Patents by Inventor Hirohisa Yoshida
Hirohisa Yoshida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7479169Abstract: A gas supplying system for fuel cell includes a reformer generating a reformed gas by reforming a mixed raw material including a fuel and a first water, a piping network distributing the reformed gas to fuel cell systems each of which is installed in different rooms or buildings, a drain recovery unit recovering a water condensed from the reformed gas in the piping network. The piping network has a circulating route. By the circulation route, the reformed gas does not stay in the piping network so that the water condensation in the piping is suppressed. The water in the piping is removed by the drain recovery unit. According to this configuration, the clogging and corrosion of the piping caused by the condensed water is avoided.Type: GrantFiled: July 22, 2005Date of Patent: January 20, 2009Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Katsuki Yagi, Shigeru Nojima, Hirohisa Yoshida
-
Patent number: 7387650Abstract: A fuel cell power generation system, equipped with a fuel reforming device and a fuel cell body, includes valves, pipelines, a condenser, and a pump for feeding a burner exhaust gas (raw gas) discharged from a heating burner of the fuel reforming device into the fuel reforming device, and an inert gas formation device including an oxidizable and reducible oxygen adsorbent, which is disposed in the pipelines, and adsorbs oxygen in the burner exhaust gas to remove oxygen from the burner exhaust gas and form an inert gas. The fuel cell power generation system can reliably remove residual matter, without leaving it within the fuel reforming device, in a simple manner at a low cost and with a compact configuration.Type: GrantFiled: April 25, 2003Date of Patent: June 17, 2008Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Setsuo Omoto, Naohiko Ishibashi, Keiji Fujikawa, Hirohisa Yoshida, Masami Kondo, Shigeru Nojima, Toshinobu Yasutake, Satoru Watanabe, Masanao Yonemura
-
Publication number: 20060019134Abstract: A gas supplying system for fuel cell includes a reformer generating a reformed gas by reforming a mixed raw material including a fuel and a first water, a piping network distributing the reformed gas to fuel cell systems each of which is installed in different rooms or buildings, a drain recovery unit recovering a water condensed from the reformed gas in the piping network. The piping network has a circulating route. By the circulation route, the reformed gas does not stay in the piping network so that the water condensation in the piping is suppressed. The water in the piping is removed by the drain recovery unit. According to this configuration, the clogging and corrosion of the piping caused by the condensed water is avoided.Type: ApplicationFiled: July 22, 2005Publication date: January 26, 2006Applicant: Mitsubishi Heavy Industries, Ltd.Inventors: Katsuki Yagi, Shigeru Nojima, Hirohisa Yoshida
-
Publication number: 20050170236Abstract: A fuel cell membrane electrode having a cathode catalyst layer on one surface of a polymer electrolyte membrane, and an anode catalyst layer on the other surface of the membrane, the cathode catalyst layer being supplied with an oxygen-containing gas, and the anode catalyst layer being supplied with a hydrogen-containing gas, and wherein an active oxygen removing layer containing an active oxygen removing material is provided on at least one of interfaces between the membrane and the catalyst layers coated on both surfaces of the membrane, and the active oxygen removing material is CO3O4, Sb2O4, activated carbon, or a solid acid catalyst; and a fuel cell using the membrane electrode.Type: ApplicationFiled: January 26, 2005Publication date: August 4, 2005Inventors: Satoru Watanabe, Shigeru Tsurumaki, Hideki Ito, Akihiko Yamada, Hirohisa Yoshida, Akio Sato, Takuya Moriga, Tamotsu Yamada, Shigeru Nojima
-
Publication number: 20050112423Abstract: A fuel cell power generation system, equipped with a fuel reforming device (60) and a fuel cell body (4), includes valves (30a, 32), pipelines (30b, 31), a condenser (34), a pump (35), etc. for feeding a burner exhaust gas (25) (raw gas) discharged from a heating burner (10) of the fuel reforming device (60) into the fuel reforming device (60), and an inert gas formation device (5A) including an oxidizable and reducible oxygen adsorbent (28), which is disposed in the pipelines (30b, 31), and adsorbs oxygen in the burner exhaust gas (25) to remove oxygen from the burner exhaust gas (25) and form an inert gas (40). The fuel cell power generation system can reliably remove residual matter, without leaving it within the fuel reforming device (60), in a simple manner at a low cost and with a compact configuration.Type: ApplicationFiled: April 25, 2003Publication date: May 26, 2005Inventors: Setsuo Omoto, Naohiko Ishibashi, Keiji Fujikawa, Hirohisa Yoshida, Masami Kondo, Shigeru Nojima, Toshinobu Yasutake, Satoru Watanabe, Masanao Yonemura
-
Patent number: 6855747Abstract: There is disclosed a method of easily producing a long-lived ion sensitive film having excellent durability and used in an ion sensor. The method starts with preparing a monomer mixture consisting chiefly of monomer units including a functional group and a second group of bonded atoms. The functional group has a function of identifying a certain chemical substance. The second group can become an active species that induces a polymerization or bridging reaction by being irradiated with an electron beam or radiation. Then, the monomer mixture is irradiated with the electron beam or radiation in a low energy range. Thus, the monomer mixture is polymerized.Type: GrantFiled: December 23, 2002Date of Patent: February 15, 2005Assignees: JEOL Ltd., JEOL Engineering Co., Ltd.Inventors: Tadashi Kawai, Hirohisa Yoshida, Tokuo Mizuno, Atsuro Tonomura, Naoki Aota
-
Publication number: 20030166736Abstract: There is disclosed a method of easily producing a long-lived ion sensitive film having excellent durability and used in an ion sensor. The method starts with preparing a monomer mixture consisting chiefly of monomer units including a functional group and a second group of bonded atoms. The functional group has a function of identifying a certain chemical substance. The second group can become an active species that induces a polymerization or bridging reaction by being irradiated with an electron beam or radiation. Then, the monomer mixture is irradiated with the electron beam or radiation in a low energy range. Thus, the monomer mixture is polymerized.Type: ApplicationFiled: December 23, 2002Publication date: September 4, 2003Applicant: JEOL Ltd. and JEOL Engineering Co., Ltd.Inventors: Tadashi Kawai, Hirohisa Yoshida, Tokuo Mizuno, Atsuro Tonomura, Naoki Aota
-
Patent number: 6363881Abstract: Disclosed is a plasma chemical vapor deposition apparatus for forming an amorphous thin film, a microcrystalline thin film or a polycrystalline thin film on a surface of a target substrate by utilizing a glow discharge generated by an electric power supplied from a power source, comprising a reaction vessel, means for supplying a reactant gas into the reaction vessel, discharge means for discharge a waste gas of the reactant gas out of the reaction vessel, a ladder-shaped electrode for discharge generation arranged within the reaction vessel, a power source for supplying a high frequency power of 30 MHz to 200 MHz to the ladder-shaped electrode for a glow discharge generation, a heater for heating and supporting a target substrate, the heater being arranged within the reaction vessel in parallel to the ladder-shaped electrode for discharge generation, and a power distributor for uniformly distributing a high frequency power to the ladder-shaped electrode for discharge generation through a power supply wire.Type: GrantFiled: January 19, 1999Date of Patent: April 2, 2002Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Masayoshi Murata, Yoshiaki Takeuchi, Hiroshi Mashima, Akemi Takano, Hirohisa Yoshida
-
Patent number: 6344701Abstract: An apparatus and method for treating exhaust gases. In this apparatus, a plurality of stages of reactor chambers (R1, R2, . . . Rn) are connected in series in the direction of an exhaust gas flow. Further, high-voltage power supplies (V1, V2, . . . and Vn) are connected to the reactor chambers (R1, R2, . . . and Rn), respectively. Moreover, in each of these reactor chambers, a streamer discharger plasma is generated. Furthermore, the more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is high in a portion thereof on the upstream side of the exhaust gas flow and the electron density is low in a portion thereof on the downstream side. Additionally, the present invention further provides a pulse generator in which a high voltage, which is an output voltage of a D.C.Type: GrantFiled: August 9, 1999Date of Patent: February 5, 2002Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Keisuke Kawamura, Tetsuro Shigemizu, Hirohisa Yoshida, Masayoshi Murata
-
Publication number: 20020000201Abstract: Disclosed is a plasma chemical vapor deposition apparatus for forming an amorphous thin film, a microcrystalline thin film or a polycrystalline thin film on a surface of a target substrate by utilizing a glow discharge generated by an electric power supplied from a power source, comprising a reaction vessel, means for supplying a reactant gas into the reaction vessel, discharge means for discharge a waste gas of the reactant gas out of the reaction vessel, a ladder-shaped electrode for discharge generation arranged within the reaction vessel, a power source for supplying a high frequency power of 30 MHz to 200 MHz to the ladder-shaped electrode for a glow discharge generation, a heater for heating and supporting a target substrate, the heater being arranged within the reaction vessel in parallel to the ladder-shaped electrode for discharge generation, and a power distributor for uniformly distributing a high frequency power to the ladder-shaped electrode for discharge generation through a power supply wire.Type: ApplicationFiled: January 19, 1999Publication date: January 3, 2002Inventors: MASAYOSHI MURATA, YOSHIAKI TAKEUCHI, HIROSHI MASHIMA, AKEMI TAKANO, HIROHISA YOSHIDA
-
Patent number: 6274006Abstract: An apparatus and method for treating exhaust gases. A plurality of stages of reactor chambers are connected in series in the direction of an exhaust gas flow. High-voltage power supplies are connected to the reactor chambers In each of these reactor chambers, a streamer discharger plasma is generated. The more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is higher on the upstream side of the exhaust gas flow and the electron density is lower on the downstream side. A pulse generator is provided in which a high voltage, which is an output voltage of a D.C. charger (V0), is simultaneously applied to a plurality of distributed constant lines, which are connected in parallel with one another, by a signal shortcircuit switch (S1).Type: GrantFiled: August 9, 1999Date of Patent: August 14, 2001Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Keisuke Kawamura, Tetsuro Shigemizu, Hirohisa Yoshida, Masayoshi Murata
-
Patent number: 6007681Abstract: An apparatus and method for treating exhaust gases. In this apparatus, a plurality of stages of reactor chambers (R.sub.1, R.sub.2, . . . . and R.sub.n) are connected in series in the direction of an exhaust gas flow. Further, high-voltage power supplies (V.sub.1, V.sub.21 . . . and V.sub.n) are connected to the reactor chambers (R.sub.1, R.sub.2, . . . . and R.sub.n), respectively. Moreover, in each of these reactor chambers, a streamer discharger plasma is generated. Furthermore, the more downstream a reactor chamber of a stage is placed, the lower energy to be cast into the reactor chamber becomes. The density of electrons generated in a gas decomposition unit is high in a portion thereof on the upstream side of the exhaust gas flow and the electron density is low in a portion thereof on the downstream side. Additionally, the present invention further provides a pulse generator in which a high voltage, which is an output voltage of a D.C. charger (V.sub.Type: GrantFiled: April 2, 1997Date of Patent: December 28, 1999Assignee: Mitsubishi Heavy Industries, Ltd.Inventors: Keisuke Kawamura, Tetsuro Shigemizu, Hirohisa Yoshida, Masayoshi Murata
-
Patent number: 5657877Abstract: The present invention provides a rotary classifier for a roller mill, in which a rotating vane is formed so that the vane width at the upper part of the rotating vane is larger than that at the lower part.Type: GrantFiled: September 25, 1995Date of Patent: August 19, 1997Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Hirohisa Yoshida, Tsugio Yamamoto, Yutaka Iida, Shuichi Sakota
-
Patent number: 5544818Abstract: A horizontal mill for ultra-fine pulverization which has enhanced pulverization characteristics and reduced power consumption while suppressing damage or wear of pulverizing media. The pulverizing media (balls) are provided in a pulverizing chamber defined by a space between an inner cylinder and an outer cylinder which are rotated relative to each other. Large diameter pulverizing media are used and the rotational speed is kept at a low level, which is opposite to the conventional theory of using small diameter media and high rotational speeds. Since the rotational speed is low, the corresponding wear of the pulverizing media is reduced. The degradation in pulverizing performance due to the low rotational speed may be recovered by using large diameter pulverizing media. Also, the dimensional ratio between the inner and outer cylinders, the interval between the inner and outer sleeves, and the axial interval between agitating vanes are suitably selected to enhance the mill performance.Type: GrantFiled: July 21, 1995Date of Patent: August 13, 1996Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Hirohisa Yoshida, Katsuyuki Ueda
-
Patent number: 5251831Abstract: Raw coal is caused to fall through a coal feed pipe and onto a table so as to be pulverized by a roll. Fine coal particles and coarse coal particles resulting from pulverization are moved upward between an auxiliary classifier cone and a mill casing by hot air supplied from below the mill casing. The hot air (upward stream) carrying the fine coal particles and the coarse coal particles moves across a space of triangular cross section formed between the inverted conical body of the auxiliary classifier cone and the side wall of the mill casing and is forced through blowoff openings defined between deflector plates so as to flow as a lateral rotative stream toward a rotary classifier. Upon impinging the downward-inclined rotating vanes of the rotary classifier, the coarse coal particles are sprung back toward a lower portion of the auxiliary classifier cone and are separated from the fine coal particles.Type: GrantFiled: January 21, 1992Date of Patent: October 12, 1993Assignee: Mitsubishi Jukogyo Kabushiki KaishaInventors: Hirohisa Yoshida, Tsugio Yamamoto, Masaaki Kinoshita, Hidenori Sakamoto, Takeshi Kunimoto
-
Patent number: 5045227Abstract: A liquid crystal cell is disclosed which comprises a pair of opposed substrates defining a space therebetween and each having one or more electrodes disposed thereon, and a liquid crystal material provided in the space, the liquid crystal material being a lyotropic liquid crystal composition containing water and a polymeric electrolyte dissolved in the water in an amount sufficient to form a liquid crystal phase.Type: GrantFiled: June 1, 1990Date of Patent: September 3, 1991Assignee: Director-General of Agency of Industrial Science and TechnologyInventors: Hyoe Hatakeyama, Shigeo Hirose, Hirohisa Yoshida, Kunio Nakamura