Patents by Inventor Hirofumi Nishimuta

Hirofumi Nishimuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5336574
    Abstract: A curable composition comprising the following components (a), (b), (c) and (d) and/or (e):(a) a compound having one carboxyl group and one (meth)acryloyl group in the molecule,(b) a compound having two or more (meth)acryloyl groups in the molecule,(c) a levelling agent, and(d) a chain transfer agent and/or(e) a tertiary amine type photoinitiator; and a process for producing a shadow mask, comprising two etching steps, wherein the above curable composition is used as a secondary etching resist material.
    Type: Grant
    Filed: October 2, 1992
    Date of Patent: August 9, 1994
    Assignee: Toagosei Chemical Industry Co., Ltd.
    Inventors: Ichiro Igarashi, Hiroshi Sasaki, Tetsuji Jitsumatsu, Hiroyuki Ota, Masanobu Sato, Hirofumi Nishimuta