Patents by Inventor Hidetoshi Kimura

Hidetoshi Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10199251
    Abstract: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: February 5, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kippei Sugita, Kenji Nagai, Hidetoshi Kimura
  • Publication number: 20180301322
    Abstract: A position detecting system has a transport device, a light source, at least one optical element, a reflective member, a drive unit, and a controller. The transport device transports and places an object on a placement table. The light source generates measurement light. The optical element projects the measurement light, as projection light, generated by the light source and receives reflected light. The reflective member is disposed on the transport device. The reflective member reflects the projection light toward the placement table, and reflects the reflected light of the projection light, which is projected toward the placement table, toward the optical element. The drive unit operates the transport device so that the reflective member scans a plurality of linear scanning ranges. The controller calculates positional relationship between the focus ring and the object placed on the placement table based on the reflected light within the plurality of linear scanning ranges.
    Type: Application
    Filed: April 10, 2018
    Publication date: October 18, 2018
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Kippei SUGITA, Kenji NAGAI, Hidetoshi KIMURA
  • Patent number: 10090178
    Abstract: There is provided a method of measuring a temperature of a gas in a line connected to a gas supply source and a decompressor, the line being divided by a first, a second and a third valve into a first line between the first valve and the second valve and a second line between the second valve and the third valve. A first pressure rise rate of a gas in the first line is measured when introducing a gas at a predetermined flow rate into the first and the second line. A second pressure rise rate of a gas in the first line is measured when introducing a gas at a predetermined flow rate only into the first line. A gas temperature in the first line is calculated based on known inner volume of the second line, the first pressure rise rate, and the second pressure rise rate.
    Type: Grant
    Filed: November 23, 2016
    Date of Patent: October 2, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hidetoshi Kimura, Yutaka Matsui
  • Patent number: 10020172
    Abstract: There is provided a plasma processing apparatus including a susceptor, having a substrate mounting portion for mounting thereon a substrate; a focus ring including an outer ring and an inner ring; a dielectric ring; a dielectric constant varying device for varying a dielectric constant of the dielectric ring; a grounding body positioned at an outside of the dielectric ring with a gap from a bottom surface of the focus ring; and a controller for controlling a top surface electric potential of the focus ring by controlling a current flowing from the susceptor to the substrate.
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: July 10, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsunori Ohata, Hidetoshi Kimura, Kiyoshi Maeda, Jun Hirose, Tsuyoshi Hida
  • Publication number: 20180101114
    Abstract: An image forming apparatus includes a reader reading an image, an image forming section forming an image on a recording medium, an exterior member having an outer surface housing the reader and the image forming section, and an operating display having an outer surface. The operating display is disposed in front of the reader, accepts an operation performed by an operator, displays an image, and is rotatable about a rotational axis disposed on its front side between a position in which the operating display faces an upper side and a position in which the operating display faces the front side. The outer surface of the exterior member has a first region which is a background behind the operating display in front view and which is colored in a color similar to a color of the outer surface of the operating display.
    Type: Application
    Filed: April 27, 2017
    Publication date: April 12, 2018
    Applicant: FUJI XEROX CO., LTD.
    Inventors: Ko TAKEUCHI, Hiroshi NAKADA, Megumi OKUBO, Kazuyuki OGI, Hiroko SAITO, Tsutomu SHIIHARA, Hidetoshi KIMURA
  • Publication number: 20170148653
    Abstract: There is provided a method of measuring a temperature of a gas in a line connected to a gas supply source and a decompressor, the line being divided by a first, a second and a third valve into a first line between the first valve and the second valve and a second line between the second valve and the third valve. A first pressure rise rate of a gas in the first line is measured when introducing a gas at a predetermined flow rate into the first and the second line. A second pressure rise rate of a gas in the first line is measured when introducing a gas at a predetermined flow rate only into the first line. A gas temperature in the first line is calculated based on known inner volume of the second line, the first pressure rise rate, and the second pressure rise rate.
    Type: Application
    Filed: November 23, 2016
    Publication date: May 25, 2017
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidetoshi KIMURA, Yutaka MATSUI
  • Patent number: 9174481
    Abstract: A booklet storage includes a first storage member that includes a first receiver portion and a second receiver portion connecting with the first receiver portion; and a second storage member that includes a third receiver portion and a fourth receiver portion connecting with the third receiver portion, wherein the first storage member and the second storage member together receive a booklet in combination, and wherein a first width between the first receiver portion or the second receiver portion and the third receiver portion and a second width between the first receiver portion or the second receiver portion and the fourth receiver portion are different from each other.
    Type: Grant
    Filed: April 4, 2012
    Date of Patent: November 3, 2015
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Taichi Fuchu, Hidetoshi Kimura, Yuko Kamimoto, Osamu Uto
  • Publication number: 20150255255
    Abstract: There is provided a plasma processing apparatus including a susceptor, having a substrate mounting portion for mounting thereon a substrate; a focus ring including an outer ring and an inner ring; a dielectric ring; a dielectric constant varying device for varying a dielectric constant of the dielectric ring; a grounding body positioned at an outside of the dielectric ring with a gap from a bottom surface of the focus ring; and a controller for controlling a top surface electric potential of the focus ring by controlling a current flowing from the susceptor to the substrate.
    Type: Application
    Filed: May 26, 2015
    Publication date: September 10, 2015
    Inventors: Mitsunori Ohata, Hidetoshi Kimura, Kiyoshi Maeda, Jun Hirose, Tsuyoshi Hida
  • Patent number: 9076636
    Abstract: There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.
    Type: Grant
    Filed: September 14, 2011
    Date of Patent: July 7, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Mitsunori Ohata, Hidetoshi Kimura, Kiyoshi Maeda, Jun Hirose, Tsuyoshi Hida
  • Patent number: 9070725
    Abstract: Provided a measuring apparatus includes a wavelength dispersion device which dispersed light reflected by one surface of an examination target having a thickness D and light reflected by a rear surface of the examination target, as incident light, a detector in which a plurality of photodetection elements receiving light dispersed by the wavelength dispersion device and detecting a power of the received light in are provided in an array shape, and a piezoelectric device which is attached to the detector to convert an applied voltage into a mechanical power, wherein the detector detects the power of the received light when the detector is shifted by the mechanical power converted by the piezoelectric device as much as d/m, where d is a width of each of the photodetection elements in an array direction and m is an integer equal to or greater than 2.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: June 30, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tatsuo Matsudo, Hidetoshi Kimura
  • Publication number: 20140302341
    Abstract: In a hot press molding method for press-molding a heated material and cooling the material while holding the material in a mold, during press molding of the material, shape changes including a portion that curves with respect to a longitudinal direction of the material are molded at longitudinal opposite end portions of the material and resistance to thermal contraction force of the material in the longitudinal direction during cooling is imparted. In one embodiment of the present invention, the shape changes molded on the material during the press molding are minute protrusions provided on surfaces of the longitudinal opposite end portions of the material. The invention makes it possible to suppress thermal contraction of the material during cooling in hot press molding to thereby prevent defects associated therewith.
    Type: Application
    Filed: December 26, 2011
    Publication date: October 9, 2014
    Applicants: AISIN TAKAOKA CO., LTD., TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Tetsuji Egawa, Takanobu Suzuki, Hidetoshi Kimura, Hideaki Ikezawa, Kenji Kato, Masaki Furuhashi
  • Patent number: D807428
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: January 9, 2018
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Ko Takeuchi, Hiroko Saito, Hidetoshi Kimura, Hiroshi Nakada, Megumi Okubo
  • Patent number: D820907
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: June 19, 2018
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Tsutomu Shiihara, Hidetoshi Kimura
  • Patent number: D821488
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: June 26, 2018
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Masaaki Takenouchi, Ohgi Kazuyuki, Hidetoshi Kimura, Yuki Noguchi
  • Patent number: D822100
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: July 3, 2018
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Ko Takeuchi, Hiroko Saito, Hidetoshi Kimura, Hiroshi Nakada, Megumi Okubo
  • Patent number: D828443
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: September 11, 2018
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Hidetoshi Kimura
  • Patent number: D834641
    Type: Grant
    Filed: April 17, 2017
    Date of Patent: November 27, 2018
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Hidetoshi Kimura, Tsutomu Shihara
  • Patent number: D841731
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: February 26, 2019
    Assignee: Xerox Corporation
    Inventors: Donald A Brown, Tsutomu Shiihara, Hidetoshi Kimura
  • Patent number: D849134
    Type: Grant
    Filed: January 18, 2016
    Date of Patent: May 21, 2019
    Assignee: Xerox Corporation
    Inventors: Hidetoshi Kimura, Goro Kishi
  • Patent number: D852881
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: July 2, 2019
    Assignee: XEROX CORPORATION
    Inventors: Donald A Brown, Hidetoshi Kimura