Patents by Inventor Hirohisa Hirayanagi

Hirohisa Hirayanagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140230728
    Abstract: A vacuum processing apparatus includes a process chamber, a load lock chamber connected to the process chamber, and a transfer device configured to transfer a substrate from the load lock chamber to the process chamber. The transfer device is configured to move the substrate by gravity. The transfer device includes a guide configured to form a transfer path when the substrate moves by the gravity, and a stopper configured to limit movement of the substrate by the gravity when holding the substrate, and cancel the limitation when moving the substrate.
    Type: Application
    Filed: April 28, 2014
    Publication date: August 21, 2014
    Applicant: CANON ANELVA CORPORATION
    Inventors: Yuji Kajihara, Shogo Hiramatsu, Kazuto Yamanaka, Takashi Ueda, Kazutoshi Yoshibayashi, Kenji Sato, Hajime Sahase, Hirohisa Hirayanagi, Masahiro Atsumi
  • Patent number: 8536539
    Abstract: An ion beam generator includes a discharge tank for generating plasma that includes ions. A lead-out electrode has an annular grid portion provided with openings for leading out the ions generated in the discharge tank, while accelerating the generated ions as an annular ion beam. A deflecting electrode deflects the annular ion beam, which is led out of the lead-out electrode, in an annular center direction.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: September 17, 2013
    Assignee: Canon Anelva Corporation
    Inventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
  • Publication number: 20120104274
    Abstract: There is provided an ion beam generating apparatus capable of reducing power consumption and obtain highly-accurate uniformity in a substrate process without providing a mechanism to rotate a substrate. Each of ion beam generating apparatuses 1a and 1b includes a discharging tank for generating plasma, an extraction electrode including an inclined portion arranged so as to be inclined with respect to an irradiated surface for extracting an ion generated in the discharging tank, a rotating driving unit 30 provided out of the discharging tank for rotating the extraction electrode, and a rotation supporting member 31 for coupling the rotating driving unit 30 and the extraction electrode 7, wherein an insulator block 34 arranged around the rotation supporting member 31 is included in the discharging tank.
    Type: Application
    Filed: July 13, 2010
    Publication date: May 3, 2012
    Applicant: CANON ANELVA CORPORATION
    Inventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
  • Publication number: 20110147200
    Abstract: An ion beam generator generates plasma in a discharge tank 2, leads out an annular ion beam by a lead-out electrode 7, and deflects the ion beam in an annular center direction by a deflecting electrode 30 to enter a substrate W from the inclined direction to provide uniformity of the incident ion beam to the substrate without increasing the size of the whole apparatus.
    Type: Application
    Filed: November 30, 2010
    Publication date: June 23, 2011
    Applicant: CANON ANELVA CORPORATION
    Inventors: Hirohisa Hirayanagi, Ayumu Miyoshi, Einstein Noel Abarra
  • Publication number: 20090078569
    Abstract: An inductively coupled plasma processing apparatus according to the present invention prevents debris formed through a sputter etching operation from forming a film on an inner face of a side wall part 14 of a dielectric wall container 11 and a high-frequency power from being hindered to be supplied. All of straight lines which start from any one point on the outermost perimeter of an article to be processed 2 and pass through a plasma introduction port 12 form an intersecting point with the bottom part 13 of the dielectric wall container 11 on the inner face of the bottom part 13, in the inductively coupled plasma processing apparatus.
    Type: Application
    Filed: September 15, 2008
    Publication date: March 26, 2009
    Applicant: CANON ANELVA CORPORATION
    Inventors: Hirohisa Hirayanagi, Kiyotaka Sakamoto, Tomoaki Osada, Yoshimitsu Kodaira