Patents by Inventor Hirano Tomoyuki

Hirano Tomoyuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative resist composition, method of forming resist pattern and polymeric compound
    Patent number: 8771921
    Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: July 8, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Abe Sho, Shiono Daiju, Hirano Tomoyuki, Dazai Takahiro
  • NEGATIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND
    Publication number: 20120164581
    Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.
    Type: Application
    Filed: March 2, 2012
    Publication date: June 28, 2012
    Inventors: Abe Sho, Shiono Daiju, Hirano Tomoyuki, Dazai Takahiro