Patents by Inventor Hiral D. Tailor

Hiral D. Tailor has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Treatments for controlling deposition defects
    Patent number: 11894228
    Abstract: Exemplary methods of semiconductor processing may include forming a plasma of a carbon-containing precursor in a processing region of a semiconductor processing chamber. The methods may include depositing a carbon-containing material on a substrate housed in the processing region of the semiconductor processing chamber. The methods may include halting a flow of the carbon-containing precursor into the processing region of the semiconductor processing chamber. The methods may include contacting the carbon-containing material with plasma effluents of an oxidizing material. The methods may include forming volatile materials from a surface of the carbon-containing material.
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: February 6, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Sudha S. Rathi, Ganesh Balasubramanian, Nagarajan Rajagopalan, Abdul Aziz Khaja, Prashanthi Para, Hiral D. Tailor
  • TREATMENTS FOR CONTROLLING DEPOSITION DEFECTS
    Publication number: 20230061249
    Abstract: Exemplary methods of semiconductor processing may include forming a plasma of a carbon-containing precursor in a processing region of a semiconductor processing chamber. The methods may include depositing a carbon-containing material on a substrate housed in the processing region of the semiconductor processing chamber. The methods may include halting a flow of the carbon-containing precursor into the processing region of the semiconductor processing chamber. The methods may include contacting the carbon-containing material with plasma effluents of an oxidizing material. The methods may include forming volatile materials from a surface of the carbon-containing material.
    Type: Application
    Filed: August 26, 2021
    Publication date: March 2, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Sudha S. Rathi, Ganesh Balasubramanian, Nagarajan Rajagopalan, Abdul Aziz Khaja, Prashanthi Para, Hiral D. Tailor