Patents by Inventor Hirofumi Takatsuka

Hirofumi Takatsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11280989
    Abstract: A system includes an imaging optical system that forms an optical image of an observed object; a control apparatus that switches between a superresolution observation mode and a normal observation mode; and a rotatable disk located at a position conjugate to a front focal position of the imaging optical system and having a plurality of apertures. The imaging optical system changes a projection magnification of an intermediate image that is a point image of a portion of the observed object that is formed on the disk. The control apparatus sets, during the superresolution observation mode, the projection magnification in a manner such that the intermediate image becomes at least twice as large as the apertures and sets, during the normal observation mode, the projection magnification in a manner such that the projection magnification becomes lower than the projection magnification in the superresolution observation mode.
    Type: Grant
    Filed: December 16, 2018
    Date of Patent: March 22, 2022
    Assignee: OLYMPUS CORPORATION
    Inventors: Shinichi Hayashi, Hirofumi Takatsuka
  • Publication number: 20190187447
    Abstract: A system includes an imaging optical system that forms an optical image of an observed object; a control apparatus that switches between a superresolution observation mode and a normal observation mode; and a rotatable disk located at a position conjugate to a front focal position of the imaging optical system and having a plurality of apertures. The imaging optical system changes a projection magnification of an intermediate image that is a point image of a portion of the observed object that is formed on the disk. The control apparatus sets, during the superresolution observation mode, the projection magnification in a manner such that the intermediate image becomes at least twice as large as the apertures and sets, during the normal observation mode, the projection magnification in a manner such that the projection magnification becomes lower than the projection magnification in the superresolution observation mode.
    Type: Application
    Filed: December 16, 2018
    Publication date: June 20, 2019
    Applicant: OLYMPUS CORPORATION
    Inventors: Shinichi HAYASHI, Hirofumi TAKATSUKA
  • Patent number: 8149403
    Abstract: Optical equipment for detecting beams emitted from a sample by irradiating the sample with linear polarization according to an aspect of the present invention includes a wavelength-independent optical path division element arranged at a position of coupling of a illumination optical path of the linear polarization and a detection optical path of the beams, and the linear polarization is reflected by the interface of the optical path division element entered as S polarization and led to the sample, and the beams pass through the optical path division element and are detected.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: April 3, 2012
    Assignee: Olympus Corporation
    Inventor: Hirofumi Takatsuka
  • Publication number: 20090213376
    Abstract: Optical equipment for detecting beams emitted from a sample by irradiating the sample with linear polarization according to an aspect of the present invention includes a wavelength-independent optical path division element arranged at a position of coupling of a illumination optical path of the linear polarization and a detection optical path of the beams, and the linear polarization is reflected by the interface of the optical path division element entered as S polarization and led to the sample, and the beams pass through the optical path division element and are detected.
    Type: Application
    Filed: February 19, 2009
    Publication date: August 27, 2009
    Applicant: Olympus Corporation
    Inventor: Hirofumi TAKATSUKA
  • Publication number: 20090040601
    Abstract: It in an object to acquire a high-precision polarization image.
    Type: Application
    Filed: May 17, 2006
    Publication date: February 12, 2009
    Applicant: OLYMPUS CORPORATION
    Inventors: Yoshiharu Saito, Hirofumi Takatsuka, Eiji Nakasho
  • Patent number: 7265363
    Abstract: While carrying out microscope examination, it is possible to specify a position to be irradiated with optical stimulus light and to accurately apply an optical stimulus to the specified irradiation position. A microscope examination method includes a step of introducing into a specimen a substance in which a structural change is caused by irradiation with light of a first wavelength; a step of specifying an optical stimulation site in the specimen by irradiating the specimen with visible light of a second wavelength that does not cause a structural change in the substance, while examining the specimen in which the substance is introduced using a microscope examination apparatus; and a step of irradiating the specified optical stimulus site with the light of the first wavelength.
    Type: Grant
    Filed: May 16, 2005
    Date of Patent: September 4, 2007
    Assignee: Olympus Corporation
    Inventors: Hirofumi Takatsuka, Yoshiharu Saito, Yasushi Aono
  • Publication number: 20050258376
    Abstract: While carrying out microscope examination, it is possible to specify a position to be irradiated with optical stimulus light and to accurately apply an optical stimulus to the specified irradiation position. A microscope examination method includes a step of introducing into a specimen a substance in which a structural change is caused by irradiation with light of a first wavelength; a step of specifying an optical stimulation site in the specimen by irradiating the specimen with visible light of a second wavelength that does not cause a structural change in the substance, while examining the specimen in which the substance is introduced using a microscope examination apparatus; and a step of irradiating the specified optical stimulus site with the light of the first wavelength.
    Type: Application
    Filed: May 16, 2005
    Publication date: November 24, 2005
    Inventors: Hirofumi Takatsuka, Yoshiharu Saito, Yasushi Aono