Patents by Inventor Hideyuki Akiyama

Hideyuki Akiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240075672
    Abstract: It is an object of the present invention to provide a novel production method which makes it possible to obtain a molded product containing a P3HB-based resin through an injection blow molding method and a technique for using such a method. The object is achieved by providing a method for producing a molded product containing a P3HB-based resin, the method including the steps of: (A) plasticizing a resin composition containing a P3HB-based resin; (B) subjecting the plasticized resin composition obtained in the step (A) to injection molding to obtain a preform; and (C) subjecting the preform obtained in the step (B) to blow molding to obtain a molded product.
    Type: Application
    Filed: December 21, 2021
    Publication date: March 7, 2024
    Applicants: KANEKA CORPORATION, SUNTORY HOLDINGS LIMITED
    Inventors: Hideyuki SUZUKI, Takashi AKIYAMA, Masanori NISHIYAMA, Yoshiaki MATSUOKA, Nobuo NAKAMURA
  • Publication number: 20230307219
    Abstract: A mass spectrometry method calculates a theoretical mass spectrum by calculating, on the basis of a molecular formula of a component to be analyzed and an isotope abundance ratio of an element that is included in the component to be analyzed and for which a plurality of isotopes exists, the mass of the isotopes and the abundance ratio of the component to be analyzed for each mass. A measurement target is ionized and the mass of the ionized ions and a number of ions in each mass is detected. A first mass spectrum is calculated based on the detection result; and a degree of matching is calculated by comparing the theoretical mass spectrum and the first mass spectrum, for only the mass in which a peak of the theoretical mass spectrum exists. On the basis of the degree of matching, the presence/absence of the component to be analyzed is determined.
    Type: Application
    Filed: July 17, 2020
    Publication date: September 28, 2023
    Inventors: Ryusuke HIROSE, Hideyuki AKIYAMA, Noriaki SAKAI
  • Patent number: 11646188
    Abstract: Disclosed is an apparatus and method for analyzing an evolved gas, wherein the precision of detection of a gas component is improved without enlarging the apparatus. The apparatus includes a gas component evolving unit, a detection member for detecting the gas component, and a mixed gas channel for allowing a mixed gas containing the gas component and carrier gas to flow therethrough, and further includes a branch channel branched from the mixed gas channel, an inert gas channel for allowing an inert gas to flow therethrough, a first flow rate regulator for adjusting the flow rate of the carrier gas, a second flow rate regulator for adjusting the flow rate of the inert gas, and a flow rate control unit for controlling the second flow rate regulator such that the flow rate of the mixed gas guided to the detection member is a predetermined value.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: May 9, 2023
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Ryusuke Hirose, Hideyuki Akiyama, Noriaki Sakai, Masafumi Watanabe
  • Patent number: 11007747
    Abstract: A composite structure with high pressure resistance that is suitable for a flow channel is produced by reducing the number of components while maintaining the excellent chemical resistance and high stress tolerance inherent to a glass substrate and a resin substrate. A glass substrate surface is modified with a hydrolyzable silicon compound, and the glass substrate is brought into contact with the resin substrate. Subsequently, the contact surface between the glass substrate and the resin substrate is heated to a temperature from the glass transition temperature to the pyrolysis temperature of the resin substrate, eliminating gaps between the glass substrate and the resin substrate to bring them into close contact with each other, and causing chemical binding or anchor effects between the glass substrate and the resin substrate via the hydrolyzable silicon compound. Thus, the glass substrate and the resin substrate are firmly fixed to each other.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: May 18, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yusuke Goto, Masao Kamahori, Hiroshi Sasaki, Kiyotoshi Mori, Hideyuki Akiyama
  • Patent number: 10969319
    Abstract: The apparatus for mass analysis includes: a heating unit heating a sample containing a first substance and a second substance having different gasification temperatures to evolve gas components; a heating control unit controlling the heating unit to heat the sample at a first temperature point at which gas of the first substance is evolved and gas of the second substance is not evolved, until reaching a first time point, whereafter the heating unit is controlled to heat the sample until reaching a second temperature point at which gas of the second substance is evolved; and an analysis control unit performing mass analysis under a first measurement condition assigned to the first substance until reaching the first time point at the first temperature point, and performing mass analysis under a second measurement condition assigned to the second substance at the second temperature point.
    Type: Grant
    Filed: July 20, 2018
    Date of Patent: April 6, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Ryusuke Hirose, Hideyuki Akiyama, Noriaki Sakai
  • Patent number: 10828861
    Abstract: A composite structure with high pressure resistance that is suitable for a flow channel is produced by reducing the number of components while maintaining the excellent chemical resistance and high stress tolerance inherent to a glass substrate and a resin substrate. A glass substrate surface is modified with a hydrolyzable silicon compound, and the glass substrate is brought into contact with the resin substrate. Subsequently, the contact surface between the glass substrate and the resin substrate is heated to a temperature from the glass transition temperature to the pyrolysis temperature of the resin substrate, eliminating gaps between the glass substrate and the resin substrate to bring them into close contact with each other, and causing chemical binding or anchor effects between the glass substrate and the resin substrate via the hydrolyzable silicon compound. Thus, the glass substrate and the resin substrate are firmly fixed to each other.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: November 10, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yusuke Goto, Masao Kamahori, Hiroshi Sasaki, Kiyotoshi Mori, Hideyuki Akiyama
  • Patent number: 10401342
    Abstract: Disclosed herein are an evolved gas analyzer and a method for analyzing evolved gas, the apparatus cooling a sample holder in a short time without using excessive cooling performance and without providing the entire apparatus in an excessively large size, thereby enhancing analysis work efficiency. The apparatus 200 includes: a sample holder 20 holding a sample S; a heating unit 10 receiving the sample holder therein, and evolving a gas component G by heating the sample; a detecting means 110 detecting the gas component; a sample holder supporting unit 204L movably supporting the sample holder to move the sample holder to predetermined outer and inner positions of the heating unit; and a cooling unit 30 provided at an outside of the heating unit, and cooling the sample holder by being in direct or indirect contact with the sample holder, when the sample holder is moved to a discharging position.
    Type: Grant
    Filed: November 19, 2016
    Date of Patent: September 3, 2019
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki Akiyama, Kentaro Yamada, Toshitada Takeuchi
  • Publication number: 20190027353
    Abstract: Disclosed is an apparatus and method for analyzing an evolved gas, wherein the precision of detection of a gas component is improved without enlarging the apparatus. The apparatus includes a gas component evolving unit, a detection member for detecting the gas component, and a mixed gas channel for allowing a mixed gas containing the gas component and carrier gas to flow therethrough, and further includes a branch channel branched from the mixed gas channel, an inert gas channel for allowing an inert gas to flow therethrough, a first flow rate regulator for adjusting the flow rate of the carrier gas, a second flow rate regulator for adjusting the flow rate of the inert gas, and a flow rate control unit for controlling the second flow rate regulator such that the flow rate of the mixed gas guided to the detection member is a predetermined value.
    Type: Application
    Filed: July 20, 2018
    Publication date: January 24, 2019
    Inventors: Ryusuke HIROSE, Hideyuki AKIYAMA, Noriaki SAKAI, Masafumi WATANABE
  • Publication number: 20190025173
    Abstract: The apparatus for mass analysis includes: a heating unit heating a sample containing a first substance and a second substance having different gasification temperatures to evolve gas components; a heating control unit controlling the heating unit to heat the sample at a first temperature point at which gas of the first substance is evolved and gas of the second substance is not evolved, until reaching a first time point, whereafter the heating unit is controlled to heat the sample until reaching a second temperature point at which gas of the second substance is evolved; and an analysis control unit performing mass analysis under a first measurement condition assigned to the first substance until reaching the first time point at the first temperature point, and performing mass analysis under a second measurement condition assigned to the second substance at the second temperature point.
    Type: Application
    Filed: July 20, 2018
    Publication date: January 24, 2019
    Inventors: Ryusuke HIROSE, Hideyuki AKIYAMA, Noriaki SAKAI
  • Publication number: 20180275026
    Abstract: Disclosed is to provide a plastic reference material and a manufacturing method thereof. The plastic reference material made by dispersing at least one chemical substance in a plastic substrate, and used for analyzing a concentration of the chemical substance, wherein the plastic reference material is of a granular shape and includes an average value for each maximum diameter of fifty or more of the plastic reference materials being within a range of 0.1 mm to 1.0 mm, and a largest difference between the maximum diameters and the average value being equal to or less than 0.2 mm, and an average value of each weight of equal to or more than fifty plastic reference materials being within a range of 0.1 mg to 0.5 mg, and a largest difference between the weights and the average value being equal to or less than 0.1 mg.
    Type: Application
    Filed: March 22, 2018
    Publication date: September 27, 2018
    Inventors: Yoshihiro HIRANO, Kenji NAMIKI, Noriaki SAKAI, Hideyuki AKIYAMA
  • Publication number: 20180244015
    Abstract: A composite structure with high pressure resistance that is suitable for a flow channel is produced by reducing the number of components while maintaining the excellent chemical resistance and high stress tolerance inherent to a glass substrate and a resin substrate. A glass substrate surface is modified with a hydrolyzable silicon compound, and the glass substrate is brought into contact with the resin substrate. Subsequently, the contact surface between the glass substrate and the resin substrate is heated to a temperature from the glass transition temperature to the pyrolysis temperature of the resin substrate, eliminating gaps between the glass substrate and the resin substrate to bring them into close contact with each other, and causing chemical binding or anchor effects between the glass substrate and the resin substrate via the hydrolyzable silicon compound. Thus, the glass substrate and the resin substrate are firmly fixed to each other.
    Type: Application
    Filed: May 1, 2018
    Publication date: August 30, 2018
    Inventors: Yusuke GOTO, Masao KAMAHORI, Hiroshi SASAKI, Kiyotoshi MORI, Hideyuki AKIYAMA
  • Publication number: 20180244014
    Abstract: A composite structure with high pressure resistance that is suitable for a flow channel is produced by reducing the number of components while maintaining the excellent chemical resistance and high stress tolerance inherent to a glass substrate and a resin substrate. A glass substrate surface is modified with a hydrolyzable silicon compound, and the glass substrate is brought into contact with the resin substrate. Subsequently, the contact surface between the glass substrate and the resin substrate is heated to a temperature from the glass transition temperature to the pyrolysis temperature of the resin substrate, eliminating gaps between the glass substrate and the resin substrate to bring them into close contact with each other, and causing chemical binding or anchor effects between the glass substrate and the resin substrate via the hydrolyzable silicon compound. Thus, the glass substrate and the resin substrate are firmly fixed to each other.
    Type: Application
    Filed: May 1, 2018
    Publication date: August 30, 2018
    Inventors: Yusuke GOTO, Masao KAMAHORI, Hiroshi SASAKI, Kiyotoshi MORI, Hideyuki AKIYAMA
  • Patent number: 9975308
    Abstract: A composite structure with high pressure resistance that is suitable for a flow channel is produced by reducing the number of components while maintaining the excellent chemical resistance and high stress tolerance inherent to a glass substrate and a resin substrate. A glass substrate surface is modified with a hydrolyzable silicon compound, and the glass substrate is brought into contact with the resin substrate. Subsequently, the contact surface between the glass substrate and the resin substrate is heated to a temperature from the glass transition temperature to the pyrolysis temperature of the resin substrate, eliminating gaps between the glass substrate and the resin substrate to bring them into close contact with each other, and causing chemical binding or anchor effects between the glass substrate and the resin substrate via the hydrolyzable silicon compound. Thus, the glass substrate and the resin substrate are firmly fixed to each other.
    Type: Grant
    Filed: November 1, 2013
    Date of Patent: May 22, 2018
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yusuke Goto, Masao Kamahori, Hiroshi Sasaki, Kiyotoshi Mori, Hideyuki Akiyama
  • Patent number: 9897579
    Abstract: Disclosed herein is a method for correcting an evolved gas analyzer and the evolved gas analyzer. The method includes: correcting a mass spectrum position to be located at a reference spectrum position, the mass spectrum position corresponding to a mass-to-charge ratio m/z of a mass spectrum of a gas component of a reference sample; calculating a sensitivity correction factor Cs=Ss/S by using an area S and a reference area Ss of a chromatogram, the sensitivity correction factor being used to measure an area of a chromatogram of the gas component of a test sample; and calculating a heating correction factor H=t/ts by using a time t and a reference time is indicating a maximum peak of the chromatogram about the reference sample, the heating correction factor being used to correct a heating rate of the test sample when measuring the gas component of the test sample.
    Type: Grant
    Filed: November 19, 2016
    Date of Patent: February 20, 2018
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki Akiyama, Kantaro Maruoka
  • Patent number: 9899198
    Abstract: Disclosed herein is a method for analyzing evolved gas and an evolved gas analyzer, the method correcting detection sensitivity differences in analysis devices, day-to-day variations thereof, thereby quantifying a measurement target with high accuracy. The method for analyzing evolved gas of the apparatus including: a sample holder; a heating unit evolving a gas component; an ion source generating ions by ionizing the gas component; a mass spectrometer detecting the gas component; and a gas channel through which mixed gas flows, the method including: operating a discharged flow rate controlling process of controlling a flow rate of the mixed gas discharged to outside; operating a sample holder cooling process of cooling the sample holder by bringing the sample holder into contact with a cooling unit; and operating a correction process including: correcting a mass spectrum position; calculating a sensitivity correction factor; and calculating a heating correction factor.
    Type: Grant
    Filed: November 19, 2016
    Date of Patent: February 20, 2018
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki Akiyama, Kentaro Yamada, Masafumi Watanabe, Toshitada Takeuchi, Kantaro Maruoka
  • Patent number: 9831077
    Abstract: Disclosed herein is an evolved gas analyzer and a method for analyzing evolved gas, the apparatus enhancing detection accuracy for gas component without providing the apparatus in a large size. The apparatus includes a heating unit evolving a gas component by heating a sample, a detecting means detecting the gas component, a gas channel connecting the heating unit to the detecting means, the gas channel through which mixed gas of the gas component and carrier gas flows, wherein the gas channel includes a branching channel being open to outside and including a discharge flow rate controlling device, and a flow rate control device controlling the discharge flow rate controlling device based on a detection signal received from the detecting means so as to control the detection signal to be within a predetermined range.
    Type: Grant
    Filed: November 19, 2016
    Date of Patent: November 28, 2017
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki Akiyama, Masafumi Watanabe, Kantaro Maruoka
  • Publication number: 20170146503
    Abstract: Disclosed herein are an evolved gas analyzer and a method for analyzing evolved gas, the apparatus cooling a sample holder in a short time without using excessive cooling performance and without providing the entire apparatus in an excessively large size, thereby enhancing analysis work efficiency. The apparatus 200 includes: a sample holder 20 holding a sample S; a heating unit 10 receiving the sample holder therein, and evolving a gas component G by heating the sample; a detecting means 110 detecting the gas component; a sample holder supporting unit 204L movably supporting the sample holder to move the sample holder to predetermined outer and inner positions of the heating unit; and a cooling unit 30 provided at an outside of the heating unit, and cooling the sample holder by being in direct or indirect contact with the sample holder, when the sample holder is moved to a discharging position.
    Type: Application
    Filed: November 19, 2016
    Publication date: May 25, 2017
    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki AKIYAMA, Kentaro YAMADA, Toshitada TAKEUCHI
  • Publication number: 20170148617
    Abstract: Disclosed herein is a method for analyzing evolved gas and an evolved gas analyzer, the method correcting detection sensitivity differences in analysis devices, day-to-day variations thereof, thereby quantifying a measurement target with high accuracy. The method for analyzing evolved gas of the apparatus including: a sample holder; a heating unit evolving a gas component; an ion source generating ions by ionizing the gas component; a mass spectrometer detecting the gas component; and a gas channel through which mixed gas flows, the method including: operating a discharged flow rate controlling process of controlling a flow rate of the mixed gas discharged to outside; operating a sample holder cooling process of cooling the sample holder by bringing the sample holder into contact with a cooling unit; and operating a correction process including: correcting a mass spectrum position; calculating a sensitivity correction factor; and calculating a heating correction factor.
    Type: Application
    Filed: November 19, 2016
    Publication date: May 25, 2017
    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki AKIYAMA, Kentaro YAMADA, Masafumi WATANABE, Toshitada TAKEUCHI, Kantaro MARUOKA
  • Publication number: 20170148616
    Abstract: Disclosed herein is an evolved gas analyzer and a method for analyzing evolved gas, the apparatus enhancing detection accuracy for gas component without providing the apparatus in a large size. The apparatus includes a heating unit evolving a gas component by heating a sample, a detecting means detecting the gas component, a gas channel connecting the heating unit to the detecting means, the gas channel through which mixed gas of the gas component and carrier gas flows, wherein the gas channel includes a branching channel being open to outside and including a discharge flow rate controlling device, and a flow rate control device controlling the discharge flow rate controlling device based on a detection signal received from the detecting means so as to control the detection signal to be within a predetermined range.
    Type: Application
    Filed: November 19, 2016
    Publication date: May 25, 2017
    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki AKIYAMA, Masafumi WATANABE, Kantaro MARUOKA
  • Publication number: 20170146497
    Abstract: Disclosed herein is a method for correcting an evolved gas analyzer and the evolved gas analyzer. The method includes: correcting a mass spectrum position to be located at a reference spectrum position, the mass spectrum position corresponding to a mass-to-charge ratio m/z of a mass spectrum of a gas component of a reference sample; calculating a sensitivity correction factor Cs=Ss/S by using an area S and a reference area Ss of a chromatogram, the sensitivity correction factor being used to measure an area of a chromatogram of the gas component of a test sample; and calculating a heating correction factor H=t/ts by using a time t and a reference time is indicating a maximum peak of the chromatogram about the reference sample, the heating correction factor being used to correct a heating rate of the test sample when measuring the gas component of the test sample.
    Type: Application
    Filed: November 19, 2016
    Publication date: May 25, 2017
    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Hideyuki AKIYAMA, Kantaro MARUOKA