Abstract: Provided is a ferritic stainless steel that has good corrosion resistance and which exhibits good brazeability when subjected to high-temperature brazing with a Ni-containing brazing filler metal. The ferritic stainless steel has a composition containing, in mass %, C: 0.003 to 0.020%, Si: 0.05 to 0.60%, Mn: 0.05 to 0.50%, P: 0.04% or less, S: 0.02% or less, Cr: 17.0 to 24.0%, Ni: 0.20 to 0.80%, Cu: 0.01 to 0.80%, Mo: 0.01 to 2.50%, Al: 0.001 to 0.015%, Nb: 0.25 to 0.60%, and N: 0.020% or less, with the balance being Fe and incidental impurities, the composition satisfying formula (1) below and formula (2) below, Cu+Mo?0.30??(1) 4Ni?(Si+Mn)?0??(2) (wherein Cu and Mo in formula (1) and Ni, Si, and Mn in formula (2) each represent the content (mass %) of the corresponding element).

Abstract: A ferritic stainless steel having good corrosion resistance and good brazability in the case where brazing is performed with a Ni-containing brazing filler metal at a high temperature. The ferritic stainless steel has a chemical composition comprising, by mass %, C: 0.003% to 0.020%, Si: 0.05% to 0.60%, Mn: 0.05% to 0.30%, P: 0.040% or less, S: 0.020% or less, Cr: 17.0% to 22.0%, Ni: 0.20% to 0.80%, Cu: 0.30% to 0.80%, Mo: 0.01% to 0.10%, Al: 0.001% to 0.015%, Nb: 0.25% to 0.60%, N: 0.020% or less, and the balance being Fe and inevitable impurities. The expression 4Ni?(Si+Mn)?0.00% is satisfied, where each of Ni, Si, and Mn denotes a content, by mass %, of a corresponding element.

Abstract: Provided is a ferritic stainless steel that has good corrosion resistance and which exhibits good brazeability when subjected to high-temperature brazing with a Ni-containing brazing filler metal. The ferritic stainless steel has a composition containing, in mass %, C: 0.003 to 0.020%, Si: 0.05 to 0.60%, Mn: 0.05 to 0.50%, P: 0.04% or less, S: 0.02% or less, Cr: 17.0 to 24.0%, Ni: 0.20 to 0.80%, Cu: 0.01 to 0.80%, Mo: 0.01 to 2.50%, Al: 0.001 to 0.015%, Nb: 0.25 to 0.60%, and N: 0.020% or less, with the balance being Fe and incidental impurities, the composition satisfying formula (1) below and formula (2) below, Cu+Mo?0.30??(1) 4Ni?(Si+Mn)?0??(2) (wherein Cu and Mo in formula (1) and Ni, Si, and Mn in formula (2) each represent the content (mass %) of the corresponding element).

Abstract: The present invention relates to a method of cleaning a surface of a substrate employed prior to film formation by using the CVD method which uses a reaction gas containing an ozone containing gas which contains ozone (O.sub.3) in oxygen (O.sub.2) and tetraethylorthosilicate (TEOS). The substrate surface cleaning method comprises the steps of oxidizing particles 13 by contacting a pre-process gas containing ozone 15 to a surface 12 of a substrate 11 on which the particles 13 are present, and removing the particles 13 by heating the substrate 11 to exceed a decomposition point of oxide 13a of the particles 13.