watanabe, Shigeki Watanabe, Weiren Lan, Zhaowen Lin