Patents by Inventor Hikaru Momose

Hikaru Momose has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200010673
    Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).
    Type: Application
    Filed: July 9, 2019
    Publication date: January 9, 2020
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Yutaka AOKI, Fumi OOBA, Masahiro UEDA, Shinji MATSUOKA, Mitsufumi NODONO, Hikaru MOMOSE
  • Patent number: 10513606
    Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).
    Type: Grant
    Filed: August 28, 2015
    Date of Patent: December 24, 2019
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yutaka Aoki, Fumi Ooba, Masahiro Ueda, Shinji Matsuoka, Mitsufumi Nodono, Hikaru Momose
  • Patent number: 10446850
    Abstract: A binder resin composition for secondary battery electrodes is described as containing a polymer (A) that has a structural unit represented by general formula (1) and a water-insoluble particulate polymer (B-1) and/or a water-soluble polymer (B-2) where (A), (B-1) and (B-2) are defined as described. A slurry for secondary battery electrodes contains the binder resin composition, an active material and a solvent. An electrode for secondary batteries is provided with a collector and an electrode layer that is arranged on the collector, where the electrode layer contains an active material and the binder resin composition. Alternatively, the electrode layer is obtained by applying the slurry for secondary battery electrodes to the collector, and drying the slurry thereon.
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: October 15, 2019
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Fumino Momose, Haruki Okada, Ayako Shimonaka, Mitsufumi Nodono, Daisuke Fujikawa, Hikaru Momose, Akihiro Ishii
  • Patent number: 10361434
    Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: July 23, 2019
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Haruki Okada, Mitsufumi Nodono, Hikaru Momose, Fumino Momose, Fumiko Fujie, Akikazu Matsumoto, Daisuke Fujikawa, Ayako Shimonaka, Akihiro Ishii
  • Patent number: 9774038
    Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: September 26, 2017
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Haruki Okada, Mitsufumi Nodono, Hikaru Momose, Fumino Momose, Fumiko Fujie, Akikazu Matsumoto, Daisuke Fujikawa, Ayako Shimonaka, Akihiro Ishii
  • Publication number: 20170253736
    Abstract: A (meth)acrylate resin material comprising a polymer (A1) having constituent units (a1) derived from a compound represented by formula (1) and constituent units (a2) derived from methyl methacrylate, and an acid (B) and/or a nucleating agent (C). In the formula, Ar represents an aryl group, and the aromatic ring in Ar is directly bonded to the ester end in formula (1).
    Type: Application
    Filed: August 28, 2015
    Publication date: September 7, 2017
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Yutaka AOKI, Fumi OOBA, Masahiro UEDA, Shinji MATSUOKA, Mitsufumi NODONO, Hikaru MOMOSE
  • Publication number: 20170244105
    Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).
    Type: Application
    Filed: April 28, 2017
    Publication date: August 24, 2017
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Haruki OKADA, Mitsufumi NODONO, Hikaru MOMOSE, Fumino MOMOSE, Fumiko FUJIE, Akikazu MATSUMOTO, Daisuke FUJIKAWA, Ayako SHIMONAKA, Akihiro ISHII
  • Patent number: 9733564
    Abstract: A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: August 15, 2017
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Atsushi Yasuda, Tomoya Oshikiri, Hikaru Momose
  • Publication number: 20160260975
    Abstract: This resin composition for secondary battery electrodes contains (A) a polymer that contains a vinyl cyanide unit but does not contain an acidic group, (B) a polymer that contains an acidic group and (C) a compound that contains a hydroxyl group.
    Type: Application
    Filed: October 7, 2014
    Publication date: September 8, 2016
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Kenichi ISHIGAKI, Mitsufumi NODONO, Fumino MOMOSE, Daisuke FUJIKAWA, Akikazu MATSUMOTO, Hikaru MOMOSE
  • Patent number: 9188857
    Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): where L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.
    Type: Grant
    Filed: May 22, 2013
    Date of Patent: November 17, 2015
    Assignee: MITSUBISHI RAYON CO., LTD.
    Inventors: Hikaru Momose, Akifumi Ueda
  • Publication number: 20140349185
    Abstract: A binder resin composition for secondary battery electrodes is described as containing a polymer (A) that has a structural unit represented by general formula (1) and a water-insoluble particulate polymer (B-1) and/or a water-soluble polymer (B-2) where (A), (B-1) and (B-2) are defined as described. A slurry for secondary battery electrodes contains the binder resin composition, an active material and a solvent. An electrode for secondary batteries is provided with a collector and an electrode layer that is arranged on the collector, where the electrode layer contains an active material and the binder resin composition. Alternatively, the electrode layer is obtained by applying the slurry for secondary battery electrodes to the collector, and drying the slurry thereon.
    Type: Application
    Filed: January 11, 2013
    Publication date: November 27, 2014
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Fumino Momose, Haruki Okada, Ayako Shimonaka, Mitsufumi Nodono, Daisuke Fujikawa, Hikaru Momose, Akihiro Ishii
  • Publication number: 20140287308
    Abstract: A binder resin for a nonaqueous secondary battery electrode of the invention satisfies Is?30 (Is indicates a sum of scattering intensities observed in a particle size range of from 1 to 100 nm) when a solution is formed by dissolving the binder resin in water at a concentration of 5% by mass and particle size distribution is measured by a dynamic light scattering method at 25° C. The binder resin contains a polymer (B) having a structural unit represented by the following Formula (11) and a specific structural unit. The binder resin also contains a polymer (?) having a specific structural unit and a structural unit represented by the following Formula (22), and/or a mixture of a polymer (?1) having a specific structural unit and a polymer (?2) having a structural unit represented by the following Formula (22).
    Type: Application
    Filed: November 30, 2012
    Publication date: September 25, 2014
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Haruki Okada, Mitsufumi Nodono, Hikaru Momose, Fumino Momose, Fumiko Fujie, Akikazu Matsumoto, Daisuke Fujikawa, Ayako Shimonaka, Akihiro Ishii
  • Patent number: 8614283
    Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: December 24, 2013
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Atsushi Ootake, Tadashi Nakamura, Akifumi Ueda
  • Patent number: 8580481
    Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: November 12, 2013
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
  • Publication number: 20130252181
    Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by the following formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): [Chemical formula 1] in the formula (1), L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.
    Type: Application
    Filed: May 22, 2013
    Publication date: September 26, 2013
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru MOMOSE, Akifumi Ueda
  • Publication number: 20130224654
    Abstract: A target variable analysis unit (11) calculates the triad fractions of monomer units in the composition of a known polymer sample from the copolymerization reactivity ratios of the monomer units to obtain a target variable. A waveform processing unit (12) processes NMR measurements, signals, etc. An explanatory variable analysis unit (13) obtains explanatory variables from the amount of chemical shift and signal strength in the NMR measurements of the known sample. A model generation unit (14) determines the regression equation of the regression model of the target variable and the explanatory variables by partial least squares regression, and obtains regression model coefficients. A sample analysis unit (15) uses the regression model to calculate the triad fractions for an unknown copolymer sample from the amount of chemical shift and signal strength in the NMR measurements of the unknown copolymer sample.
    Type: Application
    Filed: October 14, 2011
    Publication date: August 29, 2013
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Atsushi Yasuda, Tomoya Oshikiri, Hikaru Momose
  • Patent number: 8476401
    Abstract: A resist polymer (Y?), which is used as a resist resin in DUV excimer laser lithography, electron beam lithography, and the like, contains a polymer (Y) comprising: a constituent unit (A) having a lactone skeleton; a constituent unit (B) having an acid-eliminable group; a constituent unit (C) having a hydrophilic group; and a constituent unit (E) having a structure represented by the following formula (1), wherein a content of the constituent unit (E) is 0.3 mol % or more based on the total number of the constituent units of the resist polymer (Y?): in the formula (1), L is a divalent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; R11 is a g-valent linear, branched, or cyclic C1-20 hydrocarbon group which may have a substituent and/or a heteroatom; and g represents an integer of 1 to 24.
    Type: Grant
    Filed: September 6, 2005
    Date of Patent: July 2, 2013
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Akifumi Ueda
  • Patent number: 8241829
    Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: August 14, 2012
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Atsushi Ootake, Tadashi Nakamura, Akifumi Ueda
  • Publication number: 20120034561
    Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
    Type: Application
    Filed: September 23, 2011
    Publication date: February 9, 2012
    Applicant: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai
  • Patent number: 8092979
    Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
    Type: Grant
    Filed: July 1, 2009
    Date of Patent: January 10, 2012
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hikaru Momose, Atsushi Ootake, Akifumi Ueda, Tadayuki Fujiwara, Masaru Takeshita, Ryotaro Hayashi, Takeshi Iwai