Patents by Inventor Hirofumi Kishita

Hirofumi Kishita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050277731
    Abstract: Perfluoropolyether compositions are provided comprising (A) a linear perfluoropolyether compound containing at least two alkenyl groups, having a perfluoropolyether structure comprising recurring units —CaF2aO— in its backbone, and having a Mw of 10,000-100,000; (B) an organosilicon compound containing at least two silicon atom-bonded hydrogen atoms; (C) a reinforcing filler; (D) a hydrosilylation catalyst; and (E) a polyfluoromonoalkenyl compound containing one alkenyl group and having a perfluoropolyether structure in its backbone. The compositions cure into rubber or gel products having improved acid resistance.
    Type: Application
    Filed: June 9, 2005
    Publication date: December 15, 2005
    Inventors: Kenichi Fukuda, Mikio Shiono, Hirofumi Kishita
  • Patent number: 6958191
    Abstract: A lens including a lens substrate, a surface layer, and a backing member provided beneath the surface layer, in which the backing member may be either the same as the lens substrate or a separate layer from the lens substrate, and wherein the surface layer includes a hydrolysis-condensation product of a perfluoropolyether modified silane with a hydrolysable functional group or a halogen atom X at both terminals, represented by a general formula (1) shown below: (wherein, Rf is a bivalent group with a straight chain perfluoropolyether structure containing no branching, which incorporates a unit represented by a formula —(CkF2kO)— (wherein, k represents an integer from 1 to 6)) is resistant to the adhesion of contaminants to the surface thereof, can be easily wiped to remove any adhered contaminants, provides a slippery surface that is difficult to scratch, and moreover displays excellent durability and is capable of retaining the above properties over extended periods.
    Type: Grant
    Filed: August 28, 2003
    Date of Patent: October 25, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koichi Yamaguchi, Hirofumi Kishita
  • Publication number: 20040096667
    Abstract: A curable fluoropolyether rubber composition comprising (A) a straight-chain fluoropolyether compound having at least two alkenyl groups and a perfluoropolyether structure, (B) an organosilicon compound having at least two SiH groups, (C) a perfluoroparaffin or derivative in powder form, at least 80% by weight of which volatilizes off when held in a drier at 200° C. for 4 hours, and which has a melting point of at least 50° C., and (D) a hydrosilylation catalyst cures into a product that exhibits solvent resistance, chemical resistance, weather resistance, water repellency, oil repellency and heat resistance, and is improved in mold release and compression set.
    Type: Application
    Filed: November 18, 2003
    Publication date: May 20, 2004
    Inventors: Yasuhisa Osawa, Hirofumi Kishita
  • Publication number: 20040047047
    Abstract: A lens including a lens substrate, a surface layer, and a backing member provided beneath the surface layer, in which the backing member may be either the same as the lens substrate or a separate layer from the lens substrate, and wherein the surface layer includes a hydrolysis-condensation product of a perfluoropolyether modified silane with a hydrolysable functional group or a halogen atom X at both terminals, represented by a general formula (1) shown below: 1
    Type: Application
    Filed: August 28, 2003
    Publication date: March 11, 2004
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6673887
    Abstract: A cured fluorine-containing material comprising a perfluoropolyether of the formula: —(Rf—O)q— wherein Rf is a perfluoroalkylene group of 1-6 carbon atoms and q is 1-500 as the backbone is suitable as an antireflection film since it has a low refractive index of up to 1.335 at 25° C.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: January 6, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6660392
    Abstract: An anti-reflection film which includes an inorganic anti-reflection layer including a silicon dioxide-based inorganic layer and having a monolayer structure or plural-layer structure, and a stain-resistant layer provided as a surface layer, is provided. The stain-resistant layer is composed of a cured product of a particular fluorine-containing silazane compound. An optical member having the anti-reflection film on a substrate, such as an optical element, is also provided. These have good stain resistance, wipe off cleanability, mar resistance and water and oil repellency, and these properties have good durability.
    Type: Grant
    Filed: December 7, 2001
    Date of Patent: December 9, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kouichi Yamaguchi, Hiromasa Yamaguchi, Hirofumi Kishita
  • Publication number: 20030139620
    Abstract: Novel perfluoropolyether-modified silanes are improved in water/oil repellency, parting properties, chemical resistance, lubricity, durability, antifouling properties and fingerprint wipe-off. An antireflection filter is also provided comprising an inorganic antireflection layer including a surface layer in the form of a silicon dioxide-base inorganic layer, and an antifouling layer, preferably of the perfluoropolyether-modified silane, on the surface layer. The antifouling layer has a sliding angle of oleic acid of up to 5°, a change of the sliding angle after solvent washing relative to the sliding angle before solvent washing being up to 10%.
    Type: Application
    Filed: October 4, 2002
    Publication date: July 24, 2003
    Inventors: Koichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6552152
    Abstract: A curable fluoropolyether rubber composition comprising (A) a straight-chain fluoropolyether compound having at least two alkenyl groups and a perfluoropolyether structure backbone, (B) an organosilicon compound having at least two silicon atom-bonded hydrogen atoms, which all form H—SiCH2— structures, and (C) a hydrosilylation catalyst cures into parts which have good heat resistance, chemical resistance, solvent resistance, parting property, water repellency, oil repellency and weather resistance as well as improved acid and alkali resistance and are useful as sealants.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: April 22, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Shinichi Sato, Koichi Yamaguchi, Noriyuki Koike, Masatoshi Arai, Hirofumi Kishita
  • Patent number: 6528672
    Abstract: A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: March 4, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Koichi Yamaguchi, Hirofumi Kishita
  • Publication number: 20020105728
    Abstract: An anti-reflection film which includes an inorganic anti-reflection layer including a silicon dioxide-based inorganic layer and having a monolayer structure or plural-layer structure, and a stain-resistant layer provided as a surface layer, is provided. The stain-resistant layer is composed of a cured product of a particular fluorine-containing silazane compound. An optical member having the anti-reflection film on a substrate, such as an optical element, is also provided. These have good stain resistance, wipe off cleanability, mar resistance and water and oil repellency, and these properties have good durability.
    Type: Application
    Filed: December 7, 2001
    Publication date: August 8, 2002
    Applicant: Shin-Etsu Chemical Co. Ltd.
    Inventors: Kouichi Yamaguchi, Hiromasa Yamaguchi, Hirofumi Kishita
  • Publication number: 20020077451
    Abstract: A curable fluoropolyether rubber composition comprising (A) a straight-chain fluoropolyether compound having at least two alkenyl groups and a perfluoropolyether structure backbone, (B) an organosilicon compound having at least two silicon atom-bonded hydrogen atoms, which all form H—SiCH2— structures, and (C) a hydrosilylation catalyst cures into parts which have good heat resistance, chemical resistance, solvent resistance, parting property, water repellency, oil repellency and weather resistance as well as improved acid and alkali resistance and are useful as sealants.
    Type: Application
    Filed: June 29, 2001
    Publication date: June 20, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasunori Sakano, Shinichi Sato, Koichi Yamaguchi, Noriyuki Koike, Masatoshi Arai, Hirofumi Kishita
  • Publication number: 20020071959
    Abstract: A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.
    Type: Application
    Filed: October 16, 2001
    Publication date: June 13, 2002
    Inventors: Hiromasa Yamaguchi, Koichi Yamaguchi, Hirofumi Kishita
  • Publication number: 20020028903
    Abstract: A cured fluorine-containing material comprising a perfluoropolyether of the formula: —(Rf—O)q— wherein Rf is a perfluoroalkylene group of 1-6 carbon atoms and q is 1-500 as the backbone is suitable as an antireflection film since it has a low refractive index of up to 1.335 at 25° C.
    Type: Application
    Filed: June 21, 2001
    Publication date: March 7, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6200684
    Abstract: A novel perfluoropolyether-modified aminosilane cures into a film having improved water and oil repellency, parting and anti-staining properties. A surface treating agent comprising the aminosilane, and an article with a coating of the aminosilane are also provided.
    Type: Grant
    Filed: May 19, 2000
    Date of Patent: March 13, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Kouichi Yamaguchi, Hirofumi Kishita
  • Patent number: 6160074
    Abstract: The invention provides a fluorine-containing curable composition comprising (A) a linear perfluoro compound having at least two alkenyl groups in its molecule and a divalent perfluoroalkylene or perfluoropolyether structure in its backbone, (B) a fluorinated organohydrogenpolysiloxane having at least four hydrosilyl groups in its molecule and a divalent perfluoro structure in its backbone, and (C) a platinum catalyst.
    Type: Grant
    Filed: December 3, 1997
    Date of Patent: December 12, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Matsuda, Shinichi Sato, Masatoshi Arai, Hirofumi Kishita
  • Patent number: 6114528
    Abstract: The invention is directed at novel fluorinated amide compounds of formula (1): ##STR1## wherein Rf is a divalent perfluoroalkylene or perfluoropolyether group, X is a group of formula (2), (3) or (4), and m is an integer inclusive of 0. ##STR2## R.sup.1 is a monovalent hydrocarbon group, and R.sup.2 is a divalent hydrocarbon group. These compounds can be used to obtain elastomers or cured resins having a high fluorine content and a low surface energy, making them effective as starting materials in the production of chemical and solvent-resistant elastomeric materials, parting agents, and water repellents.
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: September 5, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kouichi Yamaguchi, Noriyuki Koike, Hirofumi Kishita, Masatoshi Arai
  • Patent number: 6114562
    Abstract: Novel organosilicon compounds having a perfluoroalkyl or perfluoropolyether group and at least one ethynyl group are useful as an agent for controlling hydrosilylation reaction between a --SiH group-bearing compound and a --CH.dbd.CH.sub.2 group-bearing compound.
    Type: Grant
    Filed: August 4, 1999
    Date of Patent: September 5, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kenichi Fukuda, Hirofumi Kishita
  • Patent number: 6111050
    Abstract: A fluorine-containing curable composition comprises (A) a linear perfluoro compound having at least two secondary amino groups per molecule and a divalent perfluoroalkylene or divalent perfluoropolyether structure in the main chain, and (B) a crosslinkable fluorinated compound having at least three functional groups which are crosslinkable with the secondary amino groups of (A). This composition readily cures, with standing at room temperature or heating only, to a cured product having excellent solvent and chemical resistance.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: August 29, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kouichi Yamaguchi, Noriyuki Koike, Masatoshi Arai, Hirofumi Kishita
  • Patent number: 6031131
    Abstract: The invention is directed at novel fluorinated amide compounds of formula (1): ##STR1## wherein Rf is a divalent perfluoroalkylene or perfluoro-polyether group, X is a group of formula (2), (3) or (4), and m is an integer inclusive of 0. ##STR2## R.sub.1 is a monovalent hydrocarbon group, and R.sup.2 is a divalent hydrocarbon group. These compounds can be used to obtain elastomers or cured resins having a high fluorine content and a low surface energy, making them effective as starting materials in the production of chemical and isolvent-resistant elastomeric materials, parting agents, and water repellents.
    Type: Grant
    Filed: September 22, 1998
    Date of Patent: February 29, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kouichi Yamaguchi, Noriyuki Koike, Hirofumi Kishita, Masatoshi Arai
  • Patent number: 6010815
    Abstract: An anti-offsetting oil including an organopolysiloxane having the formula (1) below and containing low molecular weight organopolysiloxanes having a molecular weight of 3,000 or less in a content of 50 ppm or less. ##STR1## wherein R.sub.f 's represent a perf luoroalkyl which may contain at least one ether linkage; R's represent a monovalent hydrocarbon group; Y's represent a divalent organic group having 2 to 5 carbon atoms; a represents an integer of 1 or more and b represents an integer of 0 or more, provided that a and b satisfy 3a+3b+2=15 to 4,000; and c and d are an integer of 0 to 3. This fluid has a good wettability to silicone rubber or fluorine forming the surfaces of fixing rolls of electrophotographic copying machines, and hence can effectively prevent offset. Since it contains no low-molecular weight organopolysiloxanes, the electric-contact failure may hardly occur.
    Type: Grant
    Filed: October 26, 1998
    Date of Patent: January 4, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiromasa Yamaguchi, Hirofumi Kishita