Patents by Inventor Hiroaki AMAHASHI

Hiroaki AMAHASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for electrochemically depositing carbon film on a substrate
    Patent number: 8951401
    Abstract: Dense carbon films are deposited on a conductive substrate by placing the substrate acting as anode in a molten salt electrolyte bath containing a source of carbide ion and applying DC current across the substrate and a counter electrode acting as cathode also placed in the molten salt electrolyte bath. The carbide ions are electrochemically oxidized to deposit a carbon film on the surface of the substrate.
    Type: Grant
    Filed: May 28, 2010
    Date of Patent: February 10, 2015
    Assignees: Toyota Boshoku Kabushiki Kaisha, I'msep Co., Ltd., Sec Carbon, Limited, The Doshisha
    Inventors: Tokujiro Nishikiori, Hiroaki Amahashi, Kouji Kuroda, Yasuhiko Ito, Naohiro Yasuda
  • Method for electrochemically depositing carbon nitride films on a substrate
    Patent number: 8545688
    Abstract: Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.
    Type: Grant
    Filed: May 28, 2010
    Date of Patent: October 1, 2013
    Assignees: Toyota Boshoku Kabushiki Kaisha, IMSEP Co., Ltd., SEC Carbon Limited, The Doshisha
    Inventors: Tokujiro Nishikiori, Hiroaki Amahashi, Kouji Kuroda, Yasuhiko Ito, Kazuhito Fukasawa, Naohiro Yasuda
  • METHOD FOR ELECTROCHEMICALLY DEPOSITING CARBON NITRIDE FILMS ON A SUBSTRATE
    Publication number: 20110290656
    Abstract: Dense carbon nitride films are electrochemically formed on a conductive substrate by placing the substrate acting as cathode in a molten salt electrolyte bath and applying DC current across the substrate and a counter electrode acting as anode also placed in the molten salt electrolyte bath. Carbonate ion and nitrate ion are concurrently reduced to deposit carbon nitride films on the substrate.
    Type: Application
    Filed: May 28, 2010
    Publication date: December 1, 2011
    Applicants: TOYOTA BOSHOKU KABUSHIKI KAISHA, THE DOSHISHA, SEC CARBON, LIMITED, I'MSEP CO., LTD.
    Inventors: Tokujiro NISHIKIORI, Hiroaki AMAHASHI, Kouji KURODA, Yasuhiko ITO, Kazuhito FUKASAWA, Naohiro YASUDA
  • METHOD FOR ELECTROCHEMICALLY DEPOSITING CARBON FILM ON A SUBSTRATE
    Publication number: 20110290655
    Abstract: Dense carbon films are deposited on a conductive substrate by placing the substrate acting as anode in a molten salt electrolyte bath containing a source of carbide ion and applying DC current across the substrate and a counter electrode acting as cathode also placed in the molten salt electrolyte bath. The carbide ions are electrochemically oxidized to deposit a carbon film on the surface of the substrate.
    Type: Application
    Filed: May 28, 2010
    Publication date: December 1, 2011
    Applicants: TOYOTA BOSHOKU KABUSHIKI KAISHA, THE DOSHISHA, SEC CARBON, LIMITED, I'MSEP CO., LTD.
    Inventors: Tokujiro NISHIKIORI, Hiroaki AMAHASHI, Kouji KURODA, Yasuhiko ITO, Naohiro YASUDA