Patents by Inventor Hideyuki Matsuda

Hideyuki Matsuda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6103488
    Abstract: The present invention relates to production of ubiquinone-10 in E. coli by isolating and sequencing a structural gene dds1 of decaprenyl diphosphate synthase derived from photosynthetic bacteria such as Rhodobacter capsulatus., and expressing it in E. coli.
    Type: Grant
    Filed: January 21, 1998
    Date of Patent: August 15, 2000
    Assignee: Alpha Foods Co., Ltd.
    Inventors: Hideyuki Matsuda, Makoto Kawamukai, Tsuyoshi Nakagawa, Katsunori Tanaka
  • Patent number: 5822535
    Abstract: In a network management and data collection system, a management node specifies suitable numbers of accumulated data and sends inquiry packets, and managed nodes collect data required for the above-described accumulated numbers with the specified time interval. Then, the managed nodes compiles the collected and accumulated data into a response packet, and sends the data to the management node. With the system, the number of the response packets can be reduced, and further, this can prevent inquiry and response packets from being concentrated and flowing to a network at once.
    Type: Grant
    Filed: March 13, 1996
    Date of Patent: October 13, 1998
    Assignee: Fujitsu Limited
    Inventors: Kohichi Takase, Hideyuki Matsuda
  • Patent number: 5723259
    Abstract: A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: March 3, 1998
    Assignee: Fujitsu Limited
    Inventors: Akira Oikawa, Hiroyuki Tanaka, Hideyuki Matsuda
  • Patent number: 5698656
    Abstract: A moisture-curing urethane adhesive composition of a urethane prepolymer resulting from the reaction of a mixture of a polyether diol and a polyether triol with a diisocyanate compound, and a polyurethane compound resulting from the reaction of a mixture of a polyester polyol and a polypropyleneether polyol with a hexamethylene diisocyanate compound with addition of a monoalcohol. A modified moisture-curing urethane adhesive composition of a urethane prepolymer resulting from the reaction of a mixture of a polyether diol and a polyether triol with a diisocyanate compound, a first polyurethane compound resulting from the reaction of a copolymeric polyol consisting of propylene oxide and .epsilon.-caprolactone with a hexamethylene diisocyanate compound with addition of a monoalcohol, and a second polyurethane compound resulting from the reaction of a polyester polyol with a hexamethylene diisocyanate compound with addition of a monoalcohol.
    Type: Grant
    Filed: November 7, 1995
    Date of Patent: December 16, 1997
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Yoshinobu Ohashi, Hideyuki Matsuda, Eiji Nishi, Tsuyoshi Nishida
  • Patent number: 5693145
    Abstract: A composition for negative type chemically amplified resist including, as main components, a random copolymer of vinyl phenol and vinyl cyclohexanol, a melamine resin having an enhanced hexamethoxymethylmelamine content, an acid generator for generating an acid upon irradiation by ionizing radiation, and a solvent. The resist pattern formation process and apparatus are also disclosed.
    Type: Grant
    Filed: June 6, 1995
    Date of Patent: December 2, 1997
    Assignee: Fujitsu Limited
    Inventors: Akira Oikawa, Hiroyuki Tanaka, Hideyuki Matsuda
  • Patent number: 5576558
    Abstract: A primer composition containing:(a) at least one polyisocyanate component selected from 4,4'-diphenylmethane diisocyanate, tolylene diisocyanate, xylene diisocyanates, hexamethylene diisocyanate, hydrogenated 4,4'-diphenylmethane diisocyanate, hydrogenated tolylene diisocyanates, hydrogenated xylene diisocyanates, isophorone diisocyanate, aromatic aliphatic polyisocyanates, aromatic polyisocyanates, triphenylmethane triisocyanates, and tris(p-isocyanatophenyl) thiophosphate, polymeric diphenylmethane diisocyanates and mixtures thereof; and(b) at least one phosphate component selected from aluminum phosphate, zinc phosphate, and aluminum dihydrogentripolyphosphate, wherein the phosphate is treated with a Si compound, a Zn compound or a mixture thereof.
    Type: Grant
    Filed: December 1, 1994
    Date of Patent: November 19, 1996
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Hideyuki Matsuda, Yoshinobu Ohashi, Masamichi Danjo
  • Patent number: 5367036
    Abstract: A moisture-curable urethane-based sealing composition is made up of an urethane prepolymer and a polyurethane compound blended together in specified amounts. The urethane prepolymer is derivable by reacting a selected class of polyether polyols with a selected class of polyisocyanate compounds. The polyurethane compound is available by reacting a selected class of polyether or polyester polyols with a selected class of polyisocyanate compounds, followed by reaction of the resulting prepolymer with a selected class of monoalcohols to thereby binder all isocyanate groups in the prepolymer. The ultimate sealant is adequate in initial adhesion strength, low in glass transition temperature and resistant to moist heat.
    Type: Grant
    Filed: October 23, 1992
    Date of Patent: November 22, 1994
    Assignee: The Yokohama Rubber Co., Ltd.
    Inventors: Hitoshi Saito, Tetsuji Kitamura, Hideyuki Matsuda, Masamichi Danjo, Eiji Nishi
  • Patent number: 5208159
    Abstract: Two strains of chitinolytic bacteria respectively named "Corynebacterium Bine-A" "Achromobacter Bine-B", which were deposited under deposit numbers FERM BP-2879 and FERM BP-2880 in the Fermentation Research Institute, Agency of Industrial Science and Technology, Japan. At least one of these strains is incubated on a chitin or chitosan medium, to prepare a culture material, which is usable directly as a solid antibacterial composition or fermented or aged to produce a solid antibacterial composition. Alternatively, water is added to the prepared culture material, and either of the liquid and solid phases may be used as an antibacterial, anti-nematode, and/or plant-cell activating composition.
    Type: Grant
    Filed: May 15, 1990
    Date of Patent: May 4, 1993
    Assignee: Toda Biosystem Laboratory
    Inventors: Takashi Toda, Hideyuki Matsuda
  • Patent number: 5139949
    Abstract: An anti-microbial composition or an anti-nematode agent including chitosan which is obtained by decomposing chitin with a strain of Enterobacter G-1, which was deposited in the Fermentation Research Institute, Agency of Industrial Science and Technology, Japan, or including a culture body which is obtained by cultivating the above strain of Enterobacter G-1 on a culture medium containing chitin.
    Type: Grant
    Filed: December 31, 1990
    Date of Patent: August 18, 1992
    Assignee: San-in Kensetsu Kogyo K.K.
    Inventors: Hideyuki Matsuda, Youzi Omura
  • Patent number: 4894690
    Abstract: A thin film transistor array includes a gate bus and a source bus intersecting with each other at right angles, a thin film transistor pair disposed adjacent to the intersecting point and electrically connected to the two buses. If a short circuit is detected between the two buses, the gate bus or the source bus is severed into a separate portions to eliminate the short circuit. A bypass bus is provided to electrically connect the electrically good severed portions and to the end terminal. Such a bypass bus avoids the need for additional power supply terminals to the opposite ends of the severed bus and facilitates driving the thin film transistor by supplying the power at only one end thereof.
    Type: Grant
    Filed: March 25, 1988
    Date of Patent: January 16, 1990
    Assignee: Alps Electric Co., Ltd.
    Inventors: Kazuya Okabe, Hideyuki Matsuda, Yasuhiko Kasama, Hiroyuki Hebiguchi
  • Patent number: 4853755
    Abstract: In a thin-film transistor array, a plurality of gate buses and a plurality of source buses are formed on a substrate in such a manner that said gate buses are intersected with said source buses at crossover portions, and a plurality of thin-film transistors are formed on the substrate adjacent to the crossover portion, which are connected to the gate buses and source buses for a driving purpose.Furthermore, an auxiliary bus is formed on either the gate buses, or source buses, shortcircuited portions of which are cut out by means of laser trimming so as to conduct the gate buses or source buses.
    Type: Grant
    Filed: March 17, 1988
    Date of Patent: August 1, 1989
    Assignee: Alps Electric Co., Ltd.
    Inventors: Kazuya Okabe, Hideyuki Matsuda, Chisato Iwasaki, Satoshi Fujimoto
  • Patent number: 4810061
    Abstract: Disclosed is a liquid crystal element using a film transistor as a switching element, the liquid crystal element comprising two substrates opposed to each other, film transistors and spacers disposed on the opposed surface of one of the substrates, a transparent electrode formed on the opposed surface of the other substrate, a metal wiring formed simultaneously with a light shield of a film transistor or an upper metal layer of the spacer, the metal wiring having one end disposed between the film transistor or spacer and the transparent electrode whereas the other end thereof extends to the peripheral edge of the one substrate.
    Type: Grant
    Filed: March 25, 1988
    Date of Patent: March 7, 1989
    Assignee: Alps Electric Co., Ltd.
    Inventors: Jun Nakanowatari, Kazuya Okabe, Hideyuki Matsuda