Patents by Inventor Hidetaka Shibano

Hidetaka Shibano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7067091
    Abstract: An object of the present invention is to provide a treatment agent superior in harm-removing performance to metal hydride containing exhaust gas, and its production method as well as a treatment method. It is a mixture of either copper hydroxide or basic copper carbonate and silicon compound or a mixture, wherein parts of said copper compound and said silicon compound form a complex. A preparation of the treatment agent is made by a precipitation method, wherein a copper salts solution serves as a precipitation mother solution, and a mixture solution of either alkali hydroxide or alkali carbonate and alkali silicate serves as a precipitating agent. A treatment agent obtained as its result shows a high harm-removing performance to the metal hydride gas and a low heat generation, for which reason the agent is useful for treatment of the metal hydride containing exhaust gas generated in semiconductor manufacturing.
    Type: Grant
    Filed: June 28, 2001
    Date of Patent: June 27, 2006
    Assignee: Sued-Chemie Catalysts Japan Inc.
    Inventors: Satoshi Teshigawara, Minoru Takachi, Yoshihiro Matsuda, Hidetaka Shibano, Yoshiyuki Tomiyama
  • Publication number: 20030092570
    Abstract: An object of the present invention is to provide a treatment agent superior in harm-removing performance to metal hydride containing exhaust gas, and its production method as well as a treatment method. It is a mixture of either copper hydride or basic copper hydride and silicon compound or a mixture, wherein parts of said copper compound and said silicon compound form a complex. A preparation of the treatment agent is made by a precipitation method, wherein a copper salts solution serves as a precipitation mother solution, and a mixture solution of either alkali hydride or alkali carbonate and alkali silicate serves as a precipitating agent. A treatment agent obtained as its result shows a high harm-removing performance to the metal hydride gas and a low heat generation, for which reason the agent is useful for treatment of the metal hydride containing exhaust gas generated in semiconductor manufacturing.
    Type: Application
    Filed: August 21, 2002
    Publication date: May 15, 2003
    Inventors: Satoshi Teshigawara, Minoru Takachi, Yoshihiro Matsuda, Hidetaka Shibano, Yoshiyuki Tomiyama
  • Patent number: 6066590
    Abstract: The present invention is directed to a harmful gas removing agent used for removing harmful gas such as CO, NO.sub.x, and O.sub.3 from exhaust gases ventilated from automobile tunnels and underground parking, thereby preventing air pollution. The harmful gas removing agent, solving the problems of the conventional adsorbents and catalysts, is capable of efficiently removing NO.sub.x with no need of pre-treatment of adding O.sub.3 to the exhaust gas being treated, as well as being capable of satisfactorily removing CO and O.sub.3 from exhaust gases even at high humidity, and its removing activity lasts for a long time. Furthermore, the harmful gas removing agent can be regenerated by being exposed to hot air at relatively low temperature, thereby being repeatedly used, and is hard to be poisoned by SO.sub.x contained in the exhaust gas.
    Type: Grant
    Filed: March 26, 1998
    Date of Patent: May 23, 2000
    Assignee: Sued-Chemie Nissan Catalysts Inc.
    Inventors: Yuji Horii, Toshinori Inoue, Takeshi Yamashita, Hidetaka Shibano, Yoshiyuki Tomiyama, Kimihiko Yoshizaki