Patents by Inventor Hidetoshi Ohba

Hidetoshi Ohba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7633602
    Abstract: A measurement apparatus having a measurement light source for emitting measurement light, a projection unit on which reflected light formed when the measurement light is reflected from the mirror plane is projected as a projected light spot, an image pickup unit for picking up an image of the projection unit on which the reflected light is projected as the projected light spot, a control unit for controlling an inclination of the mirror plane and a measurement unit for measuring a quantity of movement of the projected light spot, which moves according to a change of the inclination of the mirror plane, on the basis of the image of the projection unit. This enables the measurement of a deflection characteristic of a mirror system having the mirror plane variable to arrange the inclination within a short period of time and with high accuracy.
    Type: Grant
    Filed: April 30, 2007
    Date of Patent: December 15, 2009
    Assignee: Fujitsu Limited
    Inventors: Katsumi Fujihara, Hidetoshi Ohba
  • Publication number: 20080074651
    Abstract: According to the present invention, there is provided a measurement apparatus having a measurement light source for emitting measurement light, a projection unit on which reflected light formed when the measurement light is reflected from the mirror plane is projected as a projected light spot, an image pickup unit for picking up an image of the projection unit on which the reflected light is projected as the projected light spot, a control unit for controlling an inclination of the mirror plane and a measurement unit for measuring a quantity of movement of the projected light spot, which moves according to a change of the inclination of the mirror plane, on the basis of the image of the projection unit. This enables the measurement of a deflection characteristic of a mirror system having the mirror plane variable to arrange the inclination within a short period of time and with high accuracy.
    Type: Application
    Filed: April 30, 2007
    Publication date: March 27, 2008
    Applicant: FUJITSU LIMITED
    Inventors: Katsumi Fujihara, Hidetoshi Ohba
  • Publication number: 20080074650
    Abstract: According to the present invention, there is provided a measurement apparatus comprising a measurement light source for emitting measurement light onto a mirror plane, a projection unit on which reflected light formed when the measurement light emitted from the measurement light source is reflected from the mirror plane is projected and an image pickup unit for picking up an image of the projection unit on which the reflected light is projected. This enables the measurement of a deflection characteristic of the mirror system having the mirror plane variable to arrange an inclination within a short period of time and with high accuracy.
    Type: Application
    Filed: April 30, 2007
    Publication date: March 27, 2008
    Applicant: FUJITSU LIMITED
    Inventors: Katsumi Fujihara, Hidetoshi Ohba