Patents by Inventor Hirohisa Yano

Hirohisa Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8691206
    Abstract: In a process of forming a hydrogel from a mixture comprising hydrogen peroxide (H2O2), horseradish peroxidase (HRP), and a polymer comprising a crosslinkable phenol group, the gelation rate in the solution and the crosslinking density in the hydrogel can be independently adjusted or controlled by selection of the molarity of H2O2 and concentration of HRP in the solution when the molarity of H2O2 is limited to be within a range and the concentration of HRP is limited to be above a threshold. A method for determining the range and threshold is disclosed. The hydrogel may be used to grow cells, in which case, the molarity of H2O2 may be selected to affect the differentiation or growth rate of the cells in the hydrogel. Also, the hydrogel system may be used for sustained delivery of a therapeutic protein, for example in the treatment of liver cancer, fibrosis or hepatitis.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: April 8, 2014
    Assignee: Agency for Science, Technology and Research
    Inventors: Motoichi Kurisawa, Li Shan Wang, Joo Eun Chung, Fan Lee, Keming Xu, Hirohisa Yano
  • Publication number: 20130324541
    Abstract: The present invention relates to an agent for potentiating an antitumor activity of a chemotherapeutic agent against a cancer containing cancer stem cells, which contains at least one kind of branched chain amino acid selected from isoleucine, leucine and valine, or a salt thereof. In addition, the present invention relates to an agent for treating a cancer containing cancer stem cells, which contains a combination of a chemotherapeutic agent and at least one kind of branched chain amino acid selected from isoleucine, leucine and valine, or a salt thereof. Furthermore, the present invention relates to an agent for preventing metastasis or recurrence of a cancer containing cancer stem cells, which contains a combination of a chemotherapeutic agent and at least one kind of branched chain amino acid selected from isoleucine, leucine and valine, or a salt thereof.
    Type: Application
    Filed: August 13, 2013
    Publication date: December 5, 2013
    Applicant: Kurume University
    Inventors: Shinobu NISHITANI, Hirohisa Yano
  • Publication number: 20120177604
    Abstract: In a process of forming a hydrogel from a mixture comprising hydrogen peroxide (H2O2), horseradish peroxidase (HRP), and a polymer comprising a crosslinkable phenol group, the gelation rate in the solution and the crosslinking density in the hydrogel can be independently adjusted or controlled by selection of the molarity of H2O2 and concentration of HRP in the solution when the molarity of H2O2 is limited to be within a range and the concentration of HRP is limited to be above a threshold. A method for determining the range and threshold is disclosed. The hydrogel may be used to grow cells, in which case, the molarity of H2O2 may be selected to affect the differentiation or growth rate of the cells in the hydrogel. Also, the hydrogel system may be used for sustained delivery of a therapeutic protein, for example in the treatment of liver cancer, fibrosis or hepatitis.
    Type: Application
    Filed: December 23, 2011
    Publication date: July 12, 2012
    Inventors: Motoichi Kurisawa, Li Shan Wang, Joo Eun Chung, Fan Lee, Keming Xu, Hirohisa Yano
  • Patent number: 7138372
    Abstract: The present invention provides an agent for preventing and/or treating cachexia comprising TCF-II as an effective ingredient. An agent for preventing and treating cachexia caused by cancer, acquired immunodeficient syndrome (AIDS), cardiac diseases, infectious disease, shock, burn, endotoxinemia, organ inflammation, surgery, diabetes, collagen diseases, radiotherapy, chemotherapy is provided by the present invention.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: November 21, 2006
    Assignee: Daiichi Pharmaceutical Co., Ltd.
    Inventors: Masamichi Kojiro, Hirohisa Yano, Akihiro Iemura
  • Patent number: 7115568
    Abstract: The present invention provides an agent for preventing and/or treating cachexia comprising TCF-II as an effective ingredient. An agent for preventing and treating cachexia caused by cancer, acquired immunodeficient syndrome (AIDS), cardiac diseases, infectious disease, shock, burn, endotoxinemia, organ inflammation, surgery, diabetes, collagen diseases, radiotherapy, chemotherapy is provided by the present invention.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: October 3, 2006
    Assignee: Daiichi Pharmaceutical Co., Ltd.
    Inventors: Masamichi Kojiro, Hirohisa Yano, Akihiro Iemura
  • Publication number: 20060193827
    Abstract: The present invention provides an agent for preventing and/or treating cachexia comprising TCF-II as an effective ingredient. An agent for preventing and treating cachexia caused by cancer, acquired immunodeficient syndrome (AIDS), cardiac diseases, infectious disease, shock, burn, endotoxinemia, organ inflammation, surgery, diabetes, collagen diseases, radiotherapy, chemotherapy is provided by the present invention.
    Type: Application
    Filed: May 2, 2006
    Publication date: August 31, 2006
    Applicant: Daiichi Pharmaceutical Co., Ltd.
    Inventors: Masamichi Kojiro, Hirohisa Yano, Akihiro Iemura
  • Publication number: 20030236191
    Abstract: The present invention provides an agent for preventing and/or treating cachesia comprising TCF-II as an effective ingredient. An excellent agent for preventing and treating cachexia caused by cancer, acquired immunodeficient syndrome (AIDS), cardiac diseases, infectious disease, shock, burn, endotoxinemia, organ inflammation, surgery, diabetes, collagen diseases, radiotherapy, chemotherapy is provided by the present invention and useful for medicine.
    Type: Application
    Filed: March 5, 2003
    Publication date: December 25, 2003
    Applicant: Daiichi Pharmaceutical Co., Ltd.
    Inventors: Masamichi Kojiro, Hirohisa Yano, Akihiro Iemura
  • Publication number: 20030082134
    Abstract: The present invention provides an agent for preventing and/or treating cachexia comprising T-CF-II as an effective ingredient. An agent for preventing and treating cachexia caused by cancer, acquired immunodeficient syndrome (AIDS), cardiac diseases, infectious disease, shock, burn, endotoxinemia, organ inflammation, surgery, diabetes, collagen diseases, radiotherapy, chemotherapy is provided by the present invention.
    Type: Application
    Filed: October 9, 2002
    Publication date: May 1, 2003
    Applicant: Daiichi Pharmaceutical Co., Ltd.
    Inventors: Masamichi Kojiro, Hirohisa Yano, Akihiro Iemura
  • Publication number: 20020041863
    Abstract: The present invention provides an agent for preventing and/or treating cachesia comprising TCF-II as an effective ingredient. An excellent agent for preventing and treating cachexia caused by cancer, acquired immunodeficient syndrome (AIDS), cardiac diseases, infectious disease, shock, burn, endotoxinemia, organ inflammation, surgery, diabetes, collagen diseases, radiotherapy, chemotherapy is provided by the present invention and useful for medicine.
    Type: Application
    Filed: July 29, 1999
    Publication date: April 11, 2002
    Inventors: MASAMICHI KOJIRO, HIROHISA YANO, AKIHIRO IEMURA
  • Patent number: 6083841
    Abstract: A GaN-based compound semiconductor layer is formed on a substrate. An etch mask of a Ti film is formed on a surface of said gallium-nitride based compound semiconductor. The gallium-nitride based compound semiconductor is selectively etched through an opening of said etch mask. With this method, even where the semiconductor is difficult to etch, it is possible to efficiently etch the semiconductor vertically relative to a surface thereof by once forming a mask without troubles such as stripping-off of a mask. If the etch mask uses a metal film easy to oxidize to perform etching on the semiconductor layer while supplying an oxidizing source, the selective etch ratio can be further increased, enabling etching by a thin etch film.
    Type: Grant
    Filed: May 15, 1998
    Date of Patent: July 4, 2000
    Assignee: Rohm Co., Ltd.
    Inventors: Hirohisa Yano, Jun Ichihara