Patents by Inventor Hirofumi Iinuma
Hirofumi Iinuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080314832Abstract: Wastewater, in the form of a colloidal solution containing microparticles, is filtrated using a second filter, having a gel film that is formed by suction on the surface of a first filter. The suction pressure in this process is made extremely weak to maintain the filtration capacity while extending intervals prior to clogging of second filter. Furthermore, the gel that becomes adsorbed onto the surface of second filter can be separated readily from the surface of second filter by stopping the suction and filtration can be continued again thereafter.Type: ApplicationFiled: June 18, 2008Publication date: December 25, 2008Applicant: Sanyo Electric Co., Ltd.Inventors: Hiroyuki UMEZAWA, Masahiro Iseki, Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 7157012Abstract: Object of the preferred embodiment is to remove sol-form microparticles and nitrogen components contained in CMP wastewater. Sol-form microparticle components contained in CMP wastewater are removed by a filtration treatment using a filter device 13, having a gel-form second filter. Also, nitrogen components in the CMP wastewater are removed by an electrochemical treatment using electrode 12. The filtration treatment and the electrochemical treatment can be carried out in individual tanks or can be carried out in the same tank. By performing the filtration treatment and the electrochemical treatment in the same tank, a space-saving water treatment device can be provided.Type: GrantFiled: March 24, 2004Date of Patent: January 2, 2007Assignee: Sanyo Electric Co., Ltd.Inventors: Hiroyuki Umezawa, Masahiro Iseki, Daizo Takaoka, Tsuyoshi Rakuma, Mineo Ikematsu, Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 7014770Abstract: A filtering method is directed to a wastewater of CMP process, which includes sub-micrometer particles suspended as colloid. The wastewater is filtered by a gel membrane formed on a surface of plastic filter. A coagulant or a pH adjuster is added to the wastewater so that the sub-micrometer particles are coagulated to form the gel membrane.Type: GrantFiled: May 16, 2003Date of Patent: March 21, 2006Assignee: Sanyo Electric Co., Ltd.Inventors: Hiroyuki Umezawa, Masahiro Iseki, Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 6890242Abstract: Techniques for recycling waste particles may include solidifying particles, which were generated by machining a crystal ingot into a wafer or by machining a semiconductor wafer, into a cake, and melting the cake, for example, into an ingot.Type: GrantFiled: February 18, 2004Date of Patent: May 10, 2005Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 6830679Abstract: A filtration device is provided in which wastewater, in the form of a colloidal solution containing microparticles, is guided to tank, circulated, and filtrated using a second filter. The device includes a gel film that is formed by suction on the surface of a first filter. The suction pressure in this process is made extremely weak to maintain the filtration capacity while extending intervals prior to clogging of second filter 2. Furthermore, a filtration device is realized with which the gel film of second filter that becomes adsorbed onto the surface of first filter can be separated readily by stopping the suction and filtration can be continued again thereafter.Type: GrantFiled: October 31, 2002Date of Patent: December 14, 2004Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma, Hiroyuki Umezawa, Masahiro Iseki
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Publication number: 20040245184Abstract: Object of the preferred embodiment is to remove sol-form microparticles and nitrogen components contained in CMP wastewater. Sol-form microparticle components contained in CMP wastewater are removed by a filtration treatment using a filter device 13, having a gel-form second filter. Also, nitrogen components in the CMP wastewater are removed by an electrochemical treatment using electrode 12. The filtration treatment and the electrochemical treatment can be carried out in individual tanks or can be carried out in the same tank. By performing the filtration treatment and the electrochemical treatment in the same tank, a space-saving water treatment device can be provided.Type: ApplicationFiled: March 24, 2004Publication date: December 9, 2004Applicant: Sanyo Electric Co., LtdInventors: Hiroyuki Umezawa, Masahiro Iseki, Daizo Takaoka, Tsuyoshi Rakuma, Mineo Ikematsu, Motoyuki Tsuihiji, Hirofumi Iinuma
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Publication number: 20040161935Abstract: This method provide a method for fabricating a semiconductor device in which waste water generated by a step of processing a semiconductor is filtered to be clean. In the method, removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the waste water is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.Type: ApplicationFiled: February 18, 2004Publication date: August 19, 2004Applicant: Sanyo Electric Co., Ltd., a Japan corporationInventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 6746309Abstract: Waste water generated by processing a semiconductor is filtered to be cleaned. Removable matters trapped by a first filter film are used as a second filter film. Filtering capciity is maintained by applying an external force such as bubbles to the second filter film. When removable matters are mixed with the filtered water, the filtered water is recirculated again to the tank in which the waste water is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.Type: GrantFiled: August 16, 2001Date of Patent: June 8, 2004Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Publication number: 20040016705Abstract: A filtering method is directed to a wastewater of CMP process, which includes sub-micrometer particles suspended as colloid. The wastewater is filtered by a gel membrane formed on a surface of plastic filter. A coagulant or a pH adjuster is added to the wastewater so that the sub-micrometer particles are coagulated to form the gel membrane.Type: ApplicationFiled: May 16, 2003Publication date: January 29, 2004Applicant: Sanyo Electric Co., Ltd.Inventors: Hiroyuki Umezawa, Masahiro Iseki, Motoyuki Tsuihiji, Hirofumi Iinuma
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Publication number: 20030095894Abstract: A colloidal solution containing micro-particles can be filtrated using a second filter, and includes a gel film that is formed by suction on the surface of a first filter. The suction pressure in this process is made extremely weak to keep the filtration rate fixed and to maintain the filtration capacity while extending intervals prior to clogging of the second filter. Micro-particles, mainly 0.15 &mgr;m or less, can thereby be removed.Type: ApplicationFiled: October 30, 2002Publication date: May 22, 2003Inventors: Hiroyuki Umezawa, Masahiro Iseki, Motoyuki Tsuihiji, Hirofumi Iinuma
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Publication number: 20030094426Abstract: Wastewater, in the form of a colloidal solution containing microparticles, is filtrated using a second filter, having a gel film that is formed by suction on the surface of a first filter. The suction pressure in this process is made extremely weak to maintain the filtration capacity while extending intervals prior to clogging of second filter. Furthermore, the gel that becomes adsorbed onto the surface of second filter can be separated readily from the surface of second filter by stopping the suction and filtration can be continued again thereafter.Type: ApplicationFiled: October 31, 2002Publication date: May 22, 2003Inventors: Hiroyuki Umezawa, Masahiro Iseki, Motoyuki Tsuihiji, Hirofumi Iinuma
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Publication number: 20030089647Abstract: A filtration device is provided in which wastewater, in the form of a colloidal solution containing microparticles, is guided to tank, circulated, and filtrated using a second filter. The device includes a gel film that is formed by suction on the surface of a first filter. The suction pressure in this process is made extremely weak to maintain the filtration capacity while extending intervals prior to clogging of second filter 2. Furthermore, a filtration device is realized with which the gel film of second filter that becomes adsorbed onto the surface of first filter can be separated readily by stopping the suction and filtration can be continued again thereafter.Type: ApplicationFiled: October 31, 2002Publication date: May 15, 2003Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma, Hiroyuki Umezawa, Masahiro Iseki
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Patent number: 6461524Abstract: A fluid is filtered by first preparing a filter which includes a base filter and solid substances provided on the base filter, such that the solid substances differ from objects within the fluid to be filtered that are removed by the filter. The objects of filtration are filtered by supplying the fluid to the filter. During filtration, a force is applied to the filter to move the solid substances and objects deposited on the filter. The application of such force thus allows continuous filtration through the filter. The force can take the form of application of rising bubbles, a mechanical vibration or sonic waves to the filter. The filtration method is useful in processing fluid waste from mechanical processes, such as CMP steps.Type: GrantFiled: March 29, 2000Date of Patent: October 8, 2002Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 6428709Abstract: Removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the wastewater is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.Type: GrantFiled: March 24, 2000Date of Patent: August 6, 2002Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 6406622Abstract: According to the apparatus, removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the wastewater is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.Type: GrantFiled: March 29, 2000Date of Patent: June 18, 2002Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Publication number: 20020006769Abstract: This method provide a method for fabricating a semiconductor device in which waste water generated by a step of processing a semiconductor is filtered to be clean. In the method, removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the waste water is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.Type: ApplicationFiled: August 16, 2001Publication date: January 17, 2002Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 6299513Abstract: This method provide a method for fabricating a semiconductor device in which waste water generated by a step of processing a semiconductor is filtered to be clean. In the method, removables 12 trapped by a first filter film 10 are used as a second filter film 13, and clogging of the first filter film 10 is prevented, and an external force such as bubbles is applied to the second filter film 13 to maintain filtering capacity. And when removables are mixed with the filtered water, the filtered water is recirculated again to the tank in which the waste water is stored, and after it is checked that a desired inclusion rate has been reached filtration is started again.Type: GrantFiled: March 29, 2000Date of Patent: October 9, 2001Assignee: Sanyo Electric Co., Ltd.Inventors: Motoyuki Tsuihiji, Hirofumi Iinuma
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Patent number: 4909319Abstract: A heat exchanger having an improved and substantially uniform heat exchange efficiency, provided with a plurality of plate fins each of which has tube inserting bores arranged in a staggered manner, and heat transfer tubes inserted through these bores, a plurality of each of the fins which are between the tubes being cut doubly to a small width and raised so as to form louver elements so that the louver elements cross a flow of the air stream.Type: GrantFiled: January 18, 1989Date of Patent: March 20, 1990Assignee: Sanyo Electric Co., Ltd.Inventors: Atuyumi Ishikawa, Takeshi Kanai, Hirofumi Iinuma