Patents by Inventor Hideto Sotobayashi

Hideto Sotobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation sensitive polymeric material
    Patent number: 4581401
    Abstract: A radiation sensitive polymeric material comprising a copolymer of methyl methacrylate and allyl methacrylate and at least one organosulfur compound having at least two --SH groups per molecule, said material being useful as a polymer resist sensitive to high energy radiation.
    Type: Grant
    Filed: September 19, 1984
    Date of Patent: April 8, 1986
    Assignee: Rohm GmbH
    Inventors: Frithjof Asmussen, Peter Quis, Winfried Wunderlich, Wolfram Schnabel, Hideto Sotobayashi
  • Positive resist material
    Patent number: 4551414
    Abstract: The invention relates to positive resist materials of thermally crosslinkable methacrylic polymers soluble in organic solvents, which are characterized in that the methacrylic polymers are copolymers of 80 to 98 mol-% of fluoroalkylmethacrylate and 20 to 2 mol-% of methacrylic acid chloride or chloroalkylmethacrylate. The resists of the invention are very well suited for the transfer of microstructures, for example in semiconductor technology. They have, in addition to a high sensitivity, a very good mechanical stability and strength of adhesion.
    Type: Grant
    Filed: February 3, 1983
    Date of Patent: November 5, 1985
    Assignee: Max-Planck-Gesellshaft zur Forderung der Wissenschaften e.V.
    Inventors: Frithjof Asmussen, Hideto Sotobayashi, Jiang-Tsun Chen, Wolfram Schnabel