Patents by Inventor Hirocki Adachi

Hirocki Adachi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor device and method for manufacturing the same
    Publication number: 20010019860
    Abstract: A method for manufacturing a semiconductor device comprises the steps of forming a semiconductor film on a substrate, oxidizing a surface of said semiconductor film in an oxidizing atmosphere with said semiconductor film heated or irradiated with light, and further depositing an oxide f ilm on the oxidized surface of the semiconductor film by PVD or CVD. The first oxide film has a good interface condition with the semiconductor film and a characteristics of an insulated gate field effect transistor can be improved if the first oxide film and the second oxide film are used as a gate insulating film.
    Type: Application
    Filed: February 9, 2001
    Publication date: September 6, 2001
    Inventors: Hirocki Adachi, Akira Takenouchi, Takeshi Fukada, Hiroshi Uehara, Yasuhiko Takemura