Patents by Inventor Hidetoshi Kitagawa

Hidetoshi Kitagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240188219
    Abstract: One or more embodiments may include a method for mounting an electronic component to fix an electronic component including an electrode to a circuit board. The method includes applying a first conductive adhesive on a pattern; fixing the electronic component on the circuit board by the first conductive adhesive; applying a second conductive adhesive so as to cover the pattern and at least a half part, on a circuit board side, of each side surface of the electrode; and curing the first conductive adhesive by heating after the fixing and furthermore curing the second conductive adhesive by heating after applying the second conductive adhesive, or curing the first conductive adhesive and the second conductive adhesive by heating after applying the second conductive adhesive.
    Type: Application
    Filed: March 23, 2022
    Publication date: June 6, 2024
    Applicant: JOHNAN Corporation
    Inventors: Yoshinari MATSUDA, Takamitsu OKA, Kazuhiro KITAGAWA, Yuuichi HIGASHIDANI, Hidetoshi ARASUNA
  • Patent number: 8158774
    Abstract: The present invention relates to a simple, economical method for introducing substituent (I) at the 2?-hydroxyl group of the ribose of a ribonucleic acid derivative whose 3?-hydroxyl group and 5?-hydroxyl group are protected with a silicon protecting group, wherein WG1 represents an electron-withdrawing group: The invention also relates to a method for producing a ribonucleic acid derivative of formula (3), comprising the reaction of a ribonucleic acid derivative of formula (1) with a monothioacetal compound of formula (2) to produce the ribonucleic acid derivative of formula (3), using iodine as the reagent for halogenating the sulfur atom of the monothioacetal compound of formula (2) in the presence of an acid: In formulae (1), (2), and (3), Bz represents a nucleobase which may or may not have a protecting group; WG1 represents an electron-withdrawing group; R3 represents alkyl or aryl; and A represents a silicon substituent.
    Type: Grant
    Filed: August 1, 2007
    Date of Patent: April 17, 2012
    Assignee: Nippon Shinyaku Co., Ltd.
    Inventors: Hidetoshi Kitagawa, Kouichi Uetake
  • Publication number: 20100012057
    Abstract: In a cylinder head structure for an internal combustion engine that directs air into a covered space above the cylinder head covered by a head cover to ventilate the covered space, a gas flow passage space that extends continuously over an entire length or substantially over the entire length in a longitudinal direction is formed in the covered space. In addition, an air introduction position is provided within the gas flow passage space, and an air discharge position is provided outside the gas flow passage space.
    Type: Application
    Filed: July 14, 2009
    Publication date: January 21, 2010
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Hidetoshi KITAGAWA, Nobuyuki Murakami
  • Publication number: 20090312534
    Abstract: A method is provided for efficiently removing the silicon substituent which protects the 3?-hydroxyl group and the 5?-hydroxyl group of a ribose of a ribonucleic acid derivative in which the 2?-hydroxyl group of the ribose is protected with the following substituent (I) where WG1 represents an electron withdrawing group, and the 3?-hydroxyl group and the 5?-hydroxyl group of the ribose are protected with a silyl protecting group.
    Type: Application
    Filed: February 26, 2007
    Publication date: December 17, 2009
    Applicant: NIPPON SHINYAKU CO., LTD.
    Inventors: Hidetoshi Kitagawa, Hirofumi Masuda
  • Publication number: 20090286970
    Abstract: The present invention relates to a simple, economical method for introducing substituent (I) at the 2?-hydroxyl group of the ribose of a ribonucleic acid derivative whose 3?-hydroxyl group and 5?-hydroxyl group are protected with a silicon protecting group, wherein WG1 represents an electron-withdrawing group: The invention also relates to a method for producing a ribonucleic acid derivative of formula (3), comprising the reaction of a ribonucleic acid derivative of formula (1) with a monothioacetal compound of formula (2) to produce the ribonucleic acid derivative of formula (3), using iodine as the reagent for halogenating the sulfur atom of the monothioacetal compound of formula (2) in the presence of an acid: In formulae (1), (2), and (3), Bz represents a nucleobase which may or may not have a protecting group; WG1 represents an electron-withdrawing group; R3 represents alkyl or aryl; and A represents a silicon substituent.
    Type: Application
    Filed: August 1, 2007
    Publication date: November 19, 2009
    Applicant: NIPPON SHINYAKU CO., LTD.
    Inventors: Hidetoshi Kitagawa, Kouichi Uetake