Patents by Inventor Hikaru Okunoyama

Hikaru Okunoyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5157107
    Abstract: A polymeric acid is synthesized by the ring-opening poly-addition reaction using a biphenyl tetracarboxylic acid as a tetracarboxylic acid moiety and an aromatic diamine, particularly p-phenylene diamine, as a diamine moiety. An aromatic polyimide resin layer possessing a highly desirable heat-resisting property as a heat-resistant insulating coating material and excelling in adhesive strength relative to a substrate is obtained by adjusting the polymeric acid in viscosity with a suitable organic solvent, applying the resultant polyamic acid on a substrate, and firing the applied layer of the polyamic acid. The substrate, for example, is a conductor layer formed as with copper and used as a multi-layer wiring board for hybrid IC's.
    Type: Grant
    Filed: August 29, 1989
    Date of Patent: October 20, 1992
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Chemical Corporation
    Inventors: Masaru Nikaido, Hikaru Okunoyama, Katsumi Yanagibashi, Yoshiaki Ouchi
  • Patent number: 5113241
    Abstract: A semiconductor device comprises a plurality of pellets fixed on a bed by a conductive adhesive agent, an insulating substrate having a junction wiring fixed on the bed between the semiconductor pellets, and wires for connecting the pellets and insulating substrate. The insulating substrate is fixed on the bed by an insulating adhesive agent including filling material such as particles of silicon dioxide and metal particles. The surfaces of the filling material particles are coated with an oxide film.
    Type: Grant
    Filed: December 14, 1990
    Date of Patent: May 12, 1992
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Satoru Yanagida, Kouji Araki, Hikaru Okunoyama, Tetsunori Niimi
  • Patent number: 4868584
    Abstract: A polyamic acid is synthesized by the ring-opening poly-addition reaction using a biphenyl tetracarboxylic acid as a tetracarboxylic acid moiety and an aromatic diamine, particularly p-phenylene diamine, as a diamine moiety. An aromatic polyimide resin layer possessing a highly desirable heat-resisting property as a heat-resistant insulating coating material and excelling in adhesive strength relative to a substrate is obtained by adjusting the polyamic acid in viscosity with a suitable organic solvent, applying the resultant polyamic acid on a substrate, and firing the applied layer of the polyamic acid. The substrate, for example, is a conductor layer formed as with copper and used as a multi-layer wiring board for hybrid IC's.
    Type: Grant
    Filed: January 29, 1988
    Date of Patent: September 19, 1989
    Assignees: Kabushiki Kaisha Toshiba, Toshiba Chemical Corporation
    Inventors: Masaru Nikaido, Hikaru Okunoyama, Katsumi Yanagibashi, Yoshiaki Ouchi
  • Patent number: 4472482
    Abstract: An electric implement having a combination of insulation coverages comprising a thermosetting resin impregnated in an insulation layer wound about the electric implement, and a photohardening resin deposited over the impregnated thermosetting resin. A method of electrically insulating the electric implement, comprising impregnating the insulation layer with a thermosetting resin in vacuum; depositing a photohardening resin on the exposed portion of the thermosetting resin layer; photopolymerizing the photohardening resin; and thermosetting the impregnated thermosetting resin.
    Type: Grant
    Filed: August 4, 1982
    Date of Patent: September 18, 1984
    Assignees: Tokyo Shibaura Denki Kabushiki Kaisha, Toshiba Chemical Products Co., Ltd.
    Inventors: Kenichi Sato, Hikaru Okunoyama