Patents by Inventor Hindrik Willem Mook
Hindrik Willem Mook has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20240017301Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: July 27, 2023Publication date: January 18, 2024Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 11738376Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: GrantFiled: April 22, 2021Date of Patent: August 29, 2023Assignee: ASML Netherlands, B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
Publication number: 20230207255Abstract: Disclosed herein is a multi-beam charged particle column configured to project a multi-beam of charged particles towards a target, the multi-beam charged particle column comprising at least one aperture array comprising at least two different aperture patterns; and a rotator configured to rotate the aperture array between the different aperture patterns.Type: ApplicationFiled: March 3, 2023Publication date: June 29, 2023Applicant: ASML Netherlands B.V.Inventors: Vincent Claude BEUGIN, Stijn Wilem Herman Karel STEENBRINK, Martin EBERT, Diego MARTINEZ NEGRETE GASQUE, Hindrik Willem MOOK, Albertus Victor Gerardus MANGNUS
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METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20210237129Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: April 22, 2021Publication date: August 5, 2021Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 10987705Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 6, 2020Date of Patent: April 27, 2021Assignee: ASML Netherlands B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20200230665Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: ApplicationFiled: April 6, 2020Publication date: July 23, 2020Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 10632509Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 26, 2018Date of Patent: April 28, 2020Assignee: ASML Netherlands B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20180236505Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: ApplicationFiled: April 26, 2018Publication date: August 23, 2018Inventors: Marc SMITS, Johan Joost KONING, Chris Franciscus Jessica LODEWIJK, Hindrik Willem MOOK, Ludovic LATTARD -
Method and system for the removal and/or avoidance of contamination in charged particle beam systems
Patent number: 9981293Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged parType: GrantFiled: April 21, 2016Date of Patent: May 29, 2018Assignee: MAPPER LITHOGRAPHY IP B.V.Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
METHOD AND SYSTEM FOR THE REMOVAL AND/OR AVOIDANCE OF CONTAMINATION IN CHARGED PARTICLE BEAM SYSTEMS
Publication number: 20170304878Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the chaType: ApplicationFiled: April 21, 2016Publication date: October 26, 2017Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard -
Patent number: 6670611Abstract: Electron optical aberrations of an energy filtering system of an energy filtering transmission electron microscope (EFTEM) are automatically corrected under computer control to set up the EFTEM for use. Optics of the electron microscope preceding an energy filter are used to scan the beam at the entrance to the filter in a pattern corresponding to a defined geometry. The beam can either be finely focused to yield a spot at each position visited during the pattern scan, or the beam can be spread out and imprinted with a well-defined intensity distribution, such as normally occurs due to passage of the beam through a specimen, so that its relative scanned displacements can be assessed using cross-correlation techniques. In the case of the finely focused beam, electron images of the scanned pattern directly yield a spot pattern image. Deviation of the recorded spot pattern image from the defined scan geometry reflect the imaging aberrations introduced by the energy filter.Type: GrantFiled: May 30, 2001Date of Patent: December 30, 2003Assignee: Technische Universiteit DelftInventors: Pieter Kruit, Hindrik Willem Mook
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Patent number: 6452169Abstract: The invention relates to a Wien filter provided with electrodes for generating an electric field, and magnetic poles for generating a magnetic field, said electrodes and magnetic poles being positioned around and having a finite length along a filter axis, and being positioned around the filter axis such that electric and magnetic forces induced by the respective fields and exerted on an electrically charged particle moving substantially along the fileter axis at a certain velocity, take substantially an opposite direction to one another and are directed substantially perpendicular to the particle's direction of movement through the filter, said filter having along its axis two ends determined by the finite length of the electrodes and magnetic poles, and said ends both being terminated by a closing plate which is positioned substantially transversely to the filter axis and is provided with an aperture around the filter axis to allow the particle to enter into an exit from the filter.Type: GrantFiled: June 21, 2000Date of Patent: September 17, 2002Assignee: Technische Universiteit DelftInventor: Hindrik Willem Mook