Abstract: A low-reflection coating of the present invention is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound together by the binder. The binder further contains an aluminum compound. The low-reflection coating contains, as components, 55 to 70 mass % of the fine silica particles, 25 to 40 mass % of the silica of the binder, and 2 to 7 mass % of the aluminum compound in terms of Al2O3. The low-reflection coating has a thickness of 80 to 800 nm. The low-reflection coating yields a transmittance gain of 2.5% or more when provided on the substrate. The transmittance gain represents an increase in average transmittance of the substrate provided with the low-reflection coating relative to the substrate not provided with the low-reflection coating, the average transmittance being measured in the wavelength range of 380 to 850 nm.

Abstract: A low-reflection coating of the present invention is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound together by the binder. The binder further contains an aluminum compound. The low-reflection coating contains, as components, 55 to 70 mass % of the fine silica particles, 25 to 40 mass % of the silica of the binder, and 2 to 7 mass % of the aluminum compound in terms of Al2O3. The low-reflection coating has a thickness of 80 to 800 nm. The low-reflection coating yields a transmittance gain of 2.5% or more when provided on the substrate. The transmittance gain represents an increase in average transmittance of the substrate provided with the low-reflection coating relative to the substrate not provided with the low-reflection coating, the average transmittance being measured in the wavelength range of 380 to 850 nm.

Abstract: A recombination apparatus is provided to an off-gas system of a boiling water nuclear plant. An off-gas system pipe connected to a condenser is connected to the recombination apparatus. A catalyst layer filled with a catalyst for recombining hydrogen and oxygen is disposed in the recombination apparatus. The recombination catalyst has a percentage of the number of Pt particles whose diameters are in a range from more than 1 nm to not more than 3 nm to the numbers of Pt particles whose diameters are in a range from more than 0 nm to not more than 20 nm, falling within a range from 20 to 100%. The condenser discharges gas containing an organosilicon compound (ex. D5), hydrogen, and oxygen, which is introduced to the recombination apparatus. Use of the above recombination catalyst can improve the performance of recombining hydrogen and oxygen more than conventional catalysts and the initial performance of the catalyst can be maintained for a longer period of time.