Patents by Inventor Hideyuki Kazumi
Hideyuki Kazumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240144560Abstract: A training method that performs learning using appropriate low-quality image and high-quality image is provided. The invention is directed to a training method including executing learning by inputting a first image generated under a first image generation condition and a second image generated under a second image generation condition different from the first image generation condition to a learning apparatus that adjusts parameters so as to suppress an error between an input image and a converted image, in which the second image is selected such that an index value extracted from the second image is the same as or has a predetermined relationship with an index value extracted from the first image, or the second image is output from a second image generation tool different from a first image generation tool for generating the first image.Type: ApplicationFiled: March 3, 2022Publication date: May 2, 2024Inventors: Zhaohui CHENG, Yasutaka TOYODA, Hideto DOHI, Hiroya OHTA, Hideyuki KAZUMI
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Patent number: 11798780Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: December 28, 2021Date of Patent: October 24, 2023Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 11769650Abstract: Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipole 100 comprises: a plurality of poles Q1-Q4 that are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P1-P3 that are arranged between the plurality of poles Q1-Q4 and are made of an insulator. The poles Q1-Q4 and the braces P1-P3 are joined by fitting the braces P1-P3 into the cutouts N and applying brazing so as to be interposed by a bonding material.Type: GrantFiled: December 23, 2019Date of Patent: September 26, 2023Assignee: Hitachi High-Tech CorporationInventors: Hideto Dohi, Yoshinobu Ootaka, Masashi Inada, Hideyuki Kazumi, Hideo Kashima
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Publication number: 20230113759Abstract: The present invention has been made in view of the above problems, and an object thereof is to provide a charged particle beam device capable of improving the reproducibility of the magnetic field response of a magnetic field lens and realizing highly-accurate electron orbit control in a short time. A charged particle beam device according to the present invention generates an excitation current of a magnetic field lens by combining a direct current with an alternating current (see FIG. 6A).Type: ApplicationFiled: May 13, 2020Publication date: April 13, 2023Inventors: Shingo HAYASHI, Hideyuki KAZUMI, Zhaohui CHENG, Hideto DOHI
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Publication number: 20220415605Abstract: A charged particle optical system includes an aberration corrector 209 that corrects aberration of a charged particle beam and has multipoles of a plurality of stages. The aberration corrector generates a plurality of multipole fields in a superimposed manner for each of the multipoles of the plurality of stages in order to correct the aberration of the charged particle beam. In order to reduce the influence of a parasitic field due to distortion of the multipole, for a first multipole field to be generated in a multipole of any stage among the plurality of stages, a value of a predetermined correction voltage or correction current to be applied to a plurality of poles for generating the first multipole field is corrected so as to eliminate movement of an observation image obtained based on electrons detected from a detector 215 by irradiating a sample with the charged particle beam before and after the first multipole field is generated.Type: ApplicationFiled: November 21, 2019Publication date: December 29, 2022Inventors: Shingo HAYASHI, Hideto DOHI, Zhaohui CHENG, Hideyuki KAZUMI
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Patent number: 11443914Abstract: The objective of the present invention is to use brightness images acquired under different energy conditions to estimate the size of a defect in the depth direction in a simple manner. A charged-particle beam device according to the present invention determines the brightness ratio for each irradiation position on a brightness image while changing parameters varying the signal amount, estimates the position of the defect in the depth direction on the basis of the parameters at which the brightness ratio is at a minimum, and estimates the size of the defect in the depth direction on the basis of the magnitude of the brightness ratio (see FIG. 5).Type: GrantFiled: December 18, 2018Date of Patent: September 13, 2022Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Hajime Kawano, Kouichi Kurosawa, Hideyuki Kazumi
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Publication number: 20220122804Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: December 28, 2021Publication date: April 21, 2022Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Publication number: 20220037113Abstract: Provided are a multistage-connected multipole and a charged particle beam device that can be produced with precision in machining without requiring precision in brazing between a pole and an insulation material. This multi-stage connected multipole 100 comprises: a plurality of poles Q1-Q4 that are arranged along the optical-axis direction of a charged particle beam, and that have cutouts Non surfaces facing each other; and braces P1-P3 that are arranged between the plurality of poles Q1-Q4 and are made of an insulator. The poles Q1-Q4 and the braces P1-P3 are joined by fitting the braces P1-P3 into the cutouts N and applying brazing so as to be interposed by a bonding material.Type: ApplicationFiled: December 23, 2019Publication date: February 3, 2022Inventors: Hideto DOHI, Yoshinobu OOTAKA, Masashi INADA, Hideyuki KAZUMI, Hideo KASHIMA
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Patent number: 11239052Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: June 12, 2020Date of Patent: February 1, 2022Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 11211226Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.Type: GrantFiled: March 6, 2020Date of Patent: December 28, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Toshiyuki Yokosuka, Hirohiko Kitsuki, Daisuke Bizen, Makoto Suzuki, Yusuke Abe, Kenji Yasui, Mayuka Osaki, Hideyuki Kazumi
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Publication number: 20210366685Abstract: The objective of the present invention is to use brightness images acquired under different energy conditions to estimate the size of a defect in the depth direction in a simple manner. A charged-particle beam device according to the present invention determines the brightness ratio for each irradiation position on a brightness image while changing parameters varying the signal amount, estimates the position of the defect in the depth direction on the basis of the parameters at which the brightness ratio is at a minimum, and estimates the size of the defect in the depth direction on the basis of the magnitude of the brightness ratio (see FIG. 5).Type: ApplicationFiled: December 18, 2018Publication date: November 25, 2021Inventors: Toshiyuki YOKOSUKA, Hajime KAWANO, Kouichi KUROSAWA, Hideyuki KAZUMI
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Patent number: 11133147Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).Type: GrantFiled: August 24, 2018Date of Patent: September 28, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Toshiyuki Yokosuka, Hajime Kawano, Kouichi Kurosawa, Hideyuki Kazumi, Chahn Lee
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Patent number: 11101100Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).Type: GrantFiled: August 24, 2018Date of Patent: August 24, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Toshiyuki Yokosuka, Hajime Kawano, Kouichi Kurosawa, Hideyuki Kazumi, Chahn Lee
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Patent number: 11011348Abstract: Provided is a scanning electron microscope. The scanning electron microscope is capable of removing a charge generated on a side wall of a deep hole or groove, and inspects and measures a bottom portion of the deep hole or groove with high accuracy.Type: GrantFiled: January 17, 2017Date of Patent: May 18, 2021Assignee: HITACHI HIGH-TECH CORPORATIONInventors: Daisuke Bizen, Natsuki Tsuno, Takafumi Miwa, Makoto Sakakibara, Toshiyuki Yokosuka, Hideyuki Kazumi
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Publication number: 20200321189Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.Type: ApplicationFiled: March 6, 2020Publication date: October 8, 2020Inventors: Toshiyuki YOKOSUKA, Hirohiko KITSUKI, Daisuke BIZEN, Makoto SUZUKI, Yusuke ABE, Kenji YASUI, Mayuka OSAKI, Hideyuki KAZUMI
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Publication number: 20200312615Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: ApplicationFiled: June 12, 2020Publication date: October 1, 2020Inventors: Toshiyuki YOKOSUKA, Chahn LEE, Hideyuki KAZUMI, Hajime KAWANO, Shahedul HOQUE, Kumiko SHIMIZU, Hiroyuki TAKAHASHI
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Publication number: 20200294756Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).Type: ApplicationFiled: August 24, 2018Publication date: September 17, 2020Inventors: Toshiyuki YOKOSUKA, Hajime KAWANO, Kouichi KUROSAWA, Hideyuki KAZUMI, Chahn LEE
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Patent number: 10727024Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculateType: GrantFiled: August 23, 2016Date of Patent: July 28, 2020Assignee: Hitachi High-Technologies CorporationInventors: Kotoko Urano, Zhaohui Cheng, Takeyoshi Ohashi, Hideyuki Kazumi
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Patent number: 10720306Abstract: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.Type: GrantFiled: February 14, 2019Date of Patent: July 21, 2020Assignee: Hitachi High-Tech CorporationInventors: Toshiyuki Yokosuka, Chahn Lee, Hideyuki Kazumi, Hajime Kawano, Shahedul Hoque, Kumiko Shimizu, Hiroyuki Takahashi
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Patent number: 10541103Abstract: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.Type: GrantFiled: December 10, 2014Date of Patent: January 21, 2020Assignee: Hitachi High-Technologies CorporationInventors: Yuzuru Mizuhara, Toshiyuki Yokosuka, Hideyuki Kazumi, Kouichi Kurosawa, Kenichi Myochin