Patents by Inventor Hilde Witte

Hilde Witte has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Silicon oxide cap over high dielectric constant films
    Publication number: 20060211259
    Abstract: A method for forming an integrated circuit structure on a semiconductor substrate comprises depositing a high k gate dielectric material over the substrate using an atomic layer deposition process. A silicon oxide capping layer is deposited over the gate dielectric material in a rapid thermal chemical vapor deposition process. A gate electrode is formed over the silicon oxide capping layer.
    Type: Application
    Filed: March 21, 2005
    Publication date: September 21, 2006
    Inventors: Jan Maes, Hilde Witte, Christophe Pomarede