Patents by Inventor Hideyuki Ogata
Hideyuki Ogata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9791160Abstract: A floor-positioned air-conditioning apparatus including a housing including a fan and a heat exchanger; a forward blowing control member rotatably arranged at a forward air outlet formed in a housing front surface at a position near a housing top surface; and an upward blowing control member rotatably arranged at an upward air outlet formed near the housing front surface are included. The forward blowing control member closes the forward air outlet and the upward blowing control member closes the upward air outlet during operation stop. The forward blowing control member closes the forward air outlet and the upward blowing control member is rotated and opens the upward air outlet during cooling operation. The upward blowing control member closes the upward air outlet and the forward blowing control member is rotated and opens the forward air outlet during heating operation.Type: GrantFiled: February 14, 2013Date of Patent: October 17, 2017Assignee: Mitsubishi Electric CorporationInventors: Kouji Yamaguchi, Hideyuki Ogata, Takashi Ikeda, Masatomo Hatta, Keichi Ochiai, Tetsuo Yamashita, Tetsuya Tazawa, Keisuke Tomomura, Toshiya Yamauchi
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Patent number: 8957351Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.Type: GrantFiled: March 30, 2012Date of Patent: February 17, 2015Assignees: SANYO Electric Co., Ltd., ULVAC, Inc.Inventors: Masaki Shima, Yoshinori Wakamiya, Shuji Osono, Satohiro Okayama, Hideyuki Ogata
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Publication number: 20140367069Abstract: A floor-positioned air-conditioning apparatus including a housing including a fan and a heat exchanger; a forward blowing control member rotatably arranged at a forward air outlet formed in a housing front surface at a position near a housing top surface; and an upward blowing control member rotatably arranged at an upward air outlet formed near the housing front surface are included. The forward blowing control member closes the forward air outlet and the upward blowing control member closes the upward air outlet during operation stop. The forward blowing control member closes the forward air outlet and the upward blowing control member is rotated and opens the upward air outlet during cooling operation. The upward blowing control member closes the upward air outlet and the forward blowing control member is rotated and opens the forward air outlet during heating operation.Type: ApplicationFiled: February 14, 2013Publication date: December 18, 2014Applicant: Mitsubishi Electric CorporationInventors: Kouji Yamaguchi, Hideyuki Ogata, Takashi Ikeda, Masatomo Hatta, Keichi Ochiai, Tetsuo Yamashita, Tetsuya Tazawa, Keisuke Tomomura, Toshiya Yamauchi
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Publication number: 20120190176Abstract: In a catalytic CVD equipment, the control unit controls a temperature of the catalytic wires to a standby temperature at predetermined time intervals before and after the film is formed. The standby time is a predetermined temperature which is lower than the temperature of the catalytic wires when the film is formed, and is higher than room temperature.Type: ApplicationFiled: March 30, 2012Publication date: July 26, 2012Applicants: ULVAC, INC., SANYO ELECTRIC CO., LTD.Inventors: Motohide KAI, Shuji OSONO, Satohiro OKAYAMA, Hideyuki OGATA
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Publication number: 20120190149Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.Type: ApplicationFiled: March 30, 2012Publication date: July 26, 2012Applicants: ULVAC, INC., SANYO ELECTRIC CO., LTD.Inventors: Masaki SHIMA, Yoshinori WAKAMIYA, Shuji OSONO, Satohiro OKAYAMA, Hideyuki OGATA
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Publication number: 20120034731Abstract: A photoelectric conversion device manufacturing system in which a photoelectric conversion device is manufactured, the photoelectric conversion device including a p-type semiconductor layer, an i-type semiconductor layer, and an n-type semiconductor layer which are sequentially layered on a transparent-electroconductive film formed on a substrate in the photoelectric conversion device.Type: ApplicationFiled: April 6, 2010Publication date: February 9, 2012Applicant: ULVAC, INC.Inventors: Takafumi Noguchi, Hideyuki Ogata, Katsuhiko Mori, Yasuo Shimizu, Hiroto Uchida, Shin Asari
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Publication number: 20110189384Abstract: A thin-film solar cell manufacturing apparatus includes a film forming chamber that is evacuated to a reduced pressure and forms a film on a substrate using a CVD method; a loading-ejecting chamber that is connected to the film forming chamber via a first opening-closing part and that is switchable between atmospheric pressure and reduced pressure; a first carrier that holds a pre-processed substrate; and a second carrier that holds a post-processed substrate, wherein the loading-ejecting chamber simultaneously stores the first carrier and the second carrier.Type: ApplicationFiled: June 3, 2009Publication date: August 4, 2011Applicant: ULVAC, INC.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Jouji Wakamori, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara, Kazuya Saito
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Publication number: 20110120370Abstract: A thin-film solar cell manufacturing apparatus includes a film forming chamber which stores a substrate; and an electrode unit which performs film formation using a CVD method on the substrate in the film forming chamber. The electrode unit has an anode and a cathode; and a side wall portion which holds the anode and the cathode and forms a part of a wall portion of the film forming chamber, and is attachable to and detachable from the film forming chamber.Type: ApplicationFiled: June 3, 2009Publication date: May 26, 2011Applicant: ULVAC, INC.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Jouji Wakamori, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara
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Publication number: 20110107969Abstract: An apparatus for manufacturing a thin film solar cell of the present invention has a film forming chamber in which a substrate is arranged so that the film formation face of the substrate is substantially parallel to the direction of gravitational force and a film is formed on the film formation face by a CVD method; an electrode unit including a cathode unit having cathodes to which voltages are to be applied arranged on both sides thereof, and a pair of anodes each of which is arranged to face the cathodes, respectively, at a separation distance therefrom; and a conveying part which supports the substrate and conveys the substrate to between the cathode and the anode facing the cathode. The separation distance is variable.Type: ApplicationFiled: June 4, 2009Publication date: May 12, 2011Applicant: ULVAC, INC.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Jouji Wakamori, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara
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Publication number: 20110100297Abstract: A thin-film solar cell manufacturing apparatus includes a film forming chamber that is evacuated to a reduced pressure and forms a film on a substrate using a CVD method; a loading-ejecting chamber that is connected to the film forming chamber via a first opening-closing part and that is switchable between atmospheric pressure and reduced pressure; transfer rail that is laid at the film forming chamber and the loading-ejecting chamber; a carrier that holds the substrate and moves along the transfer rail; and a carrier transfer mechanism that transfers the carrier, wherein, the carrier transfer mechanism is provided in the loading-ejecting chamber to transfer the carrier between the film forming chamber and the loading-ejecting chamber.Type: ApplicationFiled: June 3, 2009Publication date: May 5, 2011Applicant: ULVAC, INC.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Jouji Wakamori, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara
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Publication number: 20110100296Abstract: A film formation apparatus includes: a film forming chamber in which a desired film is formed on a substrate in a vacuum; a loading-ejecting chamber fixed to the film forming chamber with a first opening-closing section interposed therebetween, being capable of reducing a pressure inside the loading-ejecting chamber so as to form a vacuum atmosphere; a second opening-closing section provided at a face opposite to the face of the loading-ejecting chamber on which the first opening-closing section is provided; and a carrier holding the substrate so that a film formation face of the substrate is substantially parallel to a direction of gravitational force, wherein the carrier or the substrate passes through the second opening-closing section, and is transported to the loading-ejecting chamber and is transported from the loading-ejecting chamber; a plurality of carriers is disposed in the loading-ejecting chamber in parallel to each other; the plurality of carriers is transported in parallel between the loading-eType: ApplicationFiled: June 5, 2009Publication date: May 5, 2011Applicant: ULVAC, INC.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Jouji Wakamori, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara
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Publication number: 20110094445Abstract: An apparatus for manufacturing a thin film solar cell of the present invention includes a film forming chamber in which a film is formed on a film formation face of a substrate using a CVD method; an electrode unit including a cathode unit having cathodes to which voltages are to be applied arranged on both sides thereof, and a pair of anodes each of which is arranged to face a different one of the cathodes, at a separation distance therefrom; a mask for covering a peripheral edge portion of the substrate; and a discharge duct installed around the cathode unit. A film formation space is formed between the cathode unit and the substrate installed on the side of the anode, an evacuation passage is formed between the mask and the cathode unit, the discharge duct and the film formation space are connected together via the evacuation passage, and a film forming gas introduced into the film formation space is evacuated from the discharge duct through the evacuation passage.Type: ApplicationFiled: June 4, 2009Publication date: April 28, 2011Applicant: ULVAC, Inc.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Jouji Wakamori, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara, Masanori Hashimoto, Sadatsugu Wakamatsu
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Publication number: 20110094446Abstract: A thin-film solar cell manufacturing apparatus, includes: a film formation space in which a substrate is disposed so that a film formation face of the substrate is substantially parallel to a direction of gravitational force, and in which a desired film is formed on the film formation face by a CVD method; a cathode unit including cathodes to which a voltage is applied, and two or more power feeding points, the cathodes being disposed at both sides of the cathode unit; and an anode distantly disposed so as to face the cathodes that are disposed at both sides of the cathode unit.Type: ApplicationFiled: June 5, 2009Publication date: April 28, 2011Applicant: ULVAC, INC.Inventors: Yasuo Shimizu, Hideyuki Ogata, Koichi Matsumoto, Takafumi Noguchi, Yosuke Jimbo, Satohiro Okayama, Yawara Morioka, Noriyasu Sugiyama, Takashi Shigeta, Hiroyuki Kurihara, Masanori Hashimoto, Sadatsugu Wakamatsu
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Patent number: 7896968Abstract: The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37).Type: GrantFiled: May 10, 2006Date of Patent: March 1, 2011Assignee: Ulvac, Inc.Inventors: Takayoshi Hirono, Isao Tada, Atsushi Nakatsuka, Masashi Kikuchi, Hideyuki Ogata, Hiroaki Kawamura, Kazuya Saito, Masatoshi Sato
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Publication number: 20080006206Abstract: The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film. A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33,34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37).Type: ApplicationFiled: May 10, 2006Publication date: January 10, 2008Inventors: Takayoshi Hirono, Isao Tada, Atsushi Nakatsuka, Masashi Kikuchi, Hideyuki Ogata, Hiroaki Kawamura, Kazuya Saito, Masatoshi Sato