Patents by Inventor Hirohisa Itoh

Hirohisa Itoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130264606
    Abstract: The problems addressed by the present invention lies in providing a Group III nitride semiconductor substrate having a principal plane on which high-quality crystals can be grown and also providing a method for producing a Group III nitride semiconductor substrate capable of obtaining a crystal which has few stacking faults and in which stacking faults in directions parallel to the polar plane in particular have been greatly suppressed. The problem is solved by means of a Group III nitride semiconductor substrate having a plane other than a C plane as a principal plane, wherein a ratio (W1/W2) of a tilt angle distribution W1 of the principal plane in the direction of a line of intersection between the principal plane and the C plane to a tilt angle distribution W2 of the principal plane in a direction orthogonal to the line of intersection is less than 1.
    Type: Application
    Filed: June 3, 2013
    Publication date: October 10, 2013
    Inventors: Shuichi KUBO, Hirotaka Ikeda, Hirohisa Itoh, Shinjiro Kadono
  • Publication number: 20110117349
    Abstract: To produce a zinc oxide single crystal having a sufficiently low lithium concentration and a high crystallinity. A zinc oxide crystal is grown by hydrothermal synthesis method using a solution having a lithium concentration of 1 ppm or less (weight basis), while suppressing a fluctuation range of crystal growth temperature within 5° C. or at a temperature within the range of 300 to 370° C.
    Type: Application
    Filed: March 24, 2009
    Publication date: May 19, 2011
    Applicants: Fukuda Crystal Laboratory, Tokyo Denpa Co., Ltd., Mitsubishi Chemical Corporation
    Inventors: Yutaka Mikawa, Keiji Fukutomi, Takao Suzuki, Hirohisa Itoh
  • Publication number: 20100104495
    Abstract: A method for producing a nitride semiconductor, comprising controlling temperature and pressure in a autoclave containing a seed having a hexagonal crystal structure, a nitrogen element-containing solvent, a raw material substance containing a metal element of Group 13 of the Periodic Table, and a mineralizer so as to put said solvent into a supercritical state and/or a subcritical state and thereby ammonothermally grow a nitride semiconductor crystal on the surface of said seed, wherein the crystal growth rate in the m-axis direction on said seed is 1.5 times or more the crystal growth rate in the c-axis direction on said seed. By the method, a nitride semiconductor having a large-diameter C plane or a nitride semiconductor thick in the m-axis direction can be efficiently and simply produced.
    Type: Application
    Filed: October 10, 2007
    Publication date: April 29, 2010
    Applicants: MITSUBISHI CHEMICAL CORPORATION, TOHOKU UNIVERSITY
    Inventors: Shinichiro Kawabata, Hirohisa Itoh, Dirk Ehrentraut, Yuji Kagamitani, Akira Yoshikawa, Tsuguo Fukuda