Patents by Inventor Hiroaki Sakaida
Hiroaki Sakaida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240051913Abstract: An object is to provide a cage silicate that can be industrially safely and simply produced by using an alkali silicate solution that does not generate alcohol as a Si raw material and using non-toxic quaternary ammonium, and a method for producing the same. The problem is solved by the following cage silicate: A cage silicate consisting of anion component 1 represented by following formula (1), anion component 2 which is a mineral acid ion, cation component 1 represented by following formula (2), and cation component 2 which is an alkali ion, in which, to the mole number in terms of SiO2, a ratio of the mole number of water, (H2O/SiO2), is 0.7 to 30, a ratio of the mole number of alkali ions, (alkali ions/SiO2), is 1.0×10?7 to 1.0×10?2, and a ratio of the mole number of the mineral acid ions, (mineral acid ions/SiO2), is 1.0×10?7 to 1.0×10?3. In formula (2), R represents an alkyl group having 2 to 20 carbon atoms.Type: ApplicationFiled: February 15, 2023Publication date: February 15, 2024Applicant: Nissan Chemical CorporationInventors: Jiahao LIU, Takuya FUKUOKA, Hiroaki SAKAIDA
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Patent number: 11459486Abstract: There are provided a polishing composition that gives, in the step of polishing a wafer, a flat polished surface having a reduced height difference between a central region and a peripheral region (laser mark region) of the wafer, and a method for producing a wafer using the polished composition. A polishing composition comprising water, silica particles, an alkaline substance, and an amphoteric surfactant of formula (1): wherein R1 is a C10-20 alkyl group, or a C1-5 alkyl group containing an amide group; R2 and R3 are each independently a C1-9 alkyl group; and X?is a C1-5 anionic organic group containing a carboxylate ion or a sulfonate ion. Silica particles in the form of an aqueous dispersion of silica particles having a mean primary particle diameter of 5 to 100 nm may be used. A method for producing a wafer, wherein in the step of polishing a wafer, polishing is performed until a height difference between a central region and a peripheral region of the wafer becomes 100 nm or less.Type: GrantFiled: April 10, 2018Date of Patent: October 4, 2022Assignee: NISSAN CHEMICAL CORPORATIONInventors: Hiroaki Sakaida, Eiichiro Ishimizu
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Patent number: 10865113Abstract: There is provided a method for obtaining a purified aqueous solution of silicic acid containing less metal impurities such as Cu and Ni using water glass as a raw material with less number of purification steps than that in conventional methods without using any unnecessary additives. The method for producing a purified aqueous solution of silicic acid, the method comprising the steps of: (a) passing an aqueous solution of alkaline silicate having a silica concentration of 0.5% by mass or more and 10% by mass or less through a column filled with a polyamine-, iminodiacetic acid-, or aminophosphoric acid-type chelating resin, and (b) passing the aqueous solution passed in the step (a) through a column filled with a hydrogen-type cation exchange resin.Type: GrantFiled: October 14, 2016Date of Patent: December 15, 2020Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hiroaki Sakaida, Eiichiro Ishimizu
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Publication number: 20200123414Abstract: A polishing composition that gives, in the step of polishing a wafer, a flat polished surface having a reduced height difference between a central region and a peripheral region of the wafer, and a method for producing a wafer using the polished composition. A polishing composition comprising water, silica particles, an alkaline substance, and an amphoteric surfactant of formula (1): wherein R1 is a C10-20 alkyl group, or a C1-5 alkyl group containing an amide group; R2 and R3 are each independently a C1-9 alkyl group; and X? is a C1-5 anionic organic group containing a carboxylate ion or a sulfonate ion. A method for producing a wafer, wherein in the step of polishing a wafer, polishing is performed until a height difference between a central region and a peripheral region of the wafer becomes 100 nm or less.Type: ApplicationFiled: April 10, 2018Publication date: April 23, 2020Applicant: NISSAN CHEMICAL CORPORATIONInventors: Hiroaki SAKAIDA, Eiichiro ISHIMIZU
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Publication number: 20190055131Abstract: There is provided a method for obtaining a purified aqueous solution of silicic acid containing less metal impurities such as Cu and Ni using water glass as a raw material with less number of purification steps than that in conventional methods without using any unnecessary additives. The method for producing a purified aqueous solution of silicic acid, the method comprising the steps of: (a) passing an aqueous solution of alkaline silicate having a silica concentration of 0.5% by mass or more and 10% by mass or less through a column filled with a polyamine-, iminodiacetic acid-, or aminophosphoric acid-type chelating resin, and (b) passing the aqueous solution passed in the step (a) through a column filled with a hydrogen-type cation exchange resin.Type: ApplicationFiled: October 14, 2016Publication date: February 21, 2019Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hiroaki SAKAIDA, Eiichiro ISHIMIZU
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Patent number: 9133366Abstract: An object is to provide a polishing liquid composition that can provide hydrophilicity to a wafer surface and effectively improve a haze in polishing of wafers for substrates in electronics industry. The present invention is a polishing liquid composition for wafers, comprising: water; silica particles; an alkaline compound; a polyvinyl alcohol; an anion-modified polyvinyl alcohol; and a surfactant, wherein the mass ratio of the anion-modified polyvinyl alcohol to the polyvinyl alcohol is 0.6 to 5.5. The anion-modified polyvinyl alcohol is preferably a polyvinyl alcohol modified with a carboxy group or a sulfonic acid group.Type: GrantFiled: May 21, 2013Date of Patent: September 15, 2015Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hiroaki Sakaida, Eiichirou Ishimizu
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Publication number: 20150123027Abstract: An object is to provide a polishing liquid composition that can provide hydrophilicity to a wafer surface and effectively improve a haze in polishing of wafers for substrates in electronics industry. The present invention is a polishing liquid composition for wafers, comprising: water; silica particles; an alkaline compound; a polyvinyl alcohol; an anion-modified polyvinyl alcohol; and a surfactant, wherein the mass ratio of the anion-modified polyvinyl alcohol to the polyvinyl alcohol is 0.6 to 5.5. The anion-modified polyvinyl alcohol is preferably a polyvinyl alcohol modified with a carboxy group or a sulfonic acid group.Type: ApplicationFiled: May 21, 2013Publication date: May 7, 2015Inventors: Hiroaki Sakaida, Eiichirou Ishimizu
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Publication number: 20140319411Abstract: There is provided a polishing liquid composition that can effectively reduce LPDs having a size of 50 nm or less on a wafer surface in polishing of semiconductor wafers. A semiconductor wafer polishing liquid composition including: water; silica particles; an alkaline compound; a water-soluble polymer compound; and polyethylene glycol, wherein the semiconductor wafer polishing liquid composition satisfies conditions (a) to (c): (a) a shape factor SF1 of the silica particles is 1.00 to 1.20, (b) a mean primary particle diameter of the silica particles that is obtained by a nitrogen adsorption method is 5 nm to 100 nm, and a coefficient of particle diameter variation CV value obtained from image analysis of the transmission electron microscope image is in a range of 0% to 15%, and (c) the polyethylene glycol has a number average molecular weight of 200 to 15,000.Type: ApplicationFiled: November 16, 2011Publication date: October 30, 2014Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Hiroaki Sakaida, Fumiaki Araki, Yoshiyuki Kashima