Patents by Inventor Hindrik DeVries

Hindrik DeVries has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060081566
    Abstract: The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes (2), wherein at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes (2) causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit of a choke coil (3) and a non-saturable inductor (4).
    Type: Application
    Filed: August 12, 2005
    Publication date: April 20, 2006
    Applicant: Fuji Photo Film B.V.
    Inventors: Hindrik DeVries, Yoichiro Kamiyama, Jan Bouwstra, Mauritius Van de Sanden, Eugen Aldea, Paul Peeters
  • Publication number: 20060022606
    Abstract: The present invention provides an arrangement and method for generating a uniform and stable plasma. The arrangement comprises a discharge space (7) between at least a pair of electrodes (1, 2), which electrodes (1, 2) are arranged for providing an electric field and for generating a plasma in the electric field. At least one of the electrodes (1) has a boundary surface (6) with the discharge space (7). The boundary surface is comprised of one or more alternately arranged conductive (4) and insulating regions (5). The invention further relates to an electrode (1) for use in the arrangement described. The invention may, for example, be used in dielectric barrier discharge configurations, or in arrangements for generating plasmas at atmospheric pressures, or for generating plasmas at low temperatures, such as generating atmospheric pressure glow plasmas (APG) for material processing or surface (3) treatment purposes.
    Type: Application
    Filed: August 13, 2004
    Publication date: February 2, 2006
    Inventors: Hindrik DeVries, Jan Bouwstra, Eugen Aldea, Mauritius Van De Sanden
  • Publication number: 20050150602
    Abstract: Method of generating an atmospheric pressure glow discharge plasma (APG), wherein said plasma is generated in a discharge space formed between at least one first electrode surface and at least one second electrode surface. The method comprises at least the steps of supplying a gaseous substance to said discharge space and powering said first and said second electrode surface for generating said plasma. Said step of supplying a gaseous substance to the discharge space comprises providing at least one intermediate gas supply stream from at least one of said first and second electrode surfaces. The step of supplying said gaseous substance to the discharge space further comprises providing a main gas supply stream for forcing the at least one intermediate gas supply stream in a direction along the first and second electrode surfaces.
    Type: Application
    Filed: August 31, 2004
    Publication date: July 14, 2005
    Inventors: Hindrik DeVries, Jan Bouwstra