Abstract: A drawing apparatus according to the embodiment includes a chamber configured to house a processing target; a drawing part configured to draw a predetermined pattern on the processing target with a charged particle beam; a resistance measuring part configured to measure a resistance value of the processing target via a grounding member grounding the processing target in the chamber; a receiver configured to receive earthquake information; a controller configured to stop a drawing process in the chamber when the receiver receives the earthquake information; and an arithmetic processor configured to determine whether the processing target is grounded on a basis of the resistance value from the resistance measuring part, wherein the controller resumes the drawing process when the arithmetic processor determines that the processing target is grounded after the drawing process is stopped.

Abstract: In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.

Abstract: A drawing apparatus according to the embodiment includes a chamber configured to house a processing target; a drawing part configured to draw a predetermined pattern on the processing target with a charged particle beam; a resistance measuring part configured to measure a resistance value of the processing target via a grounding member grounding the processing target in the chamber; a receiver configured to receive earthquake information; a controller configured to stop a drawing process in the chamber when the receiver receives the earthquake information; and an arithmetic processor configured to determine whether the processing target is grounded on a basis of the resistance value from the resistance measuring part, wherein the controller resumes the drawing process when the arithmetic processor determines that the processing target is grounded after the drawing process is stopped.

Abstract: In one embodiment, a writing data generation method is for generating writing data used by a multi-charged particle beam writing apparatus. The writing data generation method includes referring to library data in which a vertex sequence including a plurality of vertices is registered, and extracting a portion of an outer line of a figure contained in design data, the portion corresponding to the vertex sequence, and representing the extracted portion by information which identifies the vertex sequence and information which indicates a connection method for the plurality of vertices of the vertex sequence, and generating the writing data.

Abstract: A charged particle beam writing method according to embodiments of the present disclosure includes: storing in a charged particle beam writing apparatus a position coordinate at which a drift amount is diagnosed; storing in the charged particle beam writing apparatus first and second time interval patterns which define time intervals to diagnose the drift amount of the charged particle beam; performing first writing of irradiating a target object with the charged particle beam, and writing a writing pattern on the target object while diagnosing the drift amount based on the first time interval pattern during the writing; and performing second writing of writing a predetermined writing pattern while diagnosing the drift amount when the writing reaches the position coordinate and diagnosing the drift amount based on the second time interval pattern during the writing after the writing reaches the position coordinate.

Abstract: A charged-particle beam drawing method includes: storing a plurality of time interval patterns defining time intervals for performing a diagnosis of a drift amount of charged-particle beam; drawing a predetermined drawing pattern on a sample by irradiating the beam on the sample; receiving first event information including occurrence of event and type of event; acquiring region information specifying a region being drawn by the beam; selecting a specific time interval pattern from the plurality of time interval patterns based on the type of the event of the first event information and the region information; diagnosing the drift amount of the beam based on the specific time interval pattern, until second event information is received, the second event information includes occurrence of event and type of event; and drawing a predetermined drawing pattern on the sample while performing a drift correction of the charged-particle beam, based on the diagnosing.

Abstract: A charged particle beam writing method according to embodiments of the present disclosure includes: storing in a charged particle beam writing apparatus a position coordinate at which a drift amount is diagnosed; storing in the charged particle beam writing apparatus first and second time interval patterns which define time intervals to diagnose the drift amount of the charged particle beam; performing first writing of irradiating a target object with the charged particle beam, and writing a writing pattern on the target object while diagnosing the drift amount based on the first time interval pattern during the writing; and performing second writing of writing a predetermined writing pattern while diagnosing the drift amount when the writing reaches the position coordinate and diagnosing the drift amount based on the second time interval pattern during the writing after the writing reaches the position coordinate.