Patents by Inventor Hiroaki Samizu

Hiroaki Samizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7508492
    Abstract: A surface light source control apparatus for a direct exposure apparatus comprises a light-emission level determining means for determining the light-emission level of each point light source for each of a plurality of groups so that a uniform illuminance distribution is achieved at a position corresponding to an exposure surface of an exposure target when a projection device is set so as to reflect all light rays incident thereon toward the exposure surface, the plurality of groups being formed in advance by grouping the point light sources based on similarity in tendency in terms of illuminance distribution characteristics that the point light sources have at the position corresponding to the exposure surface, wherein the light-emission level determining means determines the light-emission level so that all the point light sources belonging to the same group have the same light-emission level.
    Type: Grant
    Filed: June 8, 2006
    Date of Patent: March 24, 2009
    Assignee: Shinko Electric Industries Co., Ltd.
    Inventors: Kazunari Sekigawa, Hiroaki Samizu, Takahiro Inoue
  • Patent number: 7486383
    Abstract: A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: February 3, 2009
    Assignee: Shinko Electric Industries Co., Ltd.
    Inventors: Kazunari Sekigawa, Hiroaki Samizu, Takahiro Inoue
  • Patent number: 7397537
    Abstract: An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.
    Type: Grant
    Filed: November 15, 2005
    Date of Patent: July 8, 2008
    Assignee: Shinko Electric Industries Co., Ltd.
    Inventors: Takahiro Inoue, Hiroaki Samizu
  • Publication number: 20060279720
    Abstract: A surface light source control apparatus for a direct exposure apparatus comprises a light-emission level determining means for determining the light-emission level of each point light source for each of a plurality of groups so that a uniform illuminance distribution is achieved at a position corresponding to an exposure surface of an exposure target when a projection device is set so as to reflect all light rays incident thereon toward the exposure surface, the plurality of groups being formed in advance by grouping the point light sources based on similarity in tendency in terms of illuminance distribution characteristics that the point light sources have at the position corresponding to the exposure surface, wherein the light-emission level determining means determines the light-emission level so that all the point light sources belonging to the same group have the same light-emission level.
    Type: Application
    Filed: June 8, 2006
    Publication date: December 14, 2006
    Inventors: Kazunari Sekigawa, Hiroaki Samizu, Takahiro Inoue
  • Publication number: 20060114440
    Abstract: A direct exposure apparatus having a light source for projecting light onto an exposure target or, more specifically, an exposure target substrate, comprises: measuring means for measuring the illuminance distribution of light on an area corresponding to the exposure surface of the exposure target substrate; and control means for controlling, based on the measurement result supplied from the measuring means, the light source so that the intended illuminance distribution can be obtained.
    Type: Application
    Filed: November 30, 2005
    Publication date: June 1, 2006
    Inventors: Kazunari Sekigawa, Hiroaki Samizu, Takahiro Inoue
  • Publication number: 20060103829
    Abstract: An exposure apparatus for performing direct exposure on a relatively moving exposure target substrate comprises: a plurality of exposure heads arranged so that an overlapping exposed area occurs between exposed areas formed on the exposure target substrate as a result of exposure by the exposure heads; and light adjusting means for adjusting the amount of light to be projected from two adjacent exposure heads onto the overlapping exposed area so that the amount of the projected light becomes equal to the amount of light that a single exposure head would project onto an exposure area if the exposure area were to be exposed through the same pattern by the single exposure head alone.
    Type: Application
    Filed: November 15, 2005
    Publication date: May 18, 2006
    Inventors: Takahiro Inoue, Hiroaki Samizu