Abstract: A red phosphor excellent in optical characteristics and durability in a high-temperature and high-humidity environment and a method for producing the same are provided. The red phosphor according to the present invention includes: a Mn-activated composite fluoride represented by a general formula (1); and a perovskite compound represented by a general formula (2): L2MF6:Mn4+ (1) where L represents at least one alkali metal element selected from a group consisting of sodium, potassium, etc., and M represents at least one tetravalent element selected from a group consisting of silicon, germanium, etc.; and ABX3 (2) where A represents at least one selected from a group consisting of sodium, potassium, etc., B represents at least one element selected from a group consisting of magnesium, calcium, etc., and X represents at least one element selected from a group consisting of fluorine, chlorine, bromine, iodine, and sulfur.

Abstract: A light distribution of light from a light-emitting device (10) has a higher luminous intensity in a first direction (D1) compared to a reference direction (R), the first direction (D1) being different from the reference direction (R). The reference direction (R) is a center direction of the light distribution, for example, a direction along the thickness direction of a substrate (100), a direction along the width direction of each layer (for example, an EML (126)) of a resonator (150), or a normal direction of a second surface (104) of the substrate (100). In addition, the light distribution has a higher luminous intensity in a second direction (D2) compared to the reference direction (R), the second direction (D2) being on an opposite side of the first direction (D1) with respect to the reference direction (R).

Abstract: An optically functional layer (160) is formed over a part of a second surface (100b) of a substrate (100). A first electrode (110) is formed over the optically functional layer (160), and a second electrode (130) is formed over the first electrode (110). An organic layer (120) is located between the first electrode (110) and the second electrode (130) and includes a light emitting layer. A plurality of the second electrodes (130) are formed. At least a part of a region between the plurality of second electrodes (130) has optical transparency. At least a part of an edge of the second electrode (130) is located outside the optically functional layer (160).

Abstract: A standard direction (S) is a horizontal direction (a direction along X direction in the drawing). A base material (200) is supported by a frame body (250) so that a second surface (204) of the base material (200) is oriented obliquely upward from the standard direction (S). Thereby, a reference direction (R) is oriented obliquely upward from the standard direction (S). A light distribution of light from a light-emitting region (242) (more specifically, a light-emitting unit (172)) has a maximum value in a first direction (D1). The first direction (D1) is different from the standard direction (S). Specifically, an angle formed between the first direction (D1) and the reference direction (R) is greater than an angle formed between the standard direction (S) and the reference direction (R).

Abstract: A standard direction (S) is a horizontal direction (a direction along X direction in the drawing). A base material (200) is supported by a frame body (250) so that a second surface (204) of the base material (200) is oriented obliquely upward from the standard direction (S). Thereby, a reference direction (R) is oriented obliquely upward from the standard direction (S). Light from the light-emitting system (20) has standard chromaticity in the standard direction (S). In addition, the light from the light-emitting system (20) has first chromaticity and second chromaticity in a first side direction (S1) and a second side direction (S2), respectively, the first side direction (S1) and the second side direction (S2) being symmetric with respect to the standard direction (S). A difference between the first chromaticity and the standard chromaticity is smaller than a difference between the second chromaticity and the standard chromaticity.

Abstract: A standard direction (S) is a horizontal direction (a direction along X direction in the drawing). A base material (200) is supported by a frame body (250) so that a second surface (204) of the base material (200) is oriented obliquely upward from the standard direction (S). Thereby, a reference direction (R) is oriented obliquely upward from the standard direction (S). A light distribution of light from a light-emitting region (242) (more specifically, a light-emitting unit (172)) has a maximum value in a first direction (D1). The first direction (D1) is different from the standard direction (S). Specifically, an angle formed between the first direction (D1) and the reference direction (R) is greater than an angle formed between the standard direction (S) and the reference direction (R).

Abstract: A light distribution of light from a light-emitting device (10) has a higher luminous intensity in a first direction (D1) compared to a reference direction (R), the first direction (D1) being different from the reference direction (R). The reference direction (R) is a center direction of the light distribution, for example, a direction along the thickness direction of a substrate (100), a direction along the width direction of each layer (for example, an EML (126)) of a resonator (150), or a normal direction of a second surface (104) of the substrate (100). In addition, the light distribution has a higher luminous intensity in a second direction (D2) compared to the reference direction (R), the second direction (D2) being on an opposite side of the first direction (D1) with respect to the reference direction (R).

Abstract: A standard direction (S) is a horizontal direction (a direction along X direction in the drawing). A base material (200) is supported by a frame body (250) so that a second surface (204) of the base material (200) is oriented obliquely upward from the standard direction (S). Thereby, a reference direction (R) is oriented obliquely upward from the standard direction (S). Light from the light-emitting system (20) has standard chromaticity in the standard direction (S). In addition, the light from the light-emitting system (20) has first chromaticity and second chromaticity in a first side direction (S1) and a second side direction (S2), respectively, the first side direction (S1) and the second side direction (S2) being symmetric with respect to the standard direction (S). A difference between the first chromaticity and the standard chromaticity is smaller than a difference between the second chromaticity and the standard chromaticity.

Abstract: An optically functional layer (160) is formed over a part of a second surface (100b) of a substrate (100). A first electrode (110) is formed over the optically functional layer (160), and a second electrode (130) is formed over the first electrode (110). An organic layer (120) is located between the first electrode (110) and the second electrode (130) and includes a light emitting layer. A plurality of the second electrodes (130) are formed. At least a part of a region between the plurality of second electrodes (130) has optical transparency. At least a part of an edge of the second electrode (130) is located outside the optically functional layer (160).

Abstract: PURPOSE To provide an electron beam recording apparatus capable of correcting rotational runout in an order of sub-nanometer with high precision. SOLUTION The apparatus comprises: a displacement detector comprising at least three displacement sensors arranged at different angles to each other in radial directions of the turntable so as to detect displacement in the radial direction of a rotational side surface of the turntable; a shape calculator to calculate shape data according to a roundness error of the turntable and an eccentricity component of the turntable; a memory to store the shape data; a rotational runout computing part to calculate rotational runout of the turntable that does not include an eccentricity component according to detected displacement from the displacement sensor when the turntable rotates and the shape data; and a beam irradiating position adjuster to adjust an irradiating position of the electron beam according to the rotational runout.

Abstract: An electron beam recording apparatus includes: a displacement detection unit including at least three displacement sensors disposed at each different angle in a radial direction of the turntable; a shape calculation unit for calculating, based on the detected displacements by the at least three displacement sensors, shape data corresponding to displacements of side surface of the turntable in the radial directions; a rotation runout computing unit for computing, based on the shape data and at least one displacement detected by the at least three displacement sensors, rotation runout of the turntable including a rotation asynchronous component and a rotation synchronous component; and a beam irradiation position adjustment unit for adjusting an irradiation position of the electron beam based on the rotation runout.

Abstract: A stage mechanism which comprises a positioning mechanism including a rotating stage and a linear movement stage, the positioning mechanism being housed in a vacuum chamber, and pipes leading from the outside of the vacuum chamber to the positioning mechanism. In the vacuum chamber, a trench-like space spreading underneath the positioning mechanism is provided, and the pipes connected between the positioning mechanism and vacuum bulkheads are laid to be shaped substantially like a U so as to deform in response to movement of the linear movement stage without touching an inside wall or the like of the vacuum chamber in this space.

Abstract: An example electron beam drawing apparatus includes an electron beam emitting unit which emits an electron beam, a rotary stage which rotatably supports a turntable for retaining a drawing object, and a sample stage which is supported by the turntable in a range including a rotating center of the turntable to retain an adjustment sample. A rotationally symmetrical pattern such as a concentric pattern and a radial pattern can be drawn in the drawing object by irradiating the drawing object with the electron beam during rotation of the turntable. Before the pattern is actually drawn in the drawing object, beam adjustment and rotating center adjustment are performed using an adjustment sample. The adjustment sample is retained by the sample stage, and the sample stage is supported by the turntable in the range including the rotating center of the turntable.

Abstract: An electron beam recording apparatus includes: a displacement detection unit including at least three displacement sensors disposed at each different angle in a radial direction of the turntable; a shape calculation unit for calculating, based on the detected displacements by the at least three displacement sensors, shape data corresponding to displacements of side surface of the turntable in the radial directions; a rotation runout computing unit for computing, based on the shape data and at least one displacement detected by the at least three displacement sensors, rotation runout of the turntable including a rotation asynchronous component and a rotation synchronous component; and a beam irradiation position adjustment unit for adjusting an irradiation position of the electron beam based on the rotation runout.

Abstract: An apparatus and method for forming an alignment layer with uniform orientation is provided. An alignment layer-forming apparatus includes an ion source for generating ion beams and one or more masks disposed between the ion source and a substrate. The masks each have a reflective face directed to the substrate. The ion beams are reflected between the reflective face of each mask and a thin-film which is disposed on the substrate and which is processed into an alignment layer, whereby the alignment layer is formed with the ion beam finally applied to the thin-film. The orientation of a liquid crystal can be rendered uniform by varying the shape and/or arrangement of the reflective face of the mask. Hence, a liquid crystal display with no brightness or color non-uniformity can be manufactured.

Abstract: An apparatus and method for forming an alignment layer with uniform orientation is provided. An alignment layer-forming apparatus includes an ion source for generating ion beams and one or more masks disposed between the ion source and a substrate. The masks each have a reflective face directed to the substrate. The ion beams are reflected between the reflective face of each mask and a thin-film which is disposed on the substrate and which is processed into an alignment layer, whereby the alignment layer is formed with the ion beam finally applied to the thin-film. The orientation of a liquid crystal can be rendered uniform by varying the shape and/or arrangement of the reflective face of the mask. Hence, a liquid crystal display with no brightness or color non-uniformity can be manufactured.

Abstract: The present invention provides an electron beam drawing apparatus which can easily perform beam adjustment and rotating center adjustment without increasing the size of the apparatus. The electron beam drawing apparatus includes an electron beam emitting unit which emits an electron beam, a rotary stage which rotatably supports a turntable for retaining a drawing object, and a sample stage which is supported by the turntable in a range including a rotating center of the turntable to retain an adjustment sample. A rotationally symmetrical pattern such as a concentric pattern and a radial pattern can be drawn in the drawing object by irradiating the drawing object with the electron beam during rotation of the turntable. Before the pattern is actually drawn in the drawing object, beam adjustment and rotating center adjustment are performed using an adjustment sample.

Abstract: A beam adjusting sample having a flat surface being like a plate and having two edges orthogonal to each other is employed. A beam is applied to the beam adjusting sample to detect an amount of the beam passing through the beam adjusting sample. The beam vertically scans the two edges.

Abstract: A laser-based measuring apparatus divides a light beam from a laser light source into at least two light beams, passes the light beams through different optical paths from each other, recombines the light beams, has the light beams interfere with each other to generate interfered light, opto-electrically transduces the interfered light to an optical frequency, and measures the amount of travel of an object which changes an optical path length of a portion of an optical path based on the optical frequency. The measuring apparatus has a portion for generating at least two measuring light beams from the laser light source, two reflection planes included in an object moving on a measuring axis, arranged back-to-back to each other on the measuring axis, and an opposing incident optical system for directing the measuring light beams into the reflection planes, respectively, such that the measuring light beams oppose to each other on the measuring axis.

Abstract: A laser distance measuring system has a simple optical structure with which abnormal return light can be removed. The laser distance measuring system includes a laser light source that generates at least two interferable light beams with different frequencies on a same optical axis, a parallel reflecting portion that includes a reflecting surface, which is included in an object that moves along a measurement axis and that is arranged on the measurement axis, and returns an incident light beam in a direction opposite that at which it is incident and at a certain spacing from and parallel to the incident light beam, and an interferometer that is positioned between the laser light source and the parallel reflecting portion and that is arranged on the measurement axis. The optical axes of the light beams are displaced parallel to one another from the measurement axis and one of the light beams is passed through the interferometer and guided to the parallel reflecting portion.