Abstract: One or more substrate processing apparatuses, one or more methods of manufacturing article(s), one or more substrate processing methods, and one or more computer-readable storage or recording mediums are provided herein. Provided is one or more embodiments of a substrate processing apparatus including a stage on which a substrate is mounted, a conveyor that operates to convey the substrate from the stage, a measuring sensor that operates to measure a temperature of the conveyor, an adjuster that operates to adjust a temperature of the substrate mounted on the stage, and a controller or processor that operates to perform an adjusting step of causing the adjuster to adjust the temperature of the substrate mounted on the stage so as to become the temperature of the conveyor measured by the measuring sensor.

Abstract: A planarized layer forming apparatus operable to use a pressing member to form a planarized layer of a curable composition on a substrate is provided. The apparatus comprises a pressing member holder for holding the pressing member, a substrate holder for holding the substrate, a curing device for curing the curable composition on the substrate, and a chamber for containing the pressing member holder and the substrate holder, and form a sealed space. The curable composition is caused to come into contact with the pressing member. After the contact, holding of the pressing member is released, and a space inside the chamber is pressurized. In a state where holding of the pressing member is released and the space inside the chamber is pressurized, the planarized layer is formed by curing the curable composition by the curing device.

Abstract: A planarized layer forming apparatus operable to use a pressing member to form a planarized layer of a curable composition on a substrate is provided. The apparatus comprises a pressing member holder for holding the pressing member, a substrate holder for holding the substrate, a curing device for curing the curable composition on the substrate, and a chamber for containing the pressing member holder and the substrate holder, and form a sealed space. The curable composition is caused to come into contact with the pressing member. After the contact, holding of the pressing member is released, and a space inside the chamber is pressurized. In a state where holding of the pressing member is released and the space inside the chamber is pressurized, the planarized layer is formed by curing the curable composition by the curing device.

Abstract: The present invention provides a lithography apparatus that performs patterning on a substrate with a beam, the apparatus comprising a blanker configured to perform blanking of the beam, and a controller configured to control the blanker based on a quantized value of dose with respect to each of pixels on the substrate, wherein the controller is configured to determine the quantized value of dose with respect to each of the pixels based on an error between a target value of dose and each of a plurality of predicted values of dose that are based on a plurality of quantized values of dose.

Abstract: A drawing apparatus that performs drawing on a substrate with a plurality of charged particle beams includes a blanker array configured to blank the plurality of charged particle beams, respectively; a generating device configured to generate a blanking signal for controlling the blanker array and an error detection signal for the blanking signal; and a plurality of transmission paths for transmitting signals between the generating device and the blanker array. The plurality of transmission paths include a first transmission path for transmitting the blanking signal and a second transmission path for transmitting the error detection signal. The generating device is configured to transmit a blanking signal and an error detection signal corresponding to the blanking signal via the first transmission path and the second transmission path, respectively, to the blanker array in parallel.