Patents by Inventor Hidetoshi Shinohara

Hidetoshi Shinohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090218313
    Abstract: There is provided a method for manufacturing a patterned magnetic recording medium including a step of completely removing an etching resist on a magnetic layer 3, which is used for etching the magnetic layer 3, without deteriorating magnetic characteristics of the magnetic layer 3. The step of removing the etching resist used for etching the magnetic layer 3 includes the steps of irradiating the etching resist on the magnetic layer 3 or the first protective layer 4 with an excimer VUV laser under a reduced pressure and immersing the resist coating 5 remaining on the magnetic layer 3 or the first protective layer 4 into a resist removing agent solution to wash off the resist coating 5.
    Type: Application
    Filed: February 27, 2009
    Publication date: September 3, 2009
    Applicants: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD., WASEDA UNIVERSITY
    Inventors: Satomi Kajiwara, Shuichi Shoji, Jun Mizuno, Hidetoshi Shinohara