Patents by Inventor Hideyuki Fujishiro

Hideyuki Fujishiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060176045
    Abstract: A plasma reactor is provided which does not require a high power supply voltage and can form a plasma with a necessary and sufficient average current density over the whole region between a pair of electrodes to efficiently modify a gas flowing between the electrodes. The plasma reactor comprises first and second electrodes positioned to face each other, a dielectric material placed between the two electrodes and an electrical power supply for applying an alternating or pulsed current to the two electrodes and generating a plasma in the gas passing through the gap between the two electrodes to thereby modify the gas. By setting the average current density Ird of the plasma generated in the gap so that it satisfies the formula 10?4 A/cm2?Ird?10?1 A/cm2, a concentrated discharge and a barrier discharge are simultaneously generated, thus forming a plasma having a sufficient average current density Ird for the efficient modification of the gas over the whole region of the gap.
    Type: Application
    Filed: March 17, 2006
    Publication date: August 10, 2006
    Inventors: Kenji Dosaka, Kazuo Ando, Hideyuki Fujishiro, Minoru Torii, Koji Kotani, Takeshi Yanobe
  • Patent number: 6774335
    Abstract: This invention provides a plasma reactor for modifying gas by plasma, including a first planar electrode and a second planar electrode, the two electrodes facing opposite each other approximately in parallel; a dielectric body inserted between the first and the second electrodes; and a complex barrier discharge-generating way for providing a predetermined electric potential difference between the first and the second electrodes; wherein the first and the second electrodes are provided so as to apply complex plasma discharge to the gas to be treated fed between the electrodes, to thereby modify the gas. According to the invention, gas modification efficiency can be remarkably improved.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: August 10, 2004
    Assignees: Hokushin Corporation, Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Takeshi Yanobe, Hideyuki Fujishiro, Kenji Dosaka, Minoru Torii, Kazuo Ando, Koji Kotani
  • Publication number: 20020034590
    Abstract: A plasma reactor is provided which does not require a high power supply voltage and can form a plasma with a necessary and sufficient average current density over the whole region between a pair of electrodes to efficiently modify a gas flowing between the electrodes. The plasma reactor comprises first and second electrodes positioned to face each other, a dielectric material placed between the two electrodes and an electrical power supply for applying an alternating or pulsed current to the two electrodes and generating a plasma in the gas passing through the gap between the two electrodes to thereby modify the gas. By setting the average current density Ird of the plasma generated in the gap so that it satisfies the formula 10−4 A/cm2≦Ird≦10−1 A/cm2, a concentrated discharge and a barrier discharge are simultaneously generated, thus forming a plasma having a sufficient average current density Ird for the efficient modification of the gas over the whole region of the gap.
    Type: Application
    Filed: May 11, 2001
    Publication date: March 21, 2002
    Inventors: Kenji Dosaka, Kazuo Ando, Hideyuki Fujishiro, Minoru Torii, Koji Kotani, Takeshi Yanobe
  • Publication number: 20020005395
    Abstract: This invention provides a plasma reactor for modifying gas by plasma, including a first planar electrode and a second planar electrode, the two electrodes facing opposite each other approximately in parallel; a dielectric body inserted between the first and the second electrodes; and a complex barrier discharge-generating means for providing a predetermined electric potential difference between the first and the second electrodes; wherein the first and the second electrodes are provided so as to apply complex plasma discharge to the gas to be treated fed between the electrodes, to thereby modify the gas. According to the invention, gas modification efficiency can be remarkably improved.
    Type: Application
    Filed: May 7, 2001
    Publication date: January 17, 2002
    Applicant: HOKUSHIN CORPORATION AND HONDA GIKEN KOGYO KABUSHIKI KAISHA
    Inventors: Takeshi Yanobe, Hideyuki Fujishiro, Kenji Dosaka, Minoru Torii, Kazuo Ando, Koji Kotani
  • Patent number: 5458970
    Abstract: A shaped-article for use in producing a fiber-reinforced composite member is formed of short fibers and deformed fibers. The deformed fibers have a plurality of needle-like portions extending from a nucleus portion. The short fibers are orientated at random by dispersing the deformed fibers. The fiber shaped-article is formed by pouring a slurry of the short fibers and deformed fibers dispensed in a liquid into a mold, compressing the slurry and removing the liquid.
    Type: Grant
    Filed: October 7, 1994
    Date of Patent: October 17, 1995
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Hideyuki Fujishiro, Tatsuya Suzuki, Tsugio Ohba
  • Patent number: 5198167
    Abstract: In a process for molding a fiber molding for a fiber-reinforced composite material with short fibers oriented in one direction, a slurry molding material having short fibers dispersed in a liquid is used, and pressing forces are applied to the molding material from two directions substantially perpendicular to each other within a mold, while removing the liquid.
    Type: Grant
    Filed: October 31, 1989
    Date of Patent: March 30, 1993
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Tohru Ohta, Akimasa Daimaru, Masao Ichikawa, Hideyuki Fujishiro, Ryuichi Kubota, Takeyoshi Nakamura, Hisayoshi Harada, Hirotaka Koshitani, Tatsuya Suzuki, Teruo Hoshino
  • Patent number: 5168014
    Abstract: A silicon carbide-reinforced light alloy composite material comprises a matrix of a light weight alloy and a reinforcing material consisting of at least one of a silicon carbide whisker and a silicon carbide grain. In the composite material, the content of SiO.sub.2 contained in the reinforcing material, is set in the range of 0.05 to 5.0% by weight.
    Type: Grant
    Filed: October 23, 1989
    Date of Patent: December 1, 1992
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Akimasa Daimaru, Tohru Ohta, Tatsuya Suzuki, Masao Ichikawa, Hirotaka Koshitani, Hideyuki Fujishiro