Abstract: A guide device that guides a drill that drills a second bone hole in a bone in which a first bone hole is formed includes: an elongated protective portion that is inserted into the first bone hole and that defines, in an interior of the first bone hole, a pathway that extends in a longitudinal direction of the first bone hole and through which a suture passes; a guide portion that has a guide hole that specifies a guide axis and that guides the drill passing through the guide hole along the guide axis; and an arm portion that connects the protective portion with the guide portion. The guide axis is disposed at a twist position with respect to the protective portion, and the drill guided along the guide axis passes through a position at which the drill does not interfere with the suture that passes through the pathway.

Abstract: A partial product generator and a multiplier are configured to provide increased operation speed. First encoder Ej1 generates control code A1 and control code A2 that determine the fold (1-fold or 2-fold) of the partial product with respect to the multiplicand corresponding to bit Y2j and bit Y2j−1 of the multiplier. Second encoder Ej2 generates control code/ZDT that determines whether the partial product has value “0” corresponding to bit Y2j and Y2j+1 of the multiplier and second control code A2. Third encoder Ej3 generates control code Sgn and control code/Sgn that determine the sign of the partial product corresponding to bit Y2j+1 of the multiplier and bit inversion signal AsX. Since control code/ZDT with a longer generation time is treated in the latter section circuit of bit circuit Pji, it is possible to realize high speed for the process.

Abstract: A semiconductor memory chip has fuses and a redundancy memory cell which can replace a normal memory cell that is found defective by cutting off the fuses. If the normal memory cell is defective, the fuses are cut off thereby to connect the redundancy memory cell instead of the normal memory cell which is defective. The entire surface of the semiconductor memory chip is coated with a resist layer. The coated the resist layer is exposed at regions of the fuses to an energy beam, and then developed form a resist pattern. The semiconductor memory chip is etched at the regions using the resist pattern as a mask for thereby cutting off the fuses. The fuses may be spaced at intervals of 2 &mgr;m or smaller, and can be cut off without causing damage to a layer beneath the fuses.

Abstract: A semiconductor memory chip has fuses and a redundancy memory cell which can replace a normal memory cell that is found defective by cutting off the fuses. If the normal memory cell is defective, the fuses are cut off thereby to connect the redundancy memory cell instead of the normal memory cell which is defective. The entire surface of the semiconductor memory chip is coated with a resist layer. The coated the resist layer is exposed at regions of the fuses to an energy beam, and then developed form a resist pattern. The semiconductor memory chip is etched at the regions using the resist pattern as a mask for thereby cutting off the fuses. The fuses may be spaced at intervals of 2 &mgr;m or smaller, and can be cut off without causing damage to a layer beneath the fuses.

Abstract: A fuse link 16 is formed of a portion of a top level of patterned metal conductor in a multilevel conductor integrated circuit 10. A deposited layer of oxide material 26 covers the fuse link. Radiant energy from such as a laser 36 is directed through the oxide material 26 to heat and open the fuse link 16. Layers of deposited protective oxide 28 and PIX 30 then cover the fuse link and layer of oxide material. One photoprocessing step is avoided by locating the fuse link 16 and bond pad 22, both made from the top layer of conductive material, at different levels. The blanket etch then exposes the bond pad 22 while leaving the fuse link 16 covered. The fuse link can be formed down in a step 38 or the bond pad 22 can be formed above such as a group of memory cells 80. The bond pad 22 and fuse link 16 also can be formed at the same level with other process procedures.

Abstract: The objective of the invention is to provide a type of semiconductor memory device whose antifuse can be formed without any additional film manufacturing process. A first electrode is formed by a first polysilicon film 37 formed on semiconductor substrate 30 and a second polysilicon film 39 deposited on the surface of the first polysilicon film. The first electrode, a dielectric film formed on the surface of the first electrode, and a second electrode form capacitor 11 in the memory cell. An antifuse 12 with the same configuration as capacitor 11 is formed in the semiconductor memory device. Because there is no need to use an additional film, the manufacturing cost is low, and antifuse 12 can be easily arranged. It is also possible to form antifuse 13 by forming instead of depositing the second polysilicon film 39 on the surface of the first polysilicon film 39.

Abstract: A circuit for reducing the stand-by current of semiconductor device is disclosed in a number of embodiments. In a first embodiment, a first conductive line (302), such as a bit line or common capacitor plate in a DRAM, is charged to a first potential in a stand-by state. A second conductive line (304), such as a word line in a DRAM, is driven to the first potential in the stand-by state in the event a short circuit condition exists between the first conductive line (302) and the second conductive line (304). In a second embodiment, a second conductive line (404) in a semiconductor device is 34w isolated from other circuits in the semiconductor device in a stand-by mode. This allows the second conductive line (404) to rise to a short circuit potential in the event a short circuit condition exists between the second conductive line (404) and a short circuit potential.

Abstract: A semiconductor memory chip has fuses and a redundancy memory cell which can replace a normal memory cell that is found defective by cutting off the fuses. If the normal memory cell is defective, the fuses are cut off thereby to connect the redundancy memory cell instead of the normal memory cell which is defective. The entire surface of the semiconductor memory chip is coated with a resist layer. The coated the resist layer is exposed at regions of the fuses to an energy beam, and then developed form a resist pattern. The semiconductor memory chip is etched at the regions using the resist pattern as a mask for thereby cutting off the fuses. The fuses may be spaced at intervals of 2 .mu.m or smaller, and can be cut off without causing damage to a layer beneath the fuses.

Abstract: A high speed device and method for estimating the yield of semiconductor chips without requiring a large data storage area. The noise particles which adhere to a number of semiconductor chips are generated in a particle generating unit 12 and an identification number indicating the semiconductor chip on which the noise particles adhere is given. All the noise particles are driven in driving unit 13 on one mask stored in circuit storage unit 15. The mask pattern near the driven noise particle is checked and whether or not the noise particle causes a defect is checked in a defect detecting unit 16. Semiconductor chips with defects are detected in a semiconductor chip defect detecting unit 17 based on the semiconductor chip identification number of each noise particle. Then a computing unit 18 calculates the chip yield from the total number of semiconductor chips and the number of semiconductor chips without defects.

Abstract: A fuse link 16 is formed of a portion of a top level of patterned metal conductor in a multilevel conductor integrated circuit 10. A deposited layer of oxide material 26 covers the fuse link. Radiant energy from such as a laser 36 is directed through the oxide material 26 to heat and open the fuse link 16. Layers of deposited protective oxide 28 and PIX 30 then cover the fuse link and layer of oxide material. One photoprocessing step is avoided by locating the fuse link 16 and bond pad 22, both made from the top layer of conductive material, at different levels. The blanket etch then exposes the bond pad 22 while leaving the fuse link 16 covered. The fuse link can be formed down in a step 38 or the bond pad 22 can be formed above such as a group of memory cells 80. The bond pad 22 and fuse link 16 also can be formed at the same level with other process procedures.

Abstract: A method for fabricating a semiconductor device includes the steps of: forming fuses (40) and conductive pads (46) above a semiconductor substrate (43); depositing a layer of cap oxide (44) over the fuses and the conductive pads; sintering the cap oxide; etching back the layer of cap oxide until the top surface of an insulator (42) over the fuses and the top surfaces of the conductive pads are exposed; performing electrical tests (48) by way of the conductive pads; trimming (50) at least a part of the fuses with a laser beam; depositing a silicon nitride layer (52) overall; depositing a mask coating over the silicon nitride; patterning the mask coating (54) to expose the conductive pads; and etching the mask coating and the silicon nitride layer to expose the conductive pads.

Abstract: A fuse for a semiconductor integrated circuit is provided wherein a strip of corrosive material (82), such as aluminum, has one end thereof connected to a conductive strip (84) of a non-corrosive material and the other end thereof connected to a strip (94) of non-corrosive conductive material. The one end of the conductive strip (82) connected to the conductive strip (84) is connected through a contact (88). Similarly, the other end of the strip (82) is connected through a contact (96) to the non-corrosive conductive strip (94). The strips 84 and 94 provide a barrier to corrosion. This occurs whenever a break (104) is formed in the fuse to expose the ends of the fuse (82) at the break to a corrosive atmosphere. Alternatively, the fuse could be connected to corrosive underlying layers with contacts (118) and (124) of non-corrosive material such as a polysilicon or a polyside, or the active region of the substrate itself.