Patents by Inventor Hirofumi Fukunaga

Hirofumi Fukunaga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240124389
    Abstract: An object of present invention is to provide a compound or a salt thereof constituting lipid particles that can achieve a high nucleic acid encapsulation rate and excellent delivery of nucleic acids, and to provide lipid particles and pharmaceutical composition using the compound or a salt thereof, which can achieve a high nucleic acid encapsulation rate and excellent delivery of nucleic acids. According to an aspect of the present invention, a compound represented by Formula (1) or a salt thereof is provided. In the formula, each symbol has a meaning defined in the present specification.
    Type: Application
    Filed: October 26, 2023
    Publication date: April 18, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Shintaro TANABE, Tatsuya NITABARU, Mashiko YAMAMOTO, Hirofumi FUKUNAGA, Naoto NAKAMURA, Noriyuki KASAGI, Taisuke ENDO, Keiko SUZUKI
  • Publication number: 20240108607
    Abstract: A compound represented by Formula [3] or a salt thereof and a method of making the in the formula, L3 represents a group represented by Formula [2c] wherein R3c, R4c, R5c and R6c are the same as or different from each other and represent a hydrogen atom or a C1-6 alkyl group; p3 represents an integer of 1 to 3; q3 represents an integer of 0 to 3; and r3 represents an integer of 1 to 6; A1 represents any one of the groups represented by Formulae [4] to [9], wherein * represents a binding position; and R7 represents a carboxyl-protecting group; and m represents an integer of 1 to 3.
    Type: Application
    Filed: February 21, 2023
    Publication date: April 4, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Hirofumi FUKUNAGA, Sachiko SHINJO, Daisuke NAKAGAWA, Shinichiro SEKINE, Takayuki YAMAKAWA
  • Publication number: 20240105970
    Abstract: A hydrogen production supply system that produces hydrogen gas to be supplied to a hydrogen storage tank, the hydrogen production supply system including a control circuit configured to control an operation load ratio of the hydrogen production apparatus to a predetermined operation load ratio, to increase the operation load ratio of the hydrogen production apparatus to a first operation load ratio larger than the predetermined operation load ratio at first timing, and to decrease the operation load ratio of the hydrogen production apparatus to the predetermined operation load ratio from the first load operation ratio at second timing, wherein an increase in the operation load ratio at the first timing takes precedence over a decrease in the operation load ratio at the second timing.
    Type: Application
    Filed: December 4, 2023
    Publication date: March 28, 2024
    Applicant: ENEOS CORPORATION
    Inventors: Akihiko FUKUNAGA, Toshio TEZUKA, Tadashi SEIKE, Hirofumi NISHIO, Daisaku TATEISHI
  • Patent number: 11916266
    Abstract: An operation method is provided for a hydrogen production apparatus that is disposed in a hydrogen station and produces hydrogen gas to be supplied to a fuel cell vehicle (FCV) arriving at the hydrogen station. The operation method includes starting up a hydrogen production apparatus up to a first operation load ratio preset for a rated operation. The operation method includes increasing an operation load of the hydrogen production apparatus to a second operation load ratio, which is larger than the first operation load ratio, at first timing associated with an arrival of the FCV, and decreasing the operation load of the hydrogen production apparatus to a third operation load ratio, which is smaller than the second operation load ratio, at second timing associated with a completion of hydrogen filling into the FCV.
    Type: Grant
    Filed: March 25, 2021
    Date of Patent: February 27, 2024
    Assignee: ENEOS CORPORATION
    Inventors: Akihiko Fukunaga, Toshio Tezuka, Tadashi Seike, Hirofumi Nishio, Daisaku Tateishi
  • Publication number: 20230136073
    Abstract: The present invention provides a compound represented by the formula (1) or a salt thereof, or a complex of the compound or the salt with a metal, in the formula (1), A1 represents a chelate group; R1 represents a hydrogen atom or the like; R2 represents a hydrogen atom or the like; and Z1, Z2, Z3, Z4, and Z5 are the same or different and each represent a nitrogen atom or CR3 or the like wherein R3 represents a hydrogen atom or an optionally substituted C1-6 alkyl group or the like; L1 represents a group represented by the formula (3) wherein R13, R14, R15, and R16 are the same or different and each represent a hydrogen atom or the like; L2 represents an optionally substituted C1-6 alkylene group; and L3 represents as optionally substituted C1-6 alkylene group.
    Type: Application
    Filed: June 16, 2022
    Publication date: May 4, 2023
    Applicants: FUJIFILM Corporation, PDRadiopharma Inc.
    Inventors: Hirofumi FUKUNAGA, Hiroyuki DOZONO, Akihiro HINO, Shinobu OSHIKIRI, Akio NAGANO
  • Patent number: 11426473
    Abstract: The present invention provides a compound represented by the formula (1) or a salt thereof, or a complex of the compound or the salt with a metal, in the formula (1), A1 represents a chelate group; R1 represents a hydrogen atom or the like; R2 represents a hydrogen atom or the like; and Z1, Z2, Z3, Z4, and Z5 are the same or different and each represent a nitrogen atom or CR3 or the like wherein R3 represents a hydrogen atom or an optionally substituted C1-6 alkyl group or the like; L1 represents a group represented by the formula (3) wherein R13, R14, R15, and R16 are the same or different and each represent a hydrogen atom or the like; L2 represents an optionally substituted C1-6 alkylene group; and L3 represents an optionally substituted C1-6 alkylene group.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: August 30, 2022
    Assignees: FUJIFILM Corporation, PDRADIOPHARMA INC.
    Inventors: Hirofumi Fukunaga, Hiroyuki Dozono, Akihiro Hino, Shinobu Oshikiri, Akio Nagano
  • Patent number: 11161830
    Abstract: An object of the present invention is to provide a compound or a salt thereof having anti-HBV activity, a pharmaceutical composition, an anti-hepatitis B virus agent, a production inhibitor of DNA of a hepatitis B virus, and a production or secretion inhibitor of a hepatitis B surface antigen. According to the present invention, provided are a compound represented by General Formula [1] or a salt thereof: (in the formula, R1 represents a benzothiazolyl group which may be substituted (in which a carbon atom constituting the 6-membered ring of the benzothiazolyl group of R1 is bonded to the nitrogen atom of the pyridone ring); R2 represents a C2-6 alkenyl group which may be substituted, or the like; and R3 represents a hydrogen atom or the like).
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: November 2, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Megumi Ookubo, Shinichiro Sekine, Tomoyuki Mashiko, Hyoei Kawai, Hirofumi Fukunaga
  • Publication number: 20210085604
    Abstract: An object of the present invention is to provide a compound or a salt thereof constituting lipid particles that can achieve a high nucleic acid encapsulation rate and excellent delivery of nucleic acids, and to provide lipid particles that can achieve a high nucleic acid encapsulation rate and excellent delivery of nucleic acids. According to an aspect of the present invention, a compound represented by Formula (1) or a salt thereof is provided.
    Type: Application
    Filed: December 4, 2020
    Publication date: March 25, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Shintaro TANABE, Masahiko YAMAMOTO, Kimihiko SATO, Motomasa TAKAHASHI, Kazuhiro TSUNA, Yasutaka TASAKI, Taisuki ENDO, Issei DOI, Hirofumi FUKUNAGA
  • Publication number: 20210015802
    Abstract: A compound represented by Formula [3] or a salt thereof and a method of making the same, in the formula, L3 represents a group represented by Formula [2c] wherein R3c, R4c, R5c, and R6c are the same as or different from each other and represent a hydrogen atom or a C1-6 alkyl group; p3 represents an integer of 1 to 3; q3 represents an integer of 0 to 3; and r3 represents an integer of 1 to 6; A1 represents any one of the groups represented by Formulae [4] to [9], wherein * represents a binding position; and R7 represents a carboxyl-protecting group; and m represents an integer of 1 to 3.
    Type: Application
    Filed: September 29, 2020
    Publication date: January 21, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Hirofumi FUKUNAGA, Sachiko SHINJO, Daisuke NAKAGAWA, Shinichiro SEKINE, Takayuki YAMAKAWA
  • Publication number: 20200017459
    Abstract: An object of the present invention is to provide a compound or a salt thereof having anti-HBV activity, a pharmaceutical composition, an anti-hepatitis B virus agent, a production inhibitor of DNA of a hepatitis B virus, and a production or secretion inhibitor of a hepatitis B surface antigen. According to the present invention, provided are a compound represented by General Formula [1] or a salt thereof: (in the formula, R1 represents a benzothiazolyl group which may be substituted (in which a carbon atom constituting the 6-membered ring of the benzothiazolyl group of R1 is bonded to the nitrogen atom of the pyridone ring); R2 represents a C2-6 alkenyl group which may be substituted, or the like; and R3 represents a hydrogen atom or the like).
    Type: Application
    Filed: September 26, 2019
    Publication date: January 16, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Megumi Ookubo, Shinichiro Sekine, Tomoyuki Mashiko, Hyoei Kawai, Hirofumi Fukunaga
  • Publication number: 20180008583
    Abstract: Provided are a method for efficiently manufacturing a nitrogen-containing compound, which is used for manufacturing a treatment agent for integrin-related diseases, or a salt thereof and a manufacturing intermediate of the compound or a salt thereof. A method for manufacturing a novel nitrogen-containing compound or a salt thereof includes (1) a step of obtaining a compound represented by Formula [10] or a salt thereof through an amidation reaction; and (2) a step of deprotecting the compound represented by Formula [10] or a salt thereof.
    Type: Application
    Filed: September 22, 2017
    Publication date: January 11, 2018
    Applicant: FUJIFILM Corporation
    Inventors: Hirofumi FUKUNAGA, Sachiko SHINJO, Daisuke NAKAGAWA, Shinichiro SEKINE, Takayuki YAMAKAWA
  • Publication number: 20160199520
    Abstract: The present invention provides a compound represented by the formula (1) or a salt thereof, or a complex of the compound or the salt with a metal, in the formula (1), A1 represents a chelate group; R1 represents a hydrogen atom or the like; R2 represents a hydrogen atom or the like; and Z1, Z2, Z3, Z4, and Z5 are the same or different and each represent a nitrogen atom or CR3 or the like wherein R3 represents a hydrogen atom or an optionally substituted C1-6 alkyl group or the like; L1 represents a group represented by the formula (3) wherein R13, R14, R15, and R16 are the same or different and each represent a hydrogen atom or the like; L2 represents an optionally substituted C1-6 alkylene group; and L3 represents an optionally substituted C1-6 alkylene group.
    Type: Application
    Filed: March 23, 2016
    Publication date: July 14, 2016
    Applicants: FUJIFILM Corporation, FUJIFILM RI PHARMA CO., LTD.
    Inventors: Hirofumi FUKUNAGA, Hiroyuki DOZONO, Akihiro HINO, Shinobu OSHIKIRI, Akio NAGANO
  • Patent number: 8524324
    Abstract: The invention relates to a method for a complex oxide film having a high relative dielectric constant formed on a substrate surface by wet-treatment method and a production process of the complex oxide film comprising a step of washing the complex oxide film with an acid solution of pH 5 or less to thereby reduce salts in the film. Further, the invention relates to a dielectric material and a piezoelectric material containing the complex oxide film, a capacitor and a piezoelectric element including the material, and a electronic device comprising the element.
    Type: Grant
    Filed: July 28, 2006
    Date of Patent: September 3, 2013
    Assignee: Showa Denko K.K.
    Inventors: Akihiko Shirakawa, Hirofumi Fukunaga, Chunfu Yu
  • Patent number: 8379369
    Abstract: The invention relates to a substrate for solid electrolytic capacitor, wherein a first layer in the shielding layer formed by laminating a plurality of layers on top of each other, provided in an area for separating an anode part and a cathode part of the substrate for a solid electrolytic capacitor having a porous layer on its surface from a solution or dispersion of a heat resistant resin or its precursor, free from a shielding layer modification additive (except for a silane coupling agent) or containing a shielding layer modification additive content of not more than 0.1% by mass (based on the mass of the heat resistant resin or its precursor). The present invention enables to provide a method for producing a substrate for a solid electrolytic capacitor comprising a shielding layer made of a masking material which ensures the insulation between the anode part and the cathode part of the solid electrolytic capacitor; and a solid electrolytic capacitor using the substrate.
    Type: Grant
    Filed: September 21, 2007
    Date of Patent: February 19, 2013
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Hirofumi Fukunaga, Hideki Oohata
  • Publication number: 20100220428
    Abstract: The invention relates to a method for a complex oxide film having a high relative dielectric constant formed on a substrate surface by wet-treatment method and a production process of the complex oxide film comprising a step of washing the complex oxide film with an acid solution of pH 5 or less to thereby reduce salts in the film. Further, the invention relates to a dielectric material and a piezoelectric material containing the complex oxide film, a capacitor and a piezoelectric element including the material, and a electronic device comprising the element.
    Type: Application
    Filed: July 28, 2006
    Publication date: September 2, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Akihiko Shirakawa, Hirofumi Fukunaga, Chunfu Yu
  • Publication number: 20100103589
    Abstract: The invention relates to a substrate for solid electrolytic capacitor, wherein a first layer in the shielding layer formed by laminating a plurality of layers on top of each other, provided in an area for separating an anode part and a cathode part of the substrate for a solid electrolytic capacitor having a porous layer on its surface from a solution or dispersion of a heat resistant resin or its precursor, free from a shielding layer modification additive (except for a silane coupling agent) or containing a shielding layer modification additive content of not more than 0.1% by mass (based on the mass of the heat resistant resin or its precursor). The present invention enables to provide a method for producing a substrate for a solid electrolytic capacitor comprising a shielding layer made of a masking material which ensures the insulation between the anode part and the cathode part of the solid electrolytic capacitor; and a solid electrolytic capacitor using the substrate.
    Type: Application
    Filed: September 21, 2007
    Publication date: April 29, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Hirofumi Fukunaga, Hideki Oohata
  • Publication number: 20100103590
    Abstract: The present invention relates to a solid electrolytic capacitor comprising a layer of self-doping type conductive polymer having a crosslink between polymer chains thereof on the dielectric film formed on a valve-acting metal. The present invention enables to stably produce thin capacitor elements suitable for laminated type solid electrolytic capacitors, showing less short-circuit failure and less fluctuation in the shape of element, which allows to increase the number of laminated elements in a solid electrolytic capacitor chip to make a capacitor having a high capacity, and having less fluctuation in equivalent series resistance.
    Type: Application
    Filed: June 27, 2006
    Publication date: April 29, 2010
    Applicant: SHOWA DENKO K.K.
    Inventors: Yoshihiro Saida, Hirofumi Fukunaga
  • Publication number: 20090247736
    Abstract: A luminous compound represented by the following formula (I): Met-COG-ChHet??Formula (I) wherein Met represents a group containing a lanthanide ion, COG represents a heterocyclic group bonded directly to the lanthanide ion contained in the group represented by Met, and ChHet represents a group having a heterocycle, where ChHet is preferably a group that conjugates with COG.
    Type: Application
    Filed: March 20, 2006
    Publication date: October 1, 2009
    Applicant: FUJIFILM Corporation
    Inventors: Koki Nakamura, Hirofumi Fukunaga
  • Publication number: 20090107034
    Abstract: A method of producing a fatty acid alkyl ester, containing: conducting an transesterification reaction of an oil or/and fat with a straight-chain or branched alcohol having 1 to 4 carbon atoms, in the presence of a phosphoric acid alkali-metal salt; and a fuel containing the fatty acid alkyl ester produced by the method in a given ratio.
    Type: Application
    Filed: September 13, 2006
    Publication date: April 30, 2009
    Applicant: FUJIFILM CORPORATION
    Inventor: Hirofumi Fukunaga
  • Publication number: 20090035592
    Abstract: The invention provides a complex oxide film having a high crystallinity, produced by forming the complex oxide film on a substrate surface and then calcining the complex oxide film in atmospheric gas under oxygen partial pressure of 1×10?3 Pa or less at 400° C. or more and a production method thereof. Further, the invention provides a dielectric or piezoelectric material containing the complex oxide film, a capacitor and a piezoelectric element using the material, and an electronic device comprising the element.
    Type: Application
    Filed: July 28, 2006
    Publication date: February 5, 2009
    Applicant: SHOWA DENKO K.K.
    Inventors: Akihiko Shirakawa, Toshiya Kawasaki, Hirofumi Fukunaga