Patents by Inventor Hiroaki Shimizu

Hiroaki Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRIC SHAVER
    Publication number: 20100175264
    Abstract: An electric shaver includes a rod-shaped body part, a head part, and an interposer. The head part projects from one end portion, in a longitudinal direction, of the body part and swingably attached to the body part. The head part includes a shaving portion and a drive mechanism. The shaving portion is formed to be elongated in a direction orthogonal to a projecting direction of the head part and has paired blades configured to operate relative to each other. The drive mechanism is configured to drive at least one of the paired blades. The interposer is configured to support the head part swingably about a first swing axis parallel with a longitudinal direction of the shaving portion, and to be supported on the body part swingably about a second swing axis orthogonal to the projecting direction of the head part and orthogonal to the first swing axis.
    Type: Application
    Filed: December 30, 2009
    Publication date: July 15, 2010
    Applicant: PANASONIC ELECTRIC WORKS CO., LTD.
    Inventors: Hiroaki SHIMIZU, Hiroshi SHIGETA, Shin HOSOKAWA, Jyuzaemon IWASAKI
  • Polymer compound, positive resist composition and method of forming resist pattern
    Patent number: 7745098
    Abstract: A polymer compound having a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) that is derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group but is not classified as said structural unit (a0).
    Type: Grant
    Filed: August 26, 2008
    Date of Patent: June 29, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Dazai, Takayoshi Mori, Hiroaki Shimizu, Kyoko Ohshita, Komei Hirahara
  • Positive resist composition and method of forming resist pattern
    Patent number: 7741009
    Abstract: A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and has a structural unit (a1) represented by general formula (a1-0-2) shown below, and an acid-generator component (B) which generates acid upon exposure and includes an acid generator (B1) consisting of a compound represented by general formula (b1-12) shown below: wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X2 represents an acid dissociable, dissolution inhibiting group; and Y2 represents an alkylene group or a divalent aliphatic cyclic group; and R2—O—Y1—SO3?A+??(b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be substituted with a fluorine atom; and A+ represents a cation.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: June 22, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Dazai, Hiroaki Shimizu, Kyoko Ohshita, Komei Hirahara
  • Dry shaver
    Patent number: 7739798
    Abstract: A dry shaver has an elongated shaving head with a lengthwise axis. The shaving head carries semi-cylindrical first and second outer cutters disposed on its opposite width ends, as well as a semi-cylindrical finishing cutter and a slit cutter interposed between the first and second outer cutters. The finishing cutter has a finishing foil which is deeply curved than a foil of the first and second outer cutters into an arcuate contour having a width less than that of the first and second outer cutters. The finishing foil disposed behind the first outer cutter comes into contact with a user's skin to make closer shaving than the first and second cutters.
    Type: Grant
    Filed: December 7, 2007
    Date of Patent: June 22, 2010
    Assignee: Panasonic Electric Works Co., Ltd.
    Inventors: Jyuzaemon Iwasaki, Hiroaki Shimizu, Takeshi Shiba, Masaaki Sato, Shunsuke Komori, Shinji Fujimoto
  • Shaving foil for a dry shaver
    Patent number: 7730621
    Abstract: A shaving foil for a dry shaver has a plurality of perforation arranged in an array. The shaving foil is formed in its skin contact surface with a plurality of recesses which define a thin section of reduced thickness at the recesses, while leaving thick sections at the remainder of the foil. Each perforation is configured to have its circumference defined partly by the thin section and partly by the thick section. Both of the thin and thick sections can come into contact with a user's skin for smoothly guiding hairs into the perforations to make close shaving without irritating the skin, while the shaving foil is moved across the skin. Especially, the thin sections act to cut the hairs shorter than the thick section, as wall as to raise flattened hairs into the perforations for successfully cutting the flattened hairs.
    Type: Grant
    Filed: December 7, 2007
    Date of Patent: June 8, 2010
    Assignee: Panasonic Electric Works Co., Ltd.
    Inventors: Shunsuke Komori, Jyuzaemon Iwasaki, Hiroaki Shimizu, Takeshi Shiba, Masaaki Sato
  • Polymer compound, photoresist composition including the polymer compound, and resist pattern formation method
    Patent number: 7723007
    Abstract: The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: May 25, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Toshiyuki Ogata, Syogo Matsumaru, Yohei Kinoshita, Hideo Hada, Daiju Shiono, Hiroaki Shimizu, Naotaka Kubota
  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
    Publication number: 20100121077
    Abstract: A compound represented by general formula (I); and a compound represented by general formula (b1-1). wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M? represents an alkali metal ion; and A+ represents an organic cation.
    Type: Application
    Filed: January 22, 2010
    Publication date: May 13, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Hideo Hada, Hiroaki Shimizu, Tsuyoshi Nakamura
  • ELECTRIC-ELECTRONIC TOOTHBRUSH
    Publication number: 20100115718
    Abstract: An electric-electronic toothbrush carries a brush driven to vibrate, and arranged to flow an electric current into a user's oral cavity for promoting removal of tooth plaque. The electric-electronic toothbrush has a shaft driven to vibrate along and/or about an axis of the shaft, and a battery supplying the electric current. The shaft is electrically conductive to flow the electric current into a brush electrode of a brush head. The shaft is electrically connected to the battery by way of an extendible electrically conductive coupler within the handle. The electrically conductive coupler has its one end secured to the shaft, and the other end to an electrically conductive member connected to one of poles of the battery, so as to absorb the vibration of the shaft. The handle is provided on its outer peripheral surface with a touch electrode.
    Type: Application
    Filed: December 25, 2007
    Publication date: May 13, 2010
    Applicant: Panasonic Electric Works Co., Ltd.
    Inventors: Hiroaki Shimizu, Tomohiro Kunita, Shinichi Taniguchi, Suehisa Kishimoto, Tadanobu Kitagawa
  • Rolling driving actuator and power toothbrush using the same
    Patent number: 7712174
    Abstract: In a rolling driving actuator used as a drive source of a power toothbrush, permanent magnets are formed flat plate shape, and constituting a moving object by being attached to grooves formed on an outer peripheral face of a yoke which is press-fitted to and fixed on a shaft. On the other hand, a tubular shaped stator, which is constituted by a coil wound around a bobbin and stationary yokes provided on both side of the bobbin in axial direction of the shaft, is provided to face an outer face of the permanent magnet or an outer face of the yoke of the moving object with a predetermined clearance so that a center axis thereof becomes coaxial with the center axis of the shaft. By supplying an alternating current to the coil, the moving object is driven in rolling driving around the axis of the shaft.
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: May 11, 2010
    Assignee: Panasonic Electric Works Co., Ltd.
    Inventors: Hiroaki Shimizu, Ryo Motohashi, Hidekazu Yabuuchi, Takahiro Nishinaka, Katsuhiro Hirata, Yuya Hasegawa
  • POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    Publication number: 20100075249
    Abstract: A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).
    Type: Application
    Filed: October 15, 2007
    Publication date: March 25, 2010
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Yasuhiro Yoshii
  • Resist composition and method for forming resist pattern
    Patent number: 7682770
    Abstract: A resist composition is provided that yields fine resolution, and improved levels of line edge roughness and depth of focus. This composition includes a resin component (A) that undergoes a change in alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure, wherein the component (A) is a resin with a weight average molecular weight of no more than 8,000 containing structural units (a) derived from a (meth)acrylate ester, and the component (B) includes at least one sulfonium compound represented by a general formula (b-1) or a general formula (b-2) shown below.
    Type: Grant
    Filed: October 20, 2004
    Date of Patent: March 23, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Masaru Takeshita, Ryotaro Hayashi, Syogo Matsumaru, Taku Hirayama, Hiroaki Shimizu
  • Resist composition, method of forming resist pattern, novel compound, and acid generator
    Patent number: 7682772
    Abstract: A compound represented by general formula (I); and a compound represented by general formula (b1-1). [Chemical Formula 1] X-Q1-Y1—SO3?M+??(I) X-Q1-Y1—SO3?A+??(b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: March 23, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Hideo Hada, Hiroaki Shimizu, Tsuyoshi Nakamura
  • COMPOUND AND POLYMERIC COMPOUND
    Publication number: 20100069590
    Abstract: A compound represented by general formula (I); and a polymeric compound including a structural unit (a1) represented by general formula (II). wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure.
    Type: Application
    Filed: October 15, 2007
    Publication date: March 18, 2010
    Applicants: Tokyo Ohka Kogyo Co., Ltd., Daito Chemix Corporation
    Inventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Kyoko Ohshita, Toshiharu Shimamaki, Kenshin Niwa, Seihin Shu
  • POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    Publication number: 20100015553
    Abstract: A positive resist composition including a resin component (A) having a structural unit (a0) represented by general formula (a0-1) (R represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; R1 represents a C3 or more branched alkyl group; and each of R2 and R3 independently represents an alkyl group, wherein R2 and R3 may be mutually bonded to form a polycyclic group) and/or general formula (a0-2) (R is the same as defined above; R8 represents a divalent linking group that contains no halogen atom; and R7 represents an acid dissociable, dissolution inhibiting group), and an acid generator (B1) consisting of a compound represented by general formula (b1) (Y1 represents a C1-C4 fluorinated alkylene group which may have a substituent; X represents a C3-C30 aliphatic cyclic group which may have a substituent; and A+ represents an organic cation).
    Type: Application
    Filed: July 9, 2009
    Publication date: January 21, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD
    Inventors: Hiroaki Shimizu, Tsuyoshi Nakamura, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Akiya Kawaue
  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR
    Publication number: 20100015552
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Application
    Filed: July 8, 2009
    Publication date: January 21, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NOVEL COMPOUND AND ACID GENERATOR
    Publication number: 20100015555
    Abstract: A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms, X represents an aliphatic cyclic group of 3 to 30 carbon atoms, R11? to R13? each represents an aryl group or alkyl group, provided that at least one of R11? to R13? is an aryl group having a substituent represented by general formula (b1-0), and two alkyl groups among R11? to R13? may be bonded to each other to form a ring with the sulfur atom in the formula.
    Type: Application
    Filed: July 13, 2009
    Publication date: January 21, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshiyuki UTSUMI, Keita ISHIDUKA, Kensuke MATSUZAWA, Akiya KAWAUE, Hiroaki SHIMIZU, Tsuyoshi NAKAMURA
  • Actuator and electric toothbrush using the same
    Patent number: 7646117
    Abstract: An actuator includes a shaft supported in such a manner as to make axial reciprocating movement or rotational reciprocating movement around longitudinal axis thereof, and an electricity conducting member for making contact with the shaft at a plurality of points on a circumferential surface of the shaft used as an electricity conducting path leading to other members. Further, an electric toothbrush includes the actuator as a drive power source for a brush body, and the brush body is adapted to be supplied with an electric current through the shaft.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: January 12, 2010
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Hiroaki Shimizu, Tomohiro Kunita, Shinichi Taniguchi, Suehisa Kishimoto, Takahiro Nishinaka
  • Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound
    Publication number: 20090317743
    Abstract: A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
    Type: Application
    Filed: June 18, 2009
    Publication date: December 24, 2009
    Inventors: Daiju Shiono, Tomoyuki Hirano, Sanae Furuya, Takahiro Dazai, Hiroaki Shimizu, Tsuyoshi Kurosawa, Hideto Nito, Tsuyoshi Nakamura
  • POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND
    Publication number: 20090312573
    Abstract: A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.
    Type: Application
    Filed: August 6, 2009
    Publication date: December 17, 2009
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Daiju Shiono, Takahiro Dazai, Hiroaki Shimizu
  • Resist composition for immersion exposure and method of forming resist pattern using the same
    Publication number: 20090311627
    Abstract: A resist composition for immersion exposure, including a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component (B) that generates acid upon exposure, and a fluorine-containing compound (C) represented by general formula (c-1) (in formula (c-1), R1 represents an organic group which may contain a polymerizable group; X represents a divalent organic group having an acid dissociable portion; and R2 represents an organic group having a fluorine atom).
    Type: Application
    Filed: June 10, 2009
    Publication date: December 17, 2009
    Inventors: Tsuyoshi Kurosawa, Hiroaki Shimizu