Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).

Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).

Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).

Abstract: A binder resin composition for secondary battery electrodes is described as containing a polymer (A) that has a structural unit represented by general formula (1) and a water-insoluble particulate polymer (B-1) and/or a water-soluble polymer (B-2) where (A), (B-1) and (B-2) are defined as described. A slurry for secondary battery electrodes contains the binder resin composition, an active material and a solvent. An electrode for secondary batteries is provided with a collector and an electrode layer that is arranged on the collector, where the electrode layer contains an active material and the binder resin composition. Alternatively, the electrode layer is obtained by applying the slurry for secondary battery electrodes to the collector, and drying the slurry thereon.

Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).

Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).

Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).

Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).

Abstract: A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample.

Abstract: This resin composition for secondary battery electrodes contains (A) a polymer that contains a vinyl cyanide unit but does not contain an acidic group, (B) a polymer that contains an acidic group and (C) a compound that contains a hydroxyl group.

Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): where L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.

Abstract: A binder resin composition for secondary battery electrodes is described as containing a polymer (A) that has a structural unit represented by general formula (1) and a water-insoluble particulate polymer (B-1) and/or a water-soluble polymer (B-2) where (A), (B-1) and (B-2) are defined as described. A slurry for secondary battery electrodes contains the binder resin composition, an active material and a solvent. An electrode for secondary batteries is provided with a collector and an electrode layer that is arranged on the collector, where the electrode layer contains an active material and the binder resin composition. Alternatively, the electrode layer is obtained by applying the slurry for secondary battery electrodes to the collector, and drying the slurry thereon.

Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).

Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by the following formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): [Chemical formula 1] in the formula (1), L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.

Abstract: A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample.

Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by the following formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): in the formula (1), L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.

Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.