Patents by Inventor Hirofumi Asanuma

Hirofumi Asanuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate support device and plasma processing apparatus
    Patent number: 8252118
    Abstract: There is provided a substrate support device capable of preventing powder dust from being produced. A thermoconductive intermediate member is interposed between a base table and a substrate support table and has a communication aperture path for communicating the aperture path of the base table with the aperture path of the substrate support table. An elastic member such as bellows tube is disposed in the communication aperture path of the thermoconductive intermediate member, for insulating the thermoconductive intermediate member from the inert gas which flows through the communication aperture path.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: August 28, 2012
    Assignee: Canon Anelva Corporation
    Inventors: Yohsuke Shibuya, Yasuyuki Shirai, Hirofumi Asanuma, Junji Nakamura
  • STACKED LOAD LOCK CHAMBER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
    Publication number: 20090320948
    Abstract: A stacked load lock chamber comprises a first load lock chamber, a second load lock chamber stacked on the first load lock chamber, a first slit-valve mover configured to open and close a first opening provided to an atmosphere side of the first load lock chamber, a second slit-valve mover configured to open and close a second opening provided to an atmosphere side of the second load lock chamber, a first arm connected to the first slit-valve mover, a second arm connected to the second slit-valve mover, and a driver located below the first and second load lock chambers and configured to drive the first and second arms to move the first and second slit-valve movers through the first and second arms.
    Type: Application
    Filed: June 10, 2009
    Publication date: December 31, 2009
    Applicant: CANON ANELVA CORPORATION
    Inventors: Hirofumi Asanuma, Toshikazu Nakazawa
  • SUBSTRATE SUPPORT DEVICE AND PLASMA PROCESSING APPARATUS
    Publication number: 20090308537
    Abstract: There is provided a substrate support device capable of preventing powder dust from being produced. A thermoconductive intermediate member is interposed between a base table and a substrate support table and has a communication aperture path for communicating the aperture path of the base table with the aperture path of the substrate support table. An elastic member such as bellows tube is disposed in the communication aperture path of the thermoconductive intermediate member, for insulating the thermoconductive intermediate member from the inert gas which flows through the communication aperture path.
    Type: Application
    Filed: April 14, 2009
    Publication date: December 17, 2009
    Applicant: CANON ANELVA CORPORATION
    Inventors: Yohsuke Shibuya, Yasuyuki Shirai, Hirofumi Asanuma, Junji Nakamura